scholarly journals Outgas of the Aluminum Alloy Vacuum Chamber

Shinku ◽  
1982 ◽  
Vol 25 (4) ◽  
pp. 172-175 ◽  
Author(s):  
Katsuya NARUSHIMA ◽  
Hajime ISHIMARU
Keyword(s):  
Aluminum Alloy ◽  
Vacuum Chamber

Design, Manufacturing and Welding of Aluminum Alloy UHV Chambers for Taiwan Photon Source

2014 ◽  
Vol 548-549 ◽  
pp. 305-309
Author(s):  
Chin Chun Chang ◽  
Che Kai Chan ◽  
Ching Lung Chen ◽  
Gao Yu Hsiung ◽  
June Rong Chen
Keyword(s):  
Aluminum Alloy ◽  
Aluminum Alloys ◽  
Support System ◽  
Vacuum Chamber ◽  
Welding Process ◽  
Clean Surface ◽  
Aluminum Extrusion ◽  
Welding Sequence ◽  
Free Environment ◽  
Photon Source

This paper describes the design, manufacturing and welding sequence for the aluminum alloy vacuum chamber for Taiwan Photon Source. The vacuum chamber composes of aluminum extrusion chamber of A6063 and BPM chamber of A6061 aluminum alloys. The straightness and flatness of these extrusion chambers are controlled under 0.1mm/m and 0.2mm/m, respectively. The BPM chambers are manufactured precisely in oil-free environment, which provide clean surface and a precise sealing surface after machining. All the components are assembled in pre-aligned support system through the welding process, and then the results show the straightness of < 0.15mm/m, flatness of < 0.3mm/m, and leakage rates of < 2 × 10-10 mbar‧l/sec. were achieved.

scholarly journals Pressure measurement of aluminum alloy extremely high vacuum chamber.

Shinku ◽  
1989 ◽  
Vol 32 (3) ◽  
pp. 403-406
Author(s):  
Fumio WATANABE ◽  
Kenzabro SUGISAKI ◽  
Hajime ISHIMARU
Keyword(s):  
Aluminum Alloy ◽  
Pressure Measurement ◽  
Vacuum Chamber ◽  
High Vacuum ◽  
High Vacuum Chamber

scholarly journals Outgas of the aluminum alloy vacuum chamber (IV)

Shinku ◽  
1986 ◽  
Vol 29 (5) ◽  
pp. 280-283
Author(s):  
Katsuya NARUSHIMA ◽  
Hajime ISHIMARU
Keyword(s):  
Aluminum Alloy ◽  
Vacuum Chamber

Thin Pyrolytic Graphite Films for Electron Microscope Substrates

1971 ◽  
Vol 29 ◽  
pp. 226-227 ◽  
Author(s):  
George H. N. Riddle ◽  
Benjamin M. Siegel
Keyword(s):  
Vacuum Chamber ◽  
Pyrolytic Graphite ◽  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Graphite Substrate ◽  
Nickel Substrate ◽  
Routine Procedure ◽  
Field Electron Microscopy ◽  
Dark Field Electron

A routine procedure for growing very thin graphite substrate films has been developed. The films are grown pyrolytically in an ultra-high vacuum chamber by exposing (111) epitaxial nickel films to carbon monoxide gas. The nickel serves as a catalyst for the disproportionation of CO through the reaction 2C0 → C + CO2. The nickel catalyst is prepared by evaporation onto artificial mica at 400°C and annealing for 1/2 hour at 600°C in vacuum. Exposure of the annealed nickel to 1 torr CO for 3 hours at 500°C results in the growth of very thin continuous graphite films. The graphite is stripped from its nickel substrate in acid and mounted on holey formvar support films for use as specimen substrates.The graphite films, self-supporting over formvar holes up to five microns in diameter, have been studied by bright and dark field electron microscopy, by electron diffraction, and have been shadowed to reveal their topography and thickness. The films consist of individual crystallites typically a micron across with their basal planes parallel to the surface but oriented in different, apparently random directions about the normal to the basal plane.

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