Surface Science Investigations of Thin Metal Films on Metal and Metal Oxide Supports

1986 ◽  
Vol 83 ◽  
Author(s):  
J. M. White
Keyword(s):  
Thin Film ◽  
Surface Science ◽  
Dissociative Adsorption ◽  
Metal Films ◽  
Model Systems ◽  
Oxide Supports ◽  
Thin Film Model ◽  
No Chemisorption ◽  
Science Investigations ◽  
Significant Chemical

ABSTRACTChemisorption and catalysis on overlayer metals and metal oxides is rich and complex. Thin film model systems, suitable for UHV surface science, are attractive candidates for studying the fundamental interactions involved. In this paper, we discuss three examples: (1) O2 and N2O dissociative adsorption on Cu-covered Ru(0001), (2) molecular CO chemisorption on K-covered Ag(111), and (3) CO, H2 and NO chemisorption on clean and TiOx covered Pt and Rh. In each of these cases, evidence is presented for significant chemical interactions between the two substrate materials.

scholarly journals Nanostructured, mesoporous Au/TiO2 model catalysts – structure, stability and catalytic properties

2011 ◽  
Vol 2 ◽  
pp. 593-606 ◽  
Author(s):  
Matthias Roos ◽  
Dominique Böcking ◽  
Kwabena Offeh Gyimah ◽  
Gabriela Kucerova ◽  
Joachim Bansmann ◽  
...  
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Catalytic Properties ◽  
Model Catalysts ◽  
Model Systems ◽  
Structure Stability ◽  
Titanium Tetraisopropoxide ◽  
X Ray ◽  
Film Model ◽  
Thin Film Model

Aiming at model systems with close-to-realistic transport properties, we have prepared and studied planar Au/TiO2 thin-film model catalysts consisting of a thin mesoporous TiO2 film of 200–400 nm thickness with Au nanoparticles, with a mean particle size of ~2 nm diameter, homogeneously distributed therein. The systems were prepared by spin-coating of a mesoporous TiO2 film from solutions of ethanolic titanium tetraisopropoxide and Pluronic P123 on planar Si(100) substrates, calcination at 350 °C and subsequent Au loading by a deposition–precipitation procedure, followed by a final calcination step for catalyst activation. The structural and chemical properties of these model systems were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), N2 adsorption, inductively coupled plasma ionization spectroscopy (ICP–OES) and X-ray photoelectron spectroscopy (XPS). The catalytic properties were evaluated through the oxidation of CO as a test reaction, and reactivities were measured directly above the film with a scanning mass spectrometer. We can demonstrate that the thin-film model catalysts closely resemble dispersed Au/TiO2 supported catalysts in their characteristic structural and catalytic properties, and hence can be considered as suitable for catalytic model studies. The linear increase of the catalytic activity with film thickness indicates that transport limitations inside the Au/TiO2 film catalyst are negligible, i.e., below the detection limit.

scholarly journals Carbon tolerance of Ni–Cu and Ni–Cu/YSZ sub-μm sized SOFC thin film model systems

2017 ◽  
Vol 402 ◽  
pp. 1-11 ◽  
Author(s):  
Thomas Götsch ◽  
Thomas Schachinger ◽  
Michael Stöger-Pollach ◽  
Reinhard Kaindl ◽  
Simon Penner
Keyword(s):  
Thin Film ◽  
Model Systems ◽  
Film Model ◽  
Thin Film Model

The effect of long-range order on intermolecular interactions in organic semiconductors: zinc octaethyl porphyrin molecular thin film model systems

2019 ◽  
Vol 21 (41) ◽  
pp. 22966-22975
Author(s):  
A. Kumar ◽  
D. Naumenko ◽  
G. Rossi ◽  
E. Magnano ◽  
S. Nappini ◽  
...  
Keyword(s):  
Thin Film ◽  
Intermolecular Interactions ◽  
Long Range ◽  
Organic Semiconductors ◽  
Molecular Orientation ◽  
Film Growth ◽  
Thin Film Growth ◽  
Model Systems ◽  
Long Range Order ◽  
Thin Film Model

Influence of the ZnOEP thin film growth procedure on molecular orientation, crystalline molecular packing and on intermolecular interactions.

Interaction of water with oxide thin film model systems

2019 ◽  
Vol 34 (3) ◽  
pp. 360-378 ◽  
Author(s):  
Martin Sterrer ◽  
Niklas Nilius ◽  
Shamil Shaikhutdinov ◽  
Markus Heyde ◽  
Thomas Schmidt ◽  
...  
Keyword(s):  
Thin Film ◽  
Model Systems ◽  
Oxide Thin Film ◽  
Film Model ◽  
Thin Film Model ◽  
Image Position

Abstract

Electron Microscope Observations of Mechanisms of thin Film Delamination from Substrates

1988 ◽  
Vol 119 ◽  
Author(s):  
D. Goyal ◽  
A. H. King
Keyword(s):  
Thin Film ◽  
Electron Microscope ◽  
Film Formation ◽  
Single Crystal Silicon ◽  
Metal Films ◽  
Model Systems ◽  
Silicon Substrates ◽  
Formation Model ◽  
Crystal Silicon ◽  
Transmission Electron

AbstractTransmission electron microscope techniques have been applied to the problem of thin film delamination from substrates during film formation. Model systems involving metal films on single crystal silicon substrates have been used and it is found that delamination of the films is initiated by the formation of damage in the substrate. This understanding removes some of the fundamental problems regarding delamination.

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