scholarly journals Measurements of the heating beam deposition profile in TFTR (Tokamak Fusion Test Reactor)

1990 ◽  
Author(s):  
H.K. Park ◽  
R. Budny ◽  
G. Taylor ◽  
M.C. Zarnstorff ◽  
C.W. Barnes
Keyword(s):  
Test Reactor ◽  
Heating Beam ◽  
Beam Deposition

Electron energy loss spectroscopy of diamond-like carbon thin films

1992 ◽  
Vol 50 (2) ◽  
pp. 1272-1273
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Loss ◽  
Electron Energy ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Deposition ◽  
Chemistry Research ◽  
Carbon Thin Films ◽  
Electron Energy Loss ◽  
Beam Deposition

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.

Carbon Film Deposition On Silicon Using Low Energy Ion Beams

1991 ◽  
Vol 223 ◽  
Author(s):  
Qin Fuguang ◽  
Yao Zhenyu ◽  
Ren Zhizhang ◽  
S.-T. Lee ◽  
I. Bello ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Carbon Film ◽  
Carbon Films ◽  
Film Deposition ◽  
Ion Energy ◽  
Transmission Electron ◽  
Higher Temperature ◽  
Post Implantation ◽  
Beam Deposition

ABSTRACTDirect ion beam deposition of carbon films on silicon in the ion energy range of 15–500eV and temperature range of 25–800°C has been studied using mass selected C+ ions under ultrahigh vacuum. The films were characterized with X-ray photoelectron spectroscopy, Raman spectroscopy, and transmission electron microscopy and diffraction analysis. Films deposited at room temperature consist mainly of amorphous carbon. Deposition at a higher temperature, or post-implantation annealing leads to formation of microcrystalline graphite. A deposition temperature above 800°C favors the formation of microcrystalline graphite with a preferred orientation in the (0001) direction. No evidence of diamond formation was observed in these films.

Slurry Bioremediation of Petrochemical Waste Sludges

1992 ◽  
Vol 25 (3) ◽  
pp. 207-212 ◽  
Author(s):  
F. J. Castaldi ◽  
D. L. Ford
Keyword(s):  
Aqueous Phase ◽  
Petrochemical Production ◽  
Waste Sludge ◽  
Petrochemical Waste ◽  
Test Reactor

Slurry bioremediation testing was conducted on waste sludges from petrochemical production. The study concludes that the apparent mechanism for remediation of the waste involves an initial dissolution of the waste constituents into the aqueous phase followed by actual biodegradation. The test reactor most successful in the solubilization and dispersal of waste constituents and possibly most effective in reducing waste sludge mass during treatment is the reactor with the lowest waste sludge-to-microorganism ratio.

A Technique to Determine Unsteady-State Inhibition Kinetics in the Activated Sludge Process

1989 ◽  
Vol 21 (6-7) ◽  
pp. 593-602 ◽  
Author(s):  
Andrew T. Watkin ◽  
W. Wesley Eckenfelder
Keyword(s):  
Activated Sludge ◽  
Kinetic Parameters ◽  
Curve Fitting ◽  
Glucose Utilization ◽  
Batch Reactor ◽  
Synthetic Data ◽  
Utilization Rate ◽  
Fitting Algorithm ◽  
Test Reactor ◽  
Two Parameter

A technique for rapidly determining Monod and inhibition kinetic parameters in activated sludge is evaluated. The method studied is known as the fed-batch reactor technique and requires approximately three hours to complete. The technique allows for a gradual build-up of substrate in the test reactor by introducing the substrate at a feed rate greater than the maximum substrate utilization rate. Both inhibitory and non-inhibitory substrate responses are modeled using a nonlinear numerical curve-fitting technique. The responses of both glucose and 2,4-dichlorophenol (DCP) are studied using activated sludges with various acclimation histories. Statistically different inhibition constants, KI, for DCP inhibition of glucose utilization were found for the various sludges studied. The curve-fitting algorithm was verified in its ability to accurately retrieve two kinetic parameters from synthetic data generated by superimposing normally distributed random error onto the two parameter numerical solution generated by the algorithm.

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