scholarly journals High-Throughput Dry Processes for Large-Area Devices

10.2172/14928 ◽  
1999 ◽  
Author(s):  
RICHARD J. BUSS ◽  
GREGORY A. HEBNER ◽  
DOUGLAS S. RUBY ◽  
PIN YANG
Keyword(s):  
High Throughput ◽  
Large Area

OLED Manufacturing on Flexible Substrates Towards Roll-to-Roll

MRS Advances ◽  
2019 ◽  
Vol 4 (24) ◽  
pp. 1367-1375 ◽  
Author(s):  
Dongxiang Wang ◽  
Jacqueline Hauptmann ◽  
Christian May
Keyword(s):  
High Throughput ◽  
Present Status ◽  
Manufacturing Cost ◽  
Flexible Substrates ◽  
Large Area ◽  
Thin Glass ◽  
Production Capability ◽  
Roll To Roll ◽  
Pet Film

ABSTRACTLarge area lighting OLEDs manufactured in a Roll-to-Roll (R2R) fashion enable the well-longed production capability with considerably high throughput based on flexible substrates, hence largely reduced OLED manufacturing cost. This paper will outline the present status of R2R OLED fabrication on ultra-thin glass with the focus on transparent OLED devices and how to perform segmentation by printing of silver- and dielectric pastes. Ultra-thin glass (UTG) is laminated on a PET film to avoid fabrication interruptions when glass cracks occur during the Roll-to-Roll process. The R2R fabricated flexible OLEDs also show key-values comparable to conventional OLEDs fabricated on small rigid glass in lab-scale.

First light from a very large area pixel array for high-throughput x-ray polarimetry

2006 ◽  
Author(s):  
R. Bellazzini ◽  
G. Spandre ◽  
M. Minuti ◽  
L. Baldini ◽  
A. Brez ◽  
...  
Keyword(s):  
High Throughput ◽  
Large Area ◽  
X Ray ◽  
Pixel Array

scholarly journals Cost-Effective and High-Throughput Plasmonic Interference Coupled Nanostructures by Using Quasi-Uniform Anodic Aluminum Oxide

Coatings ◽  
2019 ◽  
Vol 9 (7) ◽  
pp. 420 ◽  
Author(s):  
Bae ◽  
Yu ◽  
Jung ◽  
Lee ◽  
Choi
Keyword(s):  
Aluminum Oxide ◽  
High Throughput ◽  
Anodic Aluminum Oxide ◽  
Noble Metals ◽  
Cost Effective ◽  
Plasmonic Nanostructures ◽  
Large Area ◽  
Plasmonic Material ◽  
Anodic Aluminum ◽  
The Cost

Large-area and uniform plasmonic nanostructures have often been fabricated by simply evaporating noble metals such as gold and silver on a variety of nanotemplates such as nanopores, nanotubes, and nanorods. However, some highly uniform nanotemplates are limited to be utilized by long, complex, and expensive fabrication. Here, we introduce a cost-effective and high-throughput fabrication method for plasmonic interference coupled nanostructures based on quasi-uniform anodic aluminum oxide (QU-AAO) nanotemplates. Industrial aluminum, with a purity of 99.5%, and copper were used as a base template and a plasmonic material, respectively. The combination of these modifications saves more than 18 h of fabrication time and reduces the cost of fabrication 30-fold. From optical reflectance data, we found that QU-AAO based plasmonic nanostructures exhibit similar optical behaviors to highly ordered (HO) AAO-based nanostructures. By adjusting the thickness of the AAO layer and its pore size, we could easily control the optical properties of the nanostructures. Thus, we expect that QU-AAO might be effectively utilized for commercial plasmonic applications.

Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Nanoscale ◽  
2020 ◽  
Vol 12 (19) ◽  
pp. 10584-10591 ◽  
Author(s):  
You Sin Tan ◽  
Hailong Liu ◽  
Qifeng Ruan ◽  
Hao Wang ◽  
Joel K. W. Yang
Keyword(s):  
Electron Beam ◽  
Plasma Treatment ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Large Area ◽  
Post Exposure ◽  
Closed Polygon

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

scholarly journals High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography

2016 ◽  
Vol 24 (17) ◽  
pp. 19112 ◽  
Author(s):  
Libin Sun ◽  
Xiaolin Hu ◽  
Qingjun Wu ◽  
Liansheng Wang ◽  
Jun Zhao ◽  
...  
Keyword(s):  
High Throughput ◽  
Interference Lithography ◽  
Large Area ◽  
X Ray ◽  
Color Filters
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