Studies of Surface Composition and Phase Transition of Mo-5%Re(1O0)

1986 ◽  
Vol 83 ◽  
Author(s):  
G. -C. Wang ◽  
D. M. Zehner ◽  
H. C. Eaton
Keyword(s):  
Phase Transition ◽  
Photoelectron Spectroscopy ◽  
Room Temperature ◽  
Surface Composition ◽  
Structural Phase ◽  
Alloy Surface ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Low Energy Electron ◽  
Gas Contamination

ABSTRACTSurface composition of a clean Mo-5%Re(100) alloy was determined quantitatively by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy. A slight enrichment of Re on the alloy surface was found at and below room temperatures and the result is consistent with the prediction by a graphical approach for segregation. The change of surface composition due to gas contamination and sputtering were also studied. In contrast to the pure Mo(100) surface where a structural phase transition occurs below room temperature, low energy electron diffraction showed no structural change down to 160 K. However, for H, CO, N chemisorptions and C segregation on the alloy surface, LEED patterns similar to the ones observed from a pure Mo(100) surface were observed.

Surface Band Structure Studies of Si Rich Reconstructions on 4H-SiC(1-100)

2005 ◽  
Vol 483-485 ◽  
pp. 547-550 ◽  
Author(s):  
Konstantin V. Emtsev ◽  
Thomas Seyller ◽  
Lothar Ley ◽  
A. Tadich ◽  
L. Broekman ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Electron Diffraction ◽  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Ultraviolet Photoelectron Spectroscopy ◽  
Surface Band ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Different Temperatures ◽  
Low Energy Electron

We have investigated Si-rich reconstructions of 4H-SiC( 00 1 1 ) surfaces by means of low-energy electron diffraction (LEED), x-ray photoelectron spectroscopy (XPS), and angleresolved ultraviolet photoelectron spectroscopy (ARUPS). The reconstructions of 4H-SiC( 00 1 1 ) were prepared by annealing the sample at different temperatures in a flux of Si. Depending on the temperature different reconstructions were observed: c(2×2) at T=800°C, c(2×4) at T=840°C. Both reconstructions show strong similarities in the electronic structure.

Fluorine Atom Addition to the Diamond (111) Surface

1992 ◽  
Vol 242 ◽  
Author(s):  
Andrew Freedman ◽  
Gary N. Robinson ◽  
Charter D. Stinespring
Keyword(s):  
Electron Diffraction ◽  
Photoelectron Spectroscopy ◽  
Fluorine Atom ◽  
Low Energy ◽  
Diamond Surface ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Atomic Fluorine ◽  
Low Energy Electron ◽  
Diffraction Patterns

ABSTRACTDiamond (111) surfaces with the dehydrogenerated 2×1 reconstruction have been exposed to a beam of atomic fluorine at 300 K. The uptake of fluorine, as measured using X-ray photoelectron spectroscopy, is quite efficient and saturates at a coverage of less than a monolayer. Low energy electron diffraction patterns indicate that fluorine termination of the diamond surface produces a lxi bulk-like reconstruction in contrast to the disordered surface produced on the (100) surface.

The growth of AuGa2 thin films on GaAs(001) to form chemically unreactive interfaces

1986 ◽  
Vol 1 (4) ◽  
pp. 537-542 ◽  
Author(s):  
Jeffrey R. Lince ◽  
Tsai C. Thomas ◽  
Williams R. Stanley
Keyword(s):  
Electron Spectroscopy ◽  
Auger Electron ◽  
Room Temperature ◽  
Substrate Surface ◽  
Film Deposition ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Interface Roughening ◽  
Low Energy Electron ◽  
Electron Energy Loss

Thin AuGa2 films were grown by codeposition from separate Au and Ga evaporation sources on clean GaAs(001) substrates in ultrahigh vacuum, and were studied by Auger electron spectroscopy, electron energy-loss spectroscopy, low-energy electron diffraction, scanning electron microscopy, and x-ray diffractometry. The morphology and crystallinity of the AuGa2 were highly dependent upon the film deposition and annealing history. Films grown on room-temperature substrates were continuous, specular, and polycrystalline, but the dominant orientation was with the (001) planes of the crystallites parallel to the substrate surface. Annealing to temperatures between 300°and 480°C caused the film to break up and coalesce into rectangular crystallites, which were all oriented with (001) parallel to the surface. An anneal to 500°C, which is above the AuGa2 melting point, resulted in the formation of irregular polycrystalline islands of AuGa2 on the GaAs(001) substrate. No interface roughening or chemical reactions between the film and substrate or interface were observed for even the highest-temperature anneals.

Chemisorption Geometry, Vibrational Spectra, and Thermal Desorption of Formic Acid on TiO2(110)

1998 ◽  
Vol 05 (01) ◽  
pp. 381-385 ◽  
Author(s):  
S. A. Chambers ◽  
M. A. Henderson ◽  
Y. J. Kim ◽  
S. Thevuthasan
Keyword(s):  
Formic Acid ◽  
Photoelectron Spectroscopy ◽  
High Energy ◽  
Decomposition Products ◽  
X Ray ◽  
Low Energy Electron Diffraction ◽  
Resolution Electron ◽  
Low Energy Electron ◽  
Temperature Programmed ◽  
Electron Energy Loss

We have used high-energy X-ray photoelectron spectroscopy and diffraction (XPS/XPD), low-energy electron diffraction (LEED), high-resolution electron energy loss spectroscopy (HREELS) and temperature-programmed desorption (TPD) to determine the molecular orientation, long-range order, vibrational frequencies, and desorption temperatures for formic acid and its decomposition products on TiO 2(110). Molecular adsorption occurs at coverages approaching one monolayer, producing a weakly ordered (2 × 1) surface structure. High-energy XPD reveals that the formate binds rigidly in a bidentate fashion through the oxygens to Ti cation rows along the [001] direction with an O–C–O bond angle of 126 ± 4°. During TPD some surface protons and formate anions recombine and desorb as formic acid above 250 K. However, most of the decomposition products follow reaction pathways leading to H 2 O , CO and H 2 CO desorption. Water is formed in TPD below 500 K via the abstraction of lattice oxygen by deposited acid protons.

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