Theoretical study of power relativistic amplifiers for electron beam bunching

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Comparison with experimental results

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.056503 ◽

2016 ◽

Vol 55 (5) ◽

pp. 056503 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Experimental Results ◽

Chemically Amplified ◽

Chemically Amplified Resist

Download Full-text

A theoretical study on decomposition of carbon tetrachloride, trichloroethylene and ethyl chloride in dry air under the influence of an electron beam

Radiation Physics and Chemistry ◽

10.1016/s0969-806x(99)00454-5 ◽

2000 ◽

Vol 57 (3-6) ◽

pp. 519-525 ◽

Cited By ~ 21

Author(s):

H. Nichipor ◽

E. Dashouk ◽

A.G. Chmielewski ◽

Z. Zimek ◽

S. Bułka

Keyword(s):

Electron Beam ◽

Carbon Tetrachloride ◽

Theoretical Study ◽

Ethyl Chloride ◽

Dry Air

Download Full-text

Theoretical study of the ultimate resolution in electron beam lithography by Monte Carlo simulation, including secondary electron generation: Energy dissipation profile in polymethylmethacrylate

Journal of Applied Physics ◽

10.1063/1.332610 ◽

1983 ◽

Vol 54 (7) ◽

pp. 3855-3859 ◽

Cited By ~ 27

Author(s):

Norihiko Samoto ◽

Ryuichi Shimizu

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Electron Beam ◽

Energy Dissipation ◽

Electron Beam Lithography ◽

Secondary Electron ◽

Theoretical Study ◽

Electron Generation ◽

Secondary Electron Generation

Download Full-text

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.106502 ◽

2016 ◽

Vol 55 (10) ◽

pp. 106502 ◽

Cited By ~ 2

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Beam Size ◽

Chemically Amplified ◽

Chemically Amplified Resist

Download Full-text

P1–27: Theoretical study of DC-biased single-surface multipactor for pulsed electron beam generation

2010 IEEE International Vacuum Electronics Conference (IVEC) ◽

10.1109/ivelec.2010.5503558 ◽

2010 ◽

Author(s):

Seok-Gy Jeon ◽

Jung-Il Kim ◽

Seong-Tae Han ◽

Geun-Ju Kim

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Pulsed Electron Beam ◽

Electron Beam Generation ◽

Beam Generation

Download Full-text

Theoretical study on the two electron-beam instability in a plasma waveguide

Infrared and Millimeter Waves, Conference Digest of the 2004 Joint 29th International Conference on 2004 and 12th International Conference on Terahertz Electronics, 2004. ◽

10.1109/icimw.2004.1422055 ◽

2006 ◽

Author(s):

Liu Shenggang ◽

Yan Yang ◽

Y.Y. Wei ◽

Zhu Dajun ◽

Yuan Xuesong

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Plasma Waveguide ◽

Beam Instability

Download Full-text

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist processes: II. Stochastic effects

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.096501 ◽

2015 ◽

Vol 54 (9) ◽

pp. 096501 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Stochastic Effects ◽

Chemically Amplified ◽

Chemically Amplified Resist

Download Full-text

Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab5d6a ◽

2020 ◽

Vol 59 (1) ◽

pp. 016503

Author(s):

Takahiro Kozawa ◽

Takao Tamura

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Chemically Amplified ◽

Chemically Amplified Resists

Download Full-text

Experimental and Theoretical Study of a Quasi-Steady Electron-Beam Plasma in Hot Argon

Plasma Physics Reports ◽

10.1134/1.1925792 ◽

2005 ◽

Vol 31 (5) ◽

pp. 425 ◽

Cited By ~ 12

Author(s):

N. L. Aleksandrov

Keyword(s):

Electron Beam ◽

Theoretical Study ◽

Beam Plasma ◽

Steady Electron ◽

Electron Beam Plasma

Download Full-text

Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch (7 nm space width and 21 nm line width) using electron beam lithography with chemically amplified resist processes: I. Relationship between sensitivity and chemical gradient

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.056501 ◽

2015 ◽

Vol 54 (5) ◽

pp. 056501 ◽

Cited By ~ 3

Author(s):

Takahiro Kozawa

Keyword(s):

Electron Beam ◽

Line Width ◽

Electron Beam Lithography ◽

Theoretical Study ◽

Chemical Gradient ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Space Width

Download Full-text