Use of RF Bias in LAPPS (Large Area Plasma Processing System)

2000 ◽  
Author(s):  
Wallace M. Manheimer ◽  
Martin Lampe ◽  
Richard F. Fernsler
Keyword(s):  
Plasma Processing ◽  
Processing System ◽  
Large Area

Theoretical overview of the large-area plasma processing system (LAPPS)

2000 ◽  
Vol 9 (3) ◽  
pp. 370-386 ◽  
Author(s):  
Wallace M Manheimer ◽  
Richard F Fernsler ◽  
Martin Lampe ◽  
Robert A Meger
Keyword(s):  
Plasma Processing ◽  
Processing System ◽  
Large Area ◽  
Theoretical Overview

Use of radio frequency bias in the large area plasma processing system

2001 ◽  
Vol 19 (2) ◽  
pp. 490-498 ◽  
Author(s):  
Wallace M. Manheimer ◽  
Martin Lampe ◽  
Richard F. Fernsler
Keyword(s):  
Radio Frequency ◽  
Plasma Processing ◽  
Processing System ◽  
Large Area

Plasma diagnostics in large area plasma processing system

2001 ◽  
Vol 19 (4) ◽  
pp. 1367-1373 ◽  
Author(s):  
D. Leonhardt ◽  
S. G. Walton ◽  
D. D. Blackwell ◽  
W. E. Amatucci ◽  
D. P. Murphy ◽  
...  
Keyword(s):  
Plasma Diagnostics ◽  
Plasma Processing ◽  
Processing System ◽  
Large Area

Theoretical Overview of the Large Area Plasma Processing System (LAPPS)

2000 ◽  
Author(s):  
Wallace M. Manheimer ◽  
Richard Fernsler ◽  
Martin Lampe ◽  
Robert Meger
Keyword(s):  
Plasma Processing ◽  
Processing System ◽  
Large Area ◽  
Theoretical Overview

Linear arc discharge source for large area plasma processing

1997 ◽  
Vol 70 (5) ◽  
pp. 577-579 ◽  
Author(s):  
L. Bárdoš ◽  
H. Baránková ◽  
S. Berg
Keyword(s):  
Arc Discharge ◽  
Plasma Processing ◽  
Large Area ◽  
Discharge Source
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