Microelectronics industry technology—the characteristics of capacitively coupled discharge by dual frequency sources with PIC/MCC method

2014 ◽  
Author(s):  
X.W. Gu
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Microelectronics Industry

scholarly journals Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge

2007 ◽  
Vol 40 (22) ◽  
pp. 7008-7018 ◽  
Author(s):  
J Schulze ◽  
T Gans ◽  
D O'Connell ◽  
U Czarnetzki ◽  
A R Ellingboe ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Dual Frequency ◽  
Plasma Parameters ◽  
Capacitively Coupled ◽  
Radio Frequency Discharge

scholarly journals Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

2016 ◽  
Vol 18 (2) ◽  
pp. 143-146
Author(s):  
Hongyu Wang ◽  
Wei Jiang ◽  
Peng Sun ◽  
Shuangyun Zhao ◽  
Yang Li
Keyword(s):  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

Twodimensional hybrid simulation of dualfrequency capacitively coupled CF4plasma

2013 ◽  
Vol 25 (9) ◽  
pp. 2297-2302
Author(s):  
王帅 Wang Shuai ◽  
徐翔 Xu Xiang ◽  
王友年 Wang Younian
Keyword(s):  
Hybrid Simulation ◽  
Two Dimensional ◽  
Dual Frequency ◽  
Capacitively Coupled
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