scholarly journals THICKNESS MEASUREMENTS OF THIN FILMS BY MULTIPLE-BEAM INTERFEROMETRY

1954 ◽  
Author(s):  
T Bartlett ◽  
F Ball
Keyword(s):  
Thin Films ◽  
Multiple Beam ◽  
Thickness Measurements ◽  
Multiple Beam Interferometry

The Thickness Measurement of Thin Films by Multiple Beam Interferometry

1950 ◽  
Vol 21 (9) ◽  
pp. 843-846 ◽  
Author(s):  
G. D. Scott ◽  
T. A. McLauchlan ◽  
R. S. Sennett
Keyword(s):  
Thin Films ◽  
Thickness Measurement ◽  
Multiple Beam ◽  
Multiple Beam Interferometry

Analysis of electroless nickel thin films

1991 ◽  
Vol 49 ◽  
pp. 510-511 ◽  
Author(s):  
C. W. Price ◽  
E. F. Lindsey
Keyword(s):  
Thin Films ◽  
Inertial Confinement Fusion ◽  
Electroless Nickel ◽  
Inertial Confinement ◽  
Plating Bath ◽  
X Ray ◽  
Nickel Thin Films ◽  
Nickel Deposits ◽  
Confinement Fusion ◽  
Thickness Measurements

Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.

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