Magnetron Sputtering System for Novel Intrinsically Switchable Thin Film Ferroelectric Resonators and Filters

2012 ◽  
Author(s):  
Amir Mortazawi ◽  
Victor Lee
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Sputtering System

FORMATION OF TRIANGULAR Cu MICROCRYSTALS IN Ti/Cu/Si THIN FILMS DURING ANNEALING

2018 ◽  
Vol 25 (05) ◽  
pp. 1850097
Author(s):  
QIJING LIN ◽  
WEIXUAN JING ◽  
ZHUANGDE JIANG ◽  
NA ZHAO ◽  
ZIRONG WU ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rapid Thermal Annealing ◽  
Dc Magnetron Sputtering ◽  
Triangular Pyramid ◽  
Single Side ◽  
Surface Patterns ◽  
Cu Thin Film ◽  
Sputtering System

Sandwich stacked Ti/Cu/Si thin films were deposited on a single-side polished Si(111) substrate using DC magnetron sputtering system and annealed using a rapid thermal annealing (RTA) system. Complex dendritic patterns, whose branches are composed of Cu rods and triangular Cu microcrystals were obtained on Ti/Cu thin film annealed at 700[Formula: see text]C. The shape of one triangular Cu microcrystal is a truncated equilateral triangular pyramid with a flat top. Triangular Cu microcrystals grow in the number when Ti/Cu thin films are annealed at 800[Formula: see text]C. Experimental results show that anisotropy affects the growth of surface patterns and the top Ti capping layer works as a protection for the underlying Cu layer from oxidation.

Deposition of AZO thin film using RF and ICP at facing magnetron sputtering system

2014 ◽  
Vol 259 ◽  
pp. 39-43 ◽  
Author(s):  
Hye Ran Kim ◽  
Jay Bum Kim ◽  
Yoon Seok Choi ◽  
Masaru Hori ◽  
Jeon Geon Han
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Azo Thin Film ◽  
Sputtering System

Design, plasma studies, and ion assisted thin film growth in an unbalanced dual target magnetron sputtering system with a solenoid coil

Vacuum ◽  
2000 ◽  
Vol 56 (2) ◽  
pp. 107-113 ◽  
Author(s):  
C Engström ◽  
T Berlind ◽  
J Birch ◽  
L Hultman ◽  
I.P Ivanov ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Film Growth ◽  
Thin Film Growth ◽  
Solenoid Coil ◽  
Dual Target ◽  
Sputtering System

scholarly journals Investigation of various properties of HfO 2 -TiO 2 thin film composites deposited by multi-magnetron sputtering system

2017 ◽  
Vol 421 ◽  
pp. 170-178 ◽  
Author(s):  
M. Mazur ◽  
A. Poniedziałek ◽  
D. Kaczmarek ◽  
D. Wojcieszak ◽  
J. Domaradzki ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thin Film Composites ◽  
Sputtering System ◽  
Film Composites

Effect of Operated Pressure on Anticorrosive Behavior of Ta2O5 Thin Film Grown by D.C. Reactive Magnetron Sputtering System

2013 ◽  
Vol 802 ◽  
pp. 242-246 ◽  
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Yossawat Rayanasukha ◽  
Darinee Phromyothin ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
High Performance ◽  
Film Surface ◽  
Grazing Incidence ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Sputtering System

Tantalum oxide (Ta2O5) thin films, 100 nm thick were deposited by D.C. reactive magnetron sputtering system at different operated pressure on unheated p-type silicon (100) wafer and 304 stainless substrates. Their crystalline structure, film surface morphology and optical properties, as well as anticorrosive behavior, were investigated. The structure and morphology of films were characterized by grazing-incidence X-ray diffraction (GIXRD) and atomic force microscopy (AFM). The optical properties were determined by spectroscopic ellipsometry (SE). The corrosion performances of the films were investigated through potentiostat and immersion tests in 1 M NaCl solutions. The results showed that as-deposited Ta2O5 thin films were amorphous. The refractive index varied from 2.06 to 2.17 (at 550 nm) with increasing operated pressure. The corrosion rate of Ta2O5 thin film improves as the operated pressure decreases. The Ta2O5 thin films deposited at 3 mTorr operated pressure could be exhibited high performance anticorrosive behavior.

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