scholarly journals Preparation of High-Tc Complex Oxide Thin Films by MOCVD.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 329-331
Author(s):  
Hiroshi MURAKAMI ◽  
Kazuhiro ENDO ◽  
Sadafumi YOSHIDA ◽  
Isao KUDO ◽  
Yo ICHIKAWA ◽  
...  
1994 ◽  
pp. 669-672
Author(s):  
Yo ICHIKAWA ◽  
Hiroshi MURAKAMI ◽  
Koichi MIZUNO ◽  
Toshifumi SATOH ◽  
Akira ENOKIHARA ◽  
...  

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.


2018 ◽  
Vol 452 ◽  
pp. 190-200 ◽  
Author(s):  
Thomas Götsch ◽  
Daniel Hauser ◽  
Norbert Köpfle ◽  
Johannes Bernardi ◽  
Bernhard Klötzer ◽  
...  

2019 ◽  
Vol 33 (1) ◽  
pp. 205-212 ◽  
Author(s):  
Gertjan Koster ◽  
Dave H. A. Blank ◽  
Guus A. J. H. M. Rijnders

Abstract For thin film synthesis of complex oxides, one of the most important issues has always been how to oxidise the material. For a technique like pulsed laser deposition, a key benefit is the relatively high oxygen background pressure one can operate at, and therefor oxidation should be relatively straightforward. However, understanding the microscopic oxidation mechanisms turns out to be rather difficult. In this perspective, we give a brief overview of the sources of oxidation for complex oxide thin films grown by pulsed laser deposition. While it is clear what these sources are, their role in the kinetics of the formation of the crystal structure and oxygen stoichiometry is not fully understood.


2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Sang A. Lee ◽  
Hoidong Jeong ◽  
Sungmin Woo ◽  
Jae-Yeol Hwang ◽  
Si-Young Choi ◽  
...  

Small ◽  
2008 ◽  
Vol 5 (2) ◽  
pp. 265-271 ◽  
Author(s):  
Zorica Konstantinović ◽  
José Santiso ◽  
Lluis Balcells ◽  
Benjamín Martínez

MRS Bulletin ◽  
2008 ◽  
Vol 33 (11) ◽  
pp. 1047-1050 ◽  
Author(s):  
Nicola A. Spaldin ◽  
R. Ramesh

AbstractIn this article, we review current research efforts to control the magnetic behavior of complex oxide thin films using electric fields. After providing fundamental definitions of magnetoelectric response, we survey materials, architectures, and mechanisms that exhibit promise for such electric-field control of magnetism. Finally, we mention ideas for future research and discuss prospects for the field.


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