scholarly journals Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

2006 ◽  
Vol 114 (1325) ◽  
pp. 77-81 ◽  
Author(s):  
Masakazu KAWASHITA ◽  
Hiroshi SHIMATANI ◽  
Satomi ITOH ◽  
Rei ARAKI ◽  
Gikan H. TAKAOKA
Author(s):  
Masakazu Kawashita ◽  
Satomi Itoh ◽  
Kazunori Miyamoto ◽  
Rei Araki ◽  
Gikan H. Takaoka

2007 ◽  
Vol 330-332 ◽  
pp. 111-114 ◽  
Author(s):  
Kawashita Masakazu ◽  
Satomi Itoh ◽  
Kazunori Miyamoto ◽  
Rei Araki ◽  
Gikan H. Takaoka

Polyethylene (PE) substrates were irradiated at a dose of 1×1015 ions·cm−2 by the simultaneous use of oxygen (O2) cluster and monomer ion beams. The acceleration voltage for the ion beams was 7 kV. Unirradiated and irradiated PE substrates were soaked in simulated body fluid with ion concentrations 1.5 times of those of human blood plasma (1.5SBF) for 7 days. The irradiated PE substrate formed apatite on its surface, whereas unirradiated one did not form it. This is attributed to the formation of functional groups effective for apatite nucleation, such as COOH groups, on the substrate surface by the simultaneous use of O2 cluster and monomer ion beams. In addition, the apatite-forming ability of the irradiated substrate was improved by the subsequent CaCl2 treatment. This suggests that Ca2+ ions present on the substrate surface accelerated the apatite deposition. We can conclude that apatite-forming ability can be induced on surface of polyethylene by the simultaneous use of O2 cluster and monomer ion beams.


1997 ◽  
Vol 504 ◽  
Author(s):  
J. Matsuo ◽  
W. Qin ◽  
M. Akizuki ◽  
T. Yodoshi ◽  
I. Yamada

ABSTRACTA new oxide film formation technique using gas-cluster ion beams has been developed. 02 cluster ions were used to irradiate during the evaporation of metal atoms, and PbOx and In203 films were grown. At the acceleration voltages above 5 kV, polycrystalline PbOx films preferentially oriented to (111) were obtained. A significant smoothing effect was observed with an acceleration voltage as low as 1 kV. An average surface roughness of 0.9 nm was obtained at 7 kV. Oxygen cluster ion beams are also utilized to grow In203 films, which are widely used as conductive-transparent films in flat panel display. In203 was deposited on glass or silicon substrates with simultaneous irradiation with an oxygen cluster ion beam. Highly transparent (80%) and low resistivity (<4×10−4 Ωcm) films were obtained with 7keV oxygen cluster ion beams. Kinetic energy of above 3keV is necessary to obtain low resistivity films. These results clearly indicate that the kinetic energy of the cluster is effectively used to enhance oxidation on the surface without radiation damage, in spite of the high acceleration voltages.


2007 ◽  
Vol 82A (4) ◽  
pp. 995-1003 ◽  
Author(s):  
M. Kawashita ◽  
S. Itoh ◽  
R. Araki ◽  
K. Miyamoto ◽  
G. H. Takaoka

Author(s):  
N. Toyoda ◽  
M. Kojima ◽  
R. Hinoura ◽  
A. Yamaguchi ◽  
K. Hara ◽  
...  

Author(s):  
S. Houzumi ◽  
T. Mashita ◽  
N. Toyoda ◽  
K. Mochiji ◽  
T. Mitamura ◽  
...  

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