scholarly journals A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 117-121 ◽  
Author(s):  
Hind Zegtouf ◽  
Nadia Saoula ◽  
Mourad Azibi ◽  
Larbi Bait ◽  
Noureddine Madaoui ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Steel Substrate ◽  
Substrate Bias ◽  
X Rays ◽  
Plasma Parameters ◽  
Substrate Bias Voltage ◽  
Deposited Films

Abstract ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

scholarly journals The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 112-116
Author(s):  
Mourad Azibi ◽  
Nadia Saoula ◽  
Hamid Aknouche
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Electrochemical Properties ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Substrate Bias ◽  
Radio Frequency Magnetron Sputtering ◽  
Substrate Bias Voltage ◽  
Force Microscopy

Abstract In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films

Effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels

1996 ◽  
Vol 11 (5) ◽  
pp. 1149-1156 ◽  
Author(s):  
Syuji Yamamoto ◽  
Hiroshi Ichimura
Keyword(s):  
Bias Voltage ◽  
High Speed ◽  
Chemical Properties ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Tin Films ◽  
High Bias ◽  
Physical And Chemical ◽  
Deposited Films ◽  
And Chemical Properties

The effect of substrate bias voltage on the properties of arc ion-plated TiN films onto high speed steels has been investigated. The high density structure with a large crystallite size grew at the high bias voltage. TiN films deposited by higher bias exhibited strong preferential (111) orientation from XRD. The internal stress of TiN films increased at first with increasing substrate bias voltage; however, it decreased as the bias voltage increased over 100 V. The coating adhesion measured by the scratch tester increased with increasing bias voltage, and this is coupled with a cohesion of films. Cutting performance of TiN coated drills, which increased markedly with increasing substrate bias, has been studied in relation to the physical and chemical properties of deposited films.

Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

2007 ◽  
Vol 253 (17) ◽  
pp. 7192-7196 ◽  
Author(s):  
M. Flores ◽  
L. Huerta ◽  
R. Escamilla ◽  
E. Andrade ◽  
S. Muhl
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage

Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method

2009 ◽  
Vol 63 (26) ◽  
pp. 2181-2184 ◽  
Author(s):  
Joon Woo Bae ◽  
Jae-Won Lim ◽  
Kouji Mimura ◽  
Masahito Uchikoshi ◽  
Mitsuhiro Wada ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Ion Beam ◽  
Substrate Bias ◽  
Deposition Method ◽  
Substrate Bias Voltage ◽  
Ion Beam Deposition ◽  
Influence Of Substrate ◽  
Beam Deposition
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