Theoretical study of discharge confinement in an electron-beam-controlled laser discharge cavity

B. N. Srivastava

doi:10.2514/3.8288

Theoretical study of discharge confinement in an electron-beam-controlled laser discharge cavity

AIAA Journal ◽

10.2514/3.8288 ◽

1983 ◽

Vol 21 (11) ◽

pp. 1552-1556

Author(s):

B. N. Srivastava

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Laser Discharge ◽

Discharge Cavity

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Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Comparison with experimental results

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.056503 ◽

2016 ◽

Vol 55 (5) ◽

pp. 056503 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Experimental Results ◽

Chemically Amplified ◽

Chemically Amplified Resist

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A theoretical study on decomposition of carbon tetrachloride, trichloroethylene and ethyl chloride in dry air under the influence of an electron beam

Radiation Physics and Chemistry ◽

10.1016/s0969-806x(99)00454-5 ◽

2000 ◽

Vol 57 (3-6) ◽

pp. 519-525 ◽

Cited By ~ 21

Author(s):

H. Nichipor ◽

E. Dashouk ◽

A.G. Chmielewski ◽

Z. Zimek ◽

S. Bułka

Keyword(s):

Electron Beam ◽

Carbon Tetrachloride ◽

Theoretical Study ◽

Ethyl Chloride ◽

Dry Air

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Theoretical study of the ultimate resolution in electron beam lithography by Monte Carlo simulation, including secondary electron generation: Energy dissipation profile in polymethylmethacrylate

Journal of Applied Physics ◽

10.1063/1.332610 ◽

1983 ◽

Vol 54 (7) ◽

pp. 3855-3859 ◽

Cited By ~ 27

Author(s):

Norihiko Samoto ◽

Ryuichi Shimizu

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Electron Beam ◽

Energy Dissipation ◽

Electron Beam Lithography ◽

Secondary Electron ◽

Theoretical Study ◽

Electron Generation ◽

Secondary Electron Generation

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Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.106502 ◽

2016 ◽

Vol 55 (10) ◽

pp. 106502 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Beam Size ◽

Chemically Amplified ◽

Chemically Amplified Resist

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P1–27: Theoretical study of DC-biased single-surface multipactor for pulsed electron beam generation

2010 IEEE International Vacuum Electronics Conference (IVEC) ◽

10.1109/ivelec.2010.5503558 ◽

2010 ◽

Author(s):

Seok-Gy Jeon ◽

Jung-Il Kim ◽

Seong-Tae Han ◽

Geun-Ju Kim

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Pulsed Electron Beam ◽

Electron Beam Generation ◽

Beam Generation

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Theoretical study on the two electron-beam instability in a plasma waveguide

Infrared and Millimeter Waves, Conference Digest of the 2004 Joint 29th International Conference on 2004 and 12th International Conference on Terahertz Electronics, 2004. ◽

10.1109/icimw.2004.1422055 ◽

2006 ◽

Author(s):

Liu Shenggang ◽

Yan Yang ◽

Y.Y. Wei ◽

Zhu Dajun ◽

Yuan Xuesong

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Plasma Waveguide ◽

Beam Instability

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Efficient XeCl(B) formation in an electron‐beam assisted Xe/HCl laser discharge

Applied Physics Letters ◽

10.1063/1.91582 ◽

1980 ◽

Vol 36 (7) ◽

pp. 498-500 ◽

Cited By ~ 47

Author(s):

William L. Nighan ◽

Robert T. Brown

Keyword(s):

Electron Beam ◽

Laser Discharge

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Theoretical study of power relativistic amplifiers for electron beam bunching

Proceedings of the 1997 Particle Accelerator Conference (Cat. No.97CH36167) ◽

10.1109/pac.1997.749704 ◽

2002 ◽

Author(s):

E.A. Perelstein ◽

L.V. Bobyleva ◽

A.V. Elzhov ◽

V.I. Kazacha

Keyword(s):

Electron Beam ◽

Theoretical Study

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Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist processes: II. Stochastic effects

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.096501 ◽

2015 ◽

Vol 54 (9) ◽

pp. 096501 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Stochastic Effects ◽

Chemically Amplified ◽

Chemically Amplified Resist

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Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab5d6a ◽

2020 ◽

Vol 59 (1) ◽

pp. 016503

Author(s):

Takahiro Kozawa ◽

Takao Tamura

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Chemically Amplified ◽

Chemically Amplified Resists

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