scholarly journals Laser and Electron Beam Technology for Parity Violating Electron Scattering Measurements

2019 ◽  
Author(s):  
Caryn Palatchi
Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
J. Edie

In TEM image formation, the observed contrast variations within thin sections result from differential electron scattering within microregions of varying mass thickness. It is possible to utilize these electron scattering properties to obtain objective information regarding various specimen parameters (1, 2, 3).A pragmatic, empirical approach is described which enables a microscopist to perform physical measurements of thickness of thin sections and estimates of local mass, volume, density and, possibly, molecular configurations within thin sections directly in the microscope. A Faraday cage monitors the transmitted electron beam and permits measurements of electron beam intensities.


Author(s):  
L. D. Peachey ◽  
J. P. Heath ◽  
G. Lamprecht

Biological specimens of cells and tissues generally are considerably thicker than ideal for high resolution transmission electron microscopy. Actual image resolution achieved is limited by chromatic aberration in the image forming electron lenses combined with significant energy loss in the electron beam due to inelastic scattering in the specimen. Increased accelerating voltages (HVEM, IVEM) have been used to reduce the adverse effects of chromatic aberration by decreasing the electron scattering cross-section of the elements in the specimen and by increasing the incident electron energy.


1987 ◽  
Vol 59 (20) ◽  
pp. 2388-2388 ◽  
Author(s):  
D. Beck ◽  
A. Bernstein ◽  
I. Blomqvist ◽  
H. Caplan ◽  
D. Day ◽  
...  

1958 ◽  
Vol 7 (4) ◽  
pp. 570-574 ◽  
Author(s):  
K. Nagy ◽  
I. Farkas

2006 ◽  
Vol 3 (2) ◽  
pp. 219-230 ◽  
Author(s):  
Basil T. Wong ◽  
M. Pinar Mengüç ◽  
R. Ryan Vallance

A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations. The procedure we present here is the first to outline the sequential nano-machining processes and likely to guide the experimental studies to success with less trial-and-error attempts.


2010 ◽  
Vol 19 (12) ◽  
pp. 2487-2496 ◽  
Author(s):  
◽  
F. Garibaldi ◽  
E. Cisbani ◽  
F. Cusanno ◽  
S. Frullani ◽  
...  

The characteristics of the Jefferson LAB electron beam, together with those of the experimental equipments, offer a unique opportunity to study hypernuclear spectroscopy via electromagnetic induced reactions. Experiment 94-107 started a systematic study on 1p-shell targets, 12 C , 9 Be and 16 O . We present the results from 12 C , 16 O and very preliminary results from 9 Be . For 12 C for the first time measurable strength in the core-excited part of the spectrum between the ground state and the pΛ state was shown in [Formula: see text] for the first time. A high-quality 16Λ N spectrum was produced for the first time with sub-MeV Energy resolution. A very precise B Λ value for 16Λ N , calibrated against the elementary ( e , e ′ K +) reaction on hydrogen, has also been obtained. Final data on 9 Be will be available soon. The missing energy resolution is the best ever obtained in hypernuclear production experiments.


2019 ◽  
Vol 218 ◽  
pp. 07002
Author(s):  
Eugene Chudakov

Jefferson Laboratory is finishing a major upgrade and has already started operations with the 12 GeV continuous electron beam. The main research direction is the study of the structure of hadrons, including a search for gluon excitations in the spectra of light mesons and baryons, and studies of multidimensional images of the nucleon. Studied of certain properties of atomic nuclei are also ongoing. There is also an active program of searching for effects beyond the Standard Model in parity-violating electron scattering, as well as a search for new particles.


2007 ◽  
Author(s):  
R. Bradford ◽  
Geralyn P. Zeller ◽  
Jorge G. Morfin ◽  
Flavio Cavanna

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