scholarly journals Modeling of discharges in a capacitively coupled dual frequency plasma reactor

2009 ◽  
Vol 63 (3) ◽  
pp. 233-238 ◽  
Author(s):  
Aleksandar Bojarov ◽  
Marija Radmilovic-Radjenovic ◽  
Zoran Petrovic
Keyword(s):  
High Frequency ◽  
Plasma Reactor ◽  
Low Frequency ◽  
Potential Drop ◽  
Plasma Reactors ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Practical Applications ◽  
Aspect Ratios ◽  
Frequency Generator

In this paper we have modeled a dual frequency coupled plasma reactor (DF-CCP) by using a 1d3v PIC/MCC code. The obtained results apart from their theoretical relevance have practical applications especially for development of plasma reactors and for nanoelectronics. Dual frequency plasmas are used for etching of dielectric interconnect layers with high aspect ratios (contact holes). In the DF-CCP, the density of the plasma is controlled by the high frequency, while the ion energy depends mainly on the potential drop in the sheath, which is controlled by the low frequency. The results of our simulations show the dependence of the energy of the ions arriving at the inner electrode on the voltage of the low frequency generator and how the voltage of the high frequency generator affects the ion flux on the electrode.

Modeling and Optimization of Process Parameters of a DF-CCP Etcher Chamber

2013 ◽  
Vol 572 ◽  
pp. 213-216 ◽  
Author(s):  
Xia Xu ◽  
Juan Feng ◽  
Ling Tian
Keyword(s):  
Process Parameters ◽  
Process Model ◽  
Orthogonal Design ◽  
Low Frequency ◽  
High Plasma ◽  
Chamber Pressure ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Optimization Of Process Parameters ◽  
Center Edge

Dual-frequency capacitively coupled plasma (DF-CCP) etcher has become the mainstream in dielectric etcher. By building a 2D axisymmetric model of 300mm DF-CCP etcher in CFD-ACE+ software, plasma simulation experiments are carried out by orthogonal design. Then a process model based on simulation results is proposed to analysis influence of key process parameters including high frequency voltage, low frequency voltage, and chamber pressure and center/edge flow ratio on chamber plasma characteristics. Finally, to get high plasma uniformity and plasma density, process optimizations are carried out.

scholarly journals Traveling ionospheric disturbances triggered by the 2009 North Korean underground nuclear explosion

2015 ◽  
Vol 33 (1) ◽  
pp. 137-142 ◽  
Author(s):  
X. Zhang ◽  
L. Tang
Keyword(s):  
Acoustic Waves ◽  
High Frequency ◽  
Ionospheric Disturbance ◽  
Low Frequency ◽  
Ionospheric Disturbances ◽  
Underground Nuclear Explosion ◽  
Dual Frequency ◽  
International Gnss Service ◽  
Acoustic Gravity Waves ◽  
Traveling Ionospheric Disturbances

Abstract. Underground nuclear explosions (UNEs) can induce acoustic-gravity waves, which disturb the ionosphere and initiate traveling ionospheric disturbances (TIDs). In this paper, we employ a multi-step and multi-order numerical difference method with dual-frequency GPS data to detect ionospheric disturbances triggered by the North Korean UNE on 25 May 2009. Several International GNSS Service (IGS) stations with different distances (400 to 1200 km) from the epicenter were chosen for the experiment. The results show that there are two types of disturbances in the ionospheric disturbance series: high-frequency TIDs with periods of approximately 1 to 2 min and low-frequency waves with period spectrums of 2 to 5 min. The observed TIDs are situated around the epicenter of the UNE, and show similar features, indicating the origin of the observed disturbances is the UNE event. According to the amplitudes, periods and average propagation velocities, the high-frequency and low-frequency TIDs can be attributed to the acoustic waves in the lower ionosphere and higher ionosphere, respectively.

Effect of high-frequency on etching of SiCOH films in CHF3 dual-frequency capacitively coupled plasmas

2010 ◽  
Vol 518 (12) ◽  
pp. 3223-3227 ◽  
Author(s):  
Chao Ye ◽  
Yijun Xu ◽  
Xiaojiang Huang ◽  
Zhaoyuan Ning
Keyword(s):  
High Frequency ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Study of the effect of strain amplitude ratio at two-frequency cyclic loading

2018 ◽  
Vol 84 (12) ◽  
pp. 50-60 ◽  
Author(s):  
M. M. Gadenin
Keyword(s):  
High Frequency ◽  
Amplitude Ratio ◽  
Low Frequency ◽  
Frequency Component ◽  
Single Frequency ◽  
High Frequency Component ◽  
Dual Frequency ◽  
Operating Modes ◽  
Cyclic Durability ◽  
Cycle Loading

The operating modes of loading elements of machines and structures exhibit, as a rule, more complicated character of their loading cycles compared to sinusoidal used in the practice of calculations and experiments. It is noted that in a number of cases the actual conditions of load changing can be schematized by dual-frequency loading modes with superposition of the high-frequency component of the main workload attributed to the effects of vibrations, aero- and hydrodynamic impacts, regulation of the working process, etc. Testing of three steel samples which differ in their cyclic properties has shown that such two-frequency regimes lead to a decrease in the durability in comparison with single-frequency loading, equal in the amplitude of maximum stresses. This reduction depends on the parameters of the basic low-frequency and imposed high-frequency loads. Evaluation of this reduction can be performed both i) using the laws of summation of the damage expressed in the strain terms, and ii) using an analytical expression considered below, which includes calculated or experimentally determined durability for single-frequency loading with the maximum (total) amplitude of the effective stress and durability coefficient, characteristic of each type of material and determined by the ratio of amplitudes and hours of low- and high stresses. A computational-experimental analysis of the effect of the amplitude of low-frequency and superimposed high-frequency loading under two-frequency modes of stress change on the cyclic durability showed that the imposition of the high-frequency component of cyclic deformation on the main low-cycle loading process leads to a significant decrease in the cyclic durability, the level of the decrease correlates with the level of amplitudes and frequencies ratios of the summarized harmonic processes of load application.

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