Next-Generation Lithography (B): Betting on New Production Technology in the Semiconductor Industry

2006 ◽  
Author(s):  
Melissa M. Appleyard
Keyword(s):  
Production Technology ◽  
Semiconductor Industry ◽  
Next Generation ◽  
New Production ◽  
Next Generation Lithography

National Technology Policy in Global Markets: Developing Next-Generation Lithography in the Semiconductor Industry

2000 ◽  
Vol 2 (2) ◽  
pp. 93-113 ◽  
Author(s):  
Greg Linden ◽  
David C. Mowery ◽  
Rosemarie Ham Ziedonis
Keyword(s):  
Technology Policy ◽  
Technology Development ◽  
Semiconductor Industry ◽  
Department Of Energy ◽  
Development Programs ◽  
Next Generation ◽  
Cooperative Research ◽  
Post Cold War ◽  
Complex Technology ◽  
Next Generation Lithography

Since the late 1980s, the Cooperative Research and Development Agreement (CRADA) has been a prominent vehicle used to support collaboration between US federal laboratories and private firms. This paper examines the structure and goals of one of the most ambitious CRADAs conducted to date, the EUV CRADA, which involves three Department of Energy laboratories and leading US firms in the semiconductor industry and is aimed at the development of next-generation lithographic technologies. This large project is an important case study in ‘post-Cold-War’ technology policy and government-industry collaboration. Although the EUV project represents significant improvements in the design and management of CRADAs, it also illustrates the inherent difficulties of balancing political and economic goals in complex technology development programs.

Reduce process bias of photomask manufacturing for next-generation lithography

2004 ◽  
Author(s):  
Booky Lee ◽  
Sharon Wang ◽  
Toroy Tian ◽  
Samuel Yang ◽  
Roy Chen
Keyword(s):  
Next Generation ◽  
Next Generation Lithography

E-beam writing: a next-generation lithography approach for thin-film head critical features

2002 ◽  
Vol 38 (1) ◽  
pp. 95-100 ◽  
Author(s):  
R.E. Fontana ◽  
J. Katine ◽  
M. Rooks ◽  
R. Viswanathan ◽  
J. Lille ◽  
...  
Keyword(s):  
Thin Film ◽  
Next Generation ◽  
Next Generation Lithography
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