Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Nanoscale ◽  
2020 ◽  
Vol 12 (19) ◽  
pp. 10584-10591 ◽  
Author(s):  
You Sin Tan ◽  
Hailong Liu ◽  
Qifeng Ruan ◽  
Hao Wang ◽  
Joel K. W. Yang
Keyword(s):  
Electron Beam ◽  
Plasma Treatment ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Large Area ◽  
Post Exposure ◽  
Closed Polygon

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

Reflective electron-beam lithography: progress toward high-throughput production capability

2012 ◽  
Author(s):  
Regina Freed ◽  
Thomas Gubiotti ◽  
Jeff Sun ◽  
Francoise Kidwingira ◽  
Jason Yang ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Production Capability
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