Measurement of film thickness of thin-film resistance thermometers.

AIAA Journal ◽  
1968 ◽  
Vol 6 (4) ◽  
pp. 747-748 ◽  
Author(s):  
DAVID J. McCAA
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Film Resistance ◽  
Resistance Thermometers

Thin-film resistance thermometers on silicon wafers

2009 ◽  
Vol 20 (4) ◽  
pp. 045206 ◽  
Author(s):  
Kenneth G Kreider ◽  
Dean C Ripple ◽  
William A Kimes
Keyword(s):  
Thin Film ◽  
Silicon Wafers ◽  
Film Resistance ◽  
Resistance Thermometers

Making microcircuit-style thin-film resistance thermometers

1990 ◽  
Vol 33 (1) ◽  
pp. 57-59 ◽  
Author(s):  
P. I. Susol ◽  
I. D. Nabitovich ◽  
V. I. Lakh ◽  
Ya. V. Boris
Keyword(s):  
Thin Film ◽  
Film Resistance ◽  
Resistance Thermometers

Thin-film resistance thermometers for use in aggressive surroundings

1992 ◽  
Vol 30 (1-2) ◽  
pp. 59-62 ◽  
Author(s):  
A. Bajtsar ◽  
O. Mikolajczuk ◽  
Y. Tretyakov
Keyword(s):  
Thin Film ◽  
Film Resistance ◽  
Resistance Thermometers

Organic thin film thickness-dependent photocurrents polarity in graphene heterojunction phototransistor

Carbon ◽  
2021 ◽  
Vol 178 ◽  
pp. 506-514
Author(s):  
Meiyu He ◽  
Jiayue Han ◽  
Xingwei Han ◽  
Jun Gou ◽  
Ming Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Thickness ◽  
Organic Thin Film ◽  
Thin Film Thickness

scholarly journals Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 23
Author(s):  
Weiguang Zhang ◽  
Jijun Li ◽  
Yongming Xing ◽  
Xiaomeng Nie ◽  
Fengchao Lang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Integrated Circuits ◽  
Film Thickness ◽  
Depth Range ◽  
Micro Electro Mechanical Systems ◽  
Si Substrates ◽  
Sio2 Thin Film ◽  
Average Grain Size

SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control
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