The electron-electron scattering with longitudinal polarized electron beam

1958 ◽  
Vol 7 (4) ◽  
pp. 570-574 ◽  
Author(s):  
K. Nagy ◽  
I. Farkas
Keyword(s):  
Electron Beam ◽  
Electron Scattering

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Quantitation in thin Sections Within the Electron Microscope

1976 ◽  
Vol 34 ◽  
pp. 336-337
Author(s):  
J. Edie
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Electron Scattering ◽  
Volume Density ◽  
Thin Sections ◽  
Faraday Cage ◽  
Local Mass ◽  
Physical Measurements ◽  
Mass Volume ◽  
Varying Mass

In TEM image formation, the observed contrast variations within thin sections result from differential electron scattering within microregions of varying mass thickness. It is possible to utilize these electron scattering properties to obtain objective information regarding various specimen parameters (1, 2, 3).A pragmatic, empirical approach is described which enables a microscopist to perform physical measurements of thickness of thin sections and estimates of local mass, volume, density and, possibly, molecular configurations within thin sections directly in the microscope. A Faraday cage monitors the transmitted electron beam and permits measurements of electron beam intensities.

The use of an energy-filtering electron microscope to reduce chromatic aberration in images of thick biological specimens

1986 ◽  
Vol 44 ◽  
pp. 88-91
Author(s):  
L. D. Peachey ◽  
J. P. Heath ◽  
G. Lamprecht
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Beam ◽  
Cross Section ◽  
Electron Scattering ◽  
Chromatic Aberration ◽  
Image Resolution ◽  
Incident Electron Energy ◽  
Energy Filtering ◽  
Transmission Electron

Biological specimens of cells and tissues generally are considerably thicker than ideal for high resolution transmission electron microscopy. Actual image resolution achieved is limited by chromatic aberration in the image forming electron lenses combined with significant energy loss in the electron beam due to inelastic scattering in the specimen. Increased accelerating voltages (HVEM, IVEM) have been used to reduce the adverse effects of chromatic aberration by decreasing the electron scattering cross-section of the elements in the specimen and by increasing the incident electron energy.

Sequential Nano-Patterning Using Electron and Laser Beams: A Numerical Methodology

2006 ◽  
Vol 3 (2) ◽  
pp. 219-230 ◽  
Author(s):  
Basil T. Wong ◽  
M. Pinar Mengüç ◽  
R. Ryan Vallance
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Ray Tracing ◽  
Electron Scattering ◽  
Gold Film ◽  
Quartz Substrate ◽  
Experimental Studies ◽  
Machining Processes ◽  
Laser Propagation ◽  
The One

A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations. The procedure we present here is the first to outline the sequential nano-machining processes and likely to guide the experimental studies to success with less trial-and-error attempts.

HIGH-RESOLUTION HYPERNUCLEAR SPECTROSCOPY ELECTRON SCATTERING AT JLab, HALL A

2010 ◽  
Vol 19 (12) ◽  
pp. 2487-2496 ◽  
Author(s):  
◽  
F. Garibaldi ◽  
E. Cisbani ◽  
F. Cusanno ◽  
S. Frullani ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Energy Resolution ◽  
Electron Scattering ◽  
Ground State ◽  
Missing Energy ◽  
High Quality ◽  
The Core ◽  
Final Data ◽  
First Time

The characteristics of the Jefferson LAB electron beam, together with those of the experimental equipments, offer a unique opportunity to study hypernuclear spectroscopy via electromagnetic induced reactions. Experiment 94-107 started a systematic study on 1p-shell targets, 12 C , 9 Be and 16 O . We present the results from 12 C , 16 O and very preliminary results from 9 Be . For 12 C for the first time measurable strength in the core-excited part of the spectrum between the ground state and the pΛ state was shown in [Formula: see text] for the first time. A high-quality 16Λ N spectrum was produced for the first time with sub-MeV Energy resolution. A very precise B Λ value for 16Λ N , calibrated against the elementary ( e , e ′ K +) reaction on hydrogen, has also been obtained. Final data on 9 Be will be available soon. The missing energy resolution is the best ever obtained in hypernuclear production experiments.

scholarly journals Jefferson Lab Report

2019 ◽  
Vol 218 ◽  
pp. 07002
Author(s):  
Eugene Chudakov
Keyword(s):  
Electron Beam ◽  
Standard Model ◽  
Electron Scattering ◽  
Research Direction ◽  
Beyond The Standard Model ◽  
Main Research ◽  
Atomic Nuclei ◽  
The Standard Model ◽  
Multidimensional Images ◽  
New Particles

Jefferson Laboratory is finishing a major upgrade and has already started operations with the 12 GeV continuous electron beam. The main research direction is the study of the structure of hadrons, including a search for gluon excitations in the spectra of light mesons and baryons, and studies of multidimensional images of the nucleon. Studied of certain properties of atomic nuclei are also ongoing. There is also an active program of searching for effects beyond the Standard Model in parity-violating electron scattering, as well as a search for new particles.

Resolution and contrast enhancement on biological specimens by means of electron spectroscopic imaging (ESI)

1986 ◽  
Vol 44 ◽  
pp. 68-69
Author(s):  
U. B. Hezel ◽  
R. Bauer ◽  
E. Zellmann ◽  
W. I. Miller
Keyword(s):  
Heavy Metals ◽  
Heavy Metal ◽  
Electron Beam ◽  
Contrast Enhancement ◽  
Electron Scattering ◽  
Biological Material ◽  
Spectroscopic Imaging ◽  
Chromatic Aberration ◽  
Electron Spectroscopic Imaging ◽  
Chromatic Aberrations

The main elemental constituents of biological material - C,H,N,O - are the same elements found in typical embedding materials. Because of this the contrast of unstained biological material is very poor. Additionally, electron scattering by low Z atoms is mainly inelastic resulting in unsharp images from the concomitant chromatic aberration.These effects have been delt with by employing stains of such heavy metals as Os, U, or Pb. These stains are for the most part located at the biological structures themselves and primarily scatter the electron beam elastically. Thus with ultra-thin (<80nm) heavy metal stained sections of biological material the contrast in the CTEM is very good and chromatic aberrations are negligable.

SELF-CONSIST CHARGING PROCESS OF POLYMER IRRADIATED BY INTERMEDIATE-ENERGY ELECTRON BEAM

2014 ◽  
Vol 21 (05) ◽  
pp. 1450062 ◽  
Author(s):  
JING LIU ◽  
HAI-BO ZHANG
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Electron Scattering ◽  
Charge Trapping ◽  
Intermediate Energy ◽  
Energy Electron ◽  
Charge Hole ◽  
Space Potential ◽  
Hole Charge ◽  
Peak Location

This paper reports on the electron scattering, charge transport and charge trapping of a polymer subjected to intermediate-energy electron beam in a self-consist charging model. Numerical simulation of a charging balance is performed using incident intermediate-energy electron current and leakage current, and the space charging characteristics are examined. The mechanisms involve various microscopic parameters that are related to the space potential and the characteristics of the polymer as well as to the effects of the space charge, electron charge, hole charge and trapped charge itself. The dynamic transporting and trapping properties of a polymer are investigated, and the space potential is evaluated using various parameters of irradiation. Trapping of electrons is determined using Poole–Frenkel trapping–detrapping mechanisms. Various types of space charging behavior are observed by controlling irradiation conditions. Furthermore, the peak location of space charge is simulated and validated by Sessler's experimental data in microscopic perspective.

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