Numerical simulation of supersonic internal flow for an arc-heated chemical vapor deposition reactor

Mapping Intimacies ◽

10.2514/6.1995-2208 ◽

1995 ◽

Cited By ~ 1

Author(s):

C Moen ◽

H Dwyer

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Internal Flow ◽

Chemical Vapor Deposition Reactor

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Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor

Chemical Engineering Science ◽

10.1016/s0009-2509(01)00373-6 ◽

2002 ◽

Vol 57 (3) ◽

pp. 497-506 ◽

Cited By ~ 22

Author(s):

Heru Setyawan ◽

Manabu Shimada ◽

Kenji Ohtsuka ◽

Kikuo Okuyama

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Transport ◽

Fine Particle ◽

Parallel Plate ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor

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Numerical Simulation of a Practical Chemical Vapor Deposition Reactor

Proceeding of Proceedings of CHT-15. 6th International Symposium on ADVANCES IN COMPUTATIONAL HEAT TRANSFER , May 25-29, 2015, Rutgers University, New Brunswick, NJ, USA ◽

10.1615/ichmt.2015.intsympadvcomputheattransf.1020 ◽

2015 ◽

Author(s):

S. Wong ◽

Yogesh Jaluria

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Numerical simulation of chemical kinetics in a supersonic chemical vapor deposition reactor

10.2514/6.1995-1676 ◽

1995 ◽

Cited By ~ 2

Author(s):

Christopher Moen ◽

Harry Dwyer

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Chemical Kinetics ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Numerical simulation of a practical chemical vapor deposition reactor

Numerical Heat Transfer Part A Applications ◽

10.1080/10407782.2016.1230421 ◽

2016 ◽

Vol 70 (10) ◽

pp. 1057-1071 ◽

Cited By ~ 2

Author(s):

S. Wong ◽

Y. Jaluria

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Cited By ~ 1

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

Thin Silicon

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The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1392026 ◽

1999 ◽

Vol 146 (8) ◽

pp. 2901-2905 ◽

Cited By ~ 4

Author(s):

B. S. MacGibbon ◽

A. A. Busnaina ◽

B. Fardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Pressure Chemical

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Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale Approach

Industrial & Engineering Chemistry Research ◽

10.1021/ie8015522 ◽

2009 ◽

Vol 48 (13) ◽

pp. 5969-5974 ◽

Cited By ~ 1

Author(s):

Yousef Sharifi ◽

Luke Achenie

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Particle Dynamics ◽

Multiscale Approach ◽

Chemical Vapor Deposition Reactor

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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Cited By ~ 4

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

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DEVELOPMENT OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF OXYGEN CONTAINING ORGANOSILAZANE POLYMER THIN FILMS

NANOCON 2019 Conference Proeedings ◽

10.37904/nanocon.2019.8749 ◽

2020 ◽

Author(s):

Roman PŘIBYL ◽

Štěpánka KELAROVÁ ◽

Vojtěch HOMOLA ◽

Vilma BURŠÍKOVÁ

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polymer Thin Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Kinetics of silicon epitaxy using SiH4in a rapid thermal chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.102719 ◽

1990 ◽

Vol 56 (7) ◽

pp. 629-631 ◽

Cited By ~ 109

Author(s):

M. Liehr ◽

C. M. Greenlief ◽

S. R. Kasi ◽

M. Offenberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Thermal Chemical Vapor Deposition ◽

Silicon Epitaxy ◽

Kinetics Of

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