Tunneling Conductivity in Thermally Oxidized Porous Silicon

2003 ◽  
Vol 770 ◽  
Author(s):  
Dmitrii G. Yarkin ◽  
Leonid A. Balagurov ◽  
Andrei F. Orlov ◽  
Igor P. Zvyagin
Keyword(s):  
Porous Silicon ◽  
Space Charge ◽  
Forward Bias ◽  
Exponential Dependence ◽  
Si Substrates ◽  
Current Voltage ◽  
Tunneling Conductivity ◽  
Type C ◽  
Current Voltage Characteristics ◽  
Oxidized Porous Silicon

AbstractMetal/PS/c-Si structures with porous silicon (PS) layers of 55-75% porosity were fabricated on moderately doped p- and n-type c-Si substrates and were thermally oxidized at 400-960°C. The effect of oxidation on the photoluminescence and the transport of charge carriers in these structures were studied. We demonstrated that trap-filled space charge limited current (SCLC) is the dominant transport mechanism at large forward bias. The analysis of the current – voltage characteristics in the SCLC region allowed us to determine the oxidation dependence of the effective thickness of the trap-rich tissue isthmuses, in which space charge is mostly accumulated. The exponential dependence of the ohmic conductance on the thickness of SiOX tissue is explained by tunneling of carriers through potential barriers formed by the tissue surrounding silicon crystallites.

Peculiarities of the current-voltage characteristics of oxidized porous silicon

2003 ◽  
Vol 29 (6) ◽  
pp. 459-460 ◽  
Author(s):  
M. S. Ablova ◽  
M. V. Zamoryanskaya ◽  
V. I. Sokolov ◽  
R. I. Khasanov
Keyword(s):  
Porous Silicon ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Oxidized Porous Silicon

Photoluminescence and Electroluminescence in Partially Oxidized Porous Silicon

1994 ◽  
Vol 358 ◽  
Author(s):  
L. Tsybeskov ◽  
S. P. Duttagupta ◽  
P. M. Fauchet
Keyword(s):  
Activation Energy ◽  
Porous Silicon ◽  
Power Law ◽  
Current Density ◽  
Crystalline Silicon ◽  
Exponential Law ◽  
Current Voltage ◽  
Device Applications ◽  
Current Voltage Characteristics ◽  
Oxidized Porous Silicon

ABSTRACTThe results of photoluminescence (PL) and electroluminescence (EL) studies from partially oxidized porous silicon (POPS) layers are presented. The PL from POPS is stable, peaks at 600-570 nm and its temperature dependence can be fitted by an exponential law with an activation energy Ea « 10 meV. The current-voltage characteristics of Au-(POPS)-crystalline silicon (c-Si) structures follow a power law I = Vn. When the index n becomes higher than 3, electroluminescence (EL) is found. The EL peaks at 760 nm and is stable for more than 100 hours of operation. The intensity of the EL is a linear function of current for all measured structures up to current density J ≈ 1 A/cm2. Our results suggest that partially oxidized porous silicon is more useful for device applications than freshly anodized porous silicon which has unstable properties or than fully oxidized porous silicon in which transport is poor.

scholarly journals Nanostructured Cu2ZnSnS4 Thin Films on Porous-Si Wafer

2019 ◽  
Vol 8 (1) ◽  
pp. 28-33
Author(s):  
M. A. Jafarov ◽  
E. F. Nasirov ◽  
S. A. Jahangirova ◽  
R. Mammadov
Keyword(s):  
Solar Cell ◽  
Forward Bias ◽  
Etching Time ◽  
Reverse Bias Voltage ◽  
Si Substrates ◽  
Current Voltage ◽  
Current Variation ◽  
Photo Response ◽  
Type C ◽  
P Type

 Nanostructure CZTS thin film was fabricated by electrodeposition technique. To manufacture the heterojunctions, p-type c-Si wafers of (100) orientation were used as a substrate.  Before anodization, the surface of the c-Si substrates were etched in an aqueous solution of HF and further washed in distilled water (at temperature of 80°С and ethyl alcohol and then dried in air. The current-voltage characteristics of the CZTS /PS solar cell under dark conditions show that forward bias current variation approximately exponentially with voltage bias. The capacitance for Nano- CZTS /PS Solar Cell decreases with the increase of the reverse bias voltage and with the increasing of etching time of nPS layers. That heterojunctions demonstrate good photo-response in the wavelength range of 510 - 650 nm.

Process and Simulation of TiSi2/n+/p Silicon Shallow Junctions

1991 ◽  
Vol 235 ◽  
Author(s):  
Ying Wu ◽  
W. Savin ◽  
T. Fink ◽  
N. M. Ravindra ◽  
R. T. Lareau ◽  
...  
Keyword(s):  
Electrical Characterization ◽  
Furnace Annealing ◽  
Si Substrates ◽  
Conventional Furnace ◽  
Mass Spec ◽  
Current Voltage ◽  
Shallow Junctions ◽  
Current Voltage Characteristics ◽  
Secondary Ion

ABSTRACTExperimental analysis and simulation of the formation and electrical characterization of TiSi2/+/p-Si shallow junctions are presented here. The formation of shallow n+-p junction, by ion implantation of As through Ti films evaporated on p-Si substrates followed by Rapid Thermal Annealing (RTA) and conventional furnace annealing has been performed in these experiments. Structural techniques such as Secondary Ion Mass Spec-troscopy (SIMS) and Rutherford Backscattering (RBS) experiments have been employed to characterize these devices. RUMP simulations were used to analyze and interpret the RBS data. Current-voltage characteristics have been simulated using PISCES simulator.

Ferroelectric Property and Microstructures of La-Doped Bi4Ti3O12 Thin Films

2013 ◽  
Vol 537 ◽  
pp. 114-117
Author(s):  
X.A. Mei ◽  
Rui Fang Liu ◽  
C.Q. Huang ◽  
J. Liu
Keyword(s):  
Thin Films ◽  
Hysteresis Loops ◽  
Differential Resistance ◽  
Rf Magnetron Sputtering ◽  
Layered Perovskite ◽  
Random Orientation ◽  
Si Substrates ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
La Doped

La-doped bismuth titanate (Bi4-xLaxTi3O12: BLT) and pure Bi4Ti3O12 (BIT) thin films with random orientation were fabricated on Pt/Ti/SiO2/Si substrates by rf magnetron sputtering technique. These samples had polycrystalline Bi-layered perovskite structure without preferred orientation, and consisted of well developed rod-like grains with random orientation. For the samples with x=0.25 and 1.0 the current-voltage characteristics exhibited negative differential resistance behaviors and their P-V hysteresis loops were characterized by large leakage current, whereas for the samples with x=0.5 and 0.75 the current-voltage characteristics showed simple ohmic behaviors and their P-V hysteresis loops were the saturated and undistorted hysteresis loops. The remanent polarization ( Pr ) and coercive field (Ec) of the BLT ceramic with x=0.75 were above 20μC/cm2 and 85KV/cm , respectively.

Evolution of the current-voltage characteristics of photoluminescing porous silicon during chemical etching

1997 ◽  
Vol 31 (12) ◽  
pp. 1221-1224 ◽  
Author(s):  
T. Ya. Gorbach ◽  
S. V. Svechnikov ◽  
P. S. Smertenko ◽  
P. G. Tul’chinskii ◽  
A. V. Bondarenko ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Chemical Etching ◽  
Current Voltage ◽  
Current Voltage Characteristics

Optical Properties of Free-Standing Ultrahigh Porosity Silicon Films Prepared by Supercritical Drying

1996 ◽  
Vol 452 ◽  
Author(s):  
J. Von Behren ◽  
P. M. Fauchet ◽  
E. H. Chimowitz ◽  
C. T. Lira
Keyword(s):  
Porous Silicon ◽  
Electrochemical Etching ◽  
Supercritical Drying ◽  
Silicon Films ◽  
Index Of Refraction ◽  
Free Standing ◽  
Crystal Silicon ◽  
Si Substrates ◽  
Type C ◽  
P Type

AbstractHighly luminescent free-standing porous silicon thin films of excellent optical quality have been manufactured by using electrochemical etching and lift-off steps combined with supercritical drying. One to 50 μm thick free-standing layers made from highly (p+) and moderately (p) Boron doped single crystal silicon (c-Si) substrates have been produced with porosities (P) up to 95 %. The Fabry-Pérot fringes observed in the transmission and photoluminescence (PL) spectra are used to determine the refractive index. At the highest P the index of refraction is below 1.2 from the IR to 2 eV. The absorption coefficients follow a nearly exponential behavior in the energy range from 1.2 eV and 4 eV. The porosity corrected absorption spectra of free-standing films made from p type c-Si substrates are blue shifted with respect to those prepared from p+ substrates. For P > 70 % a blue shift is also observed in PL. At equal porosities the luminescence intensities of porous silicon films made from p+ and p type c-Si are different by one order of magnitude.

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