Inductively-Coupled Plasma Nitriding of Fused Silica

1986 ◽  
Vol 75 ◽  
Author(s):  
T. K. Vethanayagam ◽  
P. F. Johnson
Keyword(s):  
Surface Temperature ◽  
Nitrogen Content ◽  
Process Parameters ◽  
Inductively Coupled Plasma ◽  
Treatment Time ◽  
Plasma Nitriding ◽  
Hydrogen Plasma ◽  
Fused Silica ◽  
Rf Discharge ◽  
Inductively Coupled

AbstractPlasma nitriding of fused silica has been performed over a temperature range of 750°C to 1300°C in a nitrogen-hydrogen plasma generated by an inductively coupled RF discharge. The plasma is used as both thermal and chemical source. The effects of various process parameters such as surface temperature, gas pressure and treatment time on total nitrogen content have been studied. The advantages and the drawbacks of this direct plasma nitriding technique are briefly discussed.

Effect of the process parameters of inductively coupled plasma reactive ion etching on the fabrication of diamond nanotips

2014 ◽  
Vol 211 (10) ◽  
pp. 2343-2346 ◽  
Author(s):  
Hasan-al Mehedi ◽  
Vianney Mille ◽  
Jocelyn Achard ◽  
Ovidiu Brinza ◽  
Alix Gicquel
Keyword(s):  
Process Parameters ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

ICP Etching of 4H-SiC Substrates

2013 ◽  
Vol 740-742 ◽  
pp. 825-828 ◽  
Author(s):  
Jerome Biscarrat ◽  
Jean François Michaud ◽  
Emmanuel Collard ◽  
Daniel Alquier
Keyword(s):  
Process Parameters ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Etch Rate ◽  
Effective Technique ◽  
Working Pressure ◽  
Inductively Coupled ◽  
Icp Etching ◽  
High Etch Rate ◽  
The Impact

Due to its inert chemical nature, plasma etching is the most effective technique to pattern SiC. In this paper, dry etching of 4H-SiC substrate in Inductively Coupled Plasma (ICP) has been studied in order to evaluate the impact of process parameters on the characteristics of etching such as etch rate and trenching effect. Key process parameters such as platen power and ICP coil power prove to be essential to control the SiC etch rate. On the other hand, the ICP coil power and the working pressure mainly master the trenching effect. Our results enlighten that high etch rate with minimal trenching effect can be obtained using high ICP coil power and low working pressure.

Ultrasonic-Assisted Dialysis Coupled with CE-ICP-OES for Determination of Calcium Species in the Dialysate of Human Blood

2011 ◽  
Vol 343-344 ◽  
pp. 769-773
Author(s):  
Bi Yang Deng ◽  
Xiang Shu Xu ◽  
Ying Zi Wang ◽  
Ping Chuan Zhu
Keyword(s):  
Human Blood ◽  
Inductively Coupled Plasma ◽  
Optical Emission ◽  
Fused Silica ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Buffer Solution ◽  
Inductively Coupled ◽  
Ultrasonic Assisted ◽  
Fused Silica Capillary

The analytical method for calcium species in human blood was studied using ultrasonic-assisted dialysis coupled with capillary electrophoreisi (CE) inductively coupled plasma optical emission spectrometry (ICP-OES). The optimal ultrasonic dialysis conditions were 72 W power, 60 min extraction time and 70 μL volume of blood sample. Ultrasonic-assisted dialysis improves significantly the dialysis efficiecy by comparing with balance dialysis. The optimized conditions of separation and detection (a 120 cm length×100 μm i.d. fused-silica capillary, 20 kV separation voltage, 30 mmol/L Tris-HCl with pH7.4 buffer solution) for calcium species were achieved by CE-ICP-OES. The forms of calcium in the dialysate of human blood have five different species. The concentration of free Ca2+ in the dialysate was 0.7 mg/L. The hyphenated technique is simple and convenience, which is fit for the separation and analysis of metal-containing biological samples.

High Throughput Speciation Analysis of Mercury in Water Environment by Short Column Capillary Electrophoresis On-Line Coupled with Inductively Coupled Plasma Mass Spectrometry

2011 ◽  
Vol 383-390 ◽  
pp. 790-795
Author(s):  
Bao Hui Li ◽  
Bao Juan Tian
Keyword(s):  
Mass Spectrometry ◽  
Capillary Electrophoresis ◽  
High Throughput ◽  
Inductively Coupled Plasma ◽  
Speciation Analysis ◽  
Fused Silica ◽  
Short Column ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Plasma Mass Spectrometry

A method for mercury high throughput rapid speciation analysis was built by short column capillary electrophoresis (SC-CE) coupled with inductively coupled plasma mass spectrometry (ICP-MS). A micromist nebulizer was employed to increase the nebulization efficiency and a laboratory-made removable SC-CE-ICP-MS interface on the basis of cross design was applied to alleviate buffer contamination of ICP-MS. In less than 60 s methylmercury (MeHg(I)) and inorganic mercury (Hg(II)) were separated in a 16 × 75 μm i.d. short column fused-silica capillary at 21 kV, while a mixture of 30 mmol/L boric aicd + 5% (v/v) CH3OH (pH=8.60) acted as running electrolyte. The precisions (RSD, n=5) of migration time and peak area for MeHg(I) and Hg(II) were in the range of 1.4-2.6% and 3.3-3.4%, respectively. The limits of detection (3σ) mercury species were 9.7 and 12.0 μg/L, respectively. The recoveries for Hg(II) MeHg(I) were in the range of 96-107% and 99-105%.

Silicon quantum dots embedded in amorphous SiC matrix for third-generation solar cells: Microstructure control by RF discharge power

2015 ◽  
Vol 08 (05) ◽  
pp. 1550054 ◽  
Author(s):  
Qijin Cheng ◽  
Igor Levchenko ◽  
Denyuan Song ◽  
Shuyan Xu ◽  
Kostya Ken Ostrikov
Keyword(s):  
Quantum Dots ◽  
Solar Cells ◽  
Inductively Coupled Plasma ◽  
Low Frequency ◽  
Rf Discharge ◽  
Third Generation ◽  
Silicon Quantum Dots ◽  
Inductively Coupled ◽  
Carbide Matrix ◽  
Photovoltaic Solar Cells

A low-frequency (460 kHz), low-pressure, thermally non-equilibrium, high-density inductively coupled plasma (ICP) has been used to synthesize a novel, advanced photovoltaic material suitable for fabrication of third-generation solar cells. Silicon quantum dots (SQDs) embedded in an amorphous silicon carbide matrix were prepared at a very low substrate temperature of approximately 200°C without any hydrogen dilution. The effect of the radio-frequency (RF) power of the plasma discharge on the morphology and structure of the embedded quantum dots was studied. A brief discussion on the possible mechanisms of the quantum dot formation in the ICP is presented. This study is relevant to third-generation photovoltaic solar cells.

Mechanistic Studies of Chromium Speciation with Thermospray

2002 ◽  
Vol 56 (9) ◽  
pp. 1152-1160 ◽  
Author(s):  
Xiaohua Zhang ◽  
John A. Koropchak
Keyword(s):  
Inductively Coupled Plasma ◽  
Atomic Emission ◽  
Deposition Process ◽  
Fused Silica ◽  
Chromium Speciation ◽  
Aerosol Formation ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Fused Silica Capillary ◽  
Plasma Mass Spectrometry

Thermospray (TSP) coupled with inductively coupled plasma-atomic emission spectroscopy (ICP-AES) or inductively coupled plasma-mass spectrometry (ICP-MS) has been developed as a non-chromatographic method for chromium speciation to quantitatively separate and determine two chromium oxidation states: Cr(III) and Cr(VI). The limits of detection can reach 0.5 ng/mL with ICP-AES detection and 50 pg/mL with ICP-MS detection. The basis for this speciation method is that Cr(III) can selectively and nearly quantitatively deposit inside a thermospray system as Cr2O3, while Cr(VI) does not. To fully understand the mechanism of this deposition process, four questions were investigated: is aerosol formation necessary for the reaction to occur? Does the deposition occur in the aerosol or liquid regime? Does the deposit tend to be retained on the surface of the fused silica capillary? Can the reaction be predicted from thermodynamic calculations? These studies show that this reaction happens before solvent evaporates (i.e., the liquid regime). The high temperature inside the thermospray system is the major factor triggering this reaction. At the same time, the high pressure is important for its influence on the solvent boiling point, which affects the residence time (the time that the analyte spends in the solution before the solvent evaporates) and the kinetics of the reaction. The effects of the other parameters (vaporizer length, heating length, drawn tip, etc.) on the efficiency of the deposition reaction, represented as background residual signal (BRS), were also studied.

Surface Plasma Characterization of Polyimide Films for Flexible Electronics

2014 ◽  
Vol 970 ◽  
pp. 132-135 ◽  
Author(s):  
Huseyin Kizil ◽  
Meryem Oznur Pehlivaner ◽  
Levent Trabzon
Keyword(s):  
Flexible Electronics ◽  
Inductively Coupled Plasma ◽  
Treatment Time ◽  
Flexible Substrate ◽  
Oxygen Plasma Treatment ◽  
Polyimide Films ◽  
Complete Wetting ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Low Dielectric

Flexible electronics have drawn much attention due to vast application possibilities. Polyimide was the substrate of choice as a flexible substrate owing to its properties such as good mechanical strength, high temperature resistance, good dimensional stability, and low dielectric constant. The adhesion between metal and polymer substrate plays a crucial role for reliability of these applications and low adhesion was the cause for most failures. In this study, plasma surface treatments were applied on polyimide surface by inductively coupled plasma (ICP) treatment system. The results of contact angle measurements and atomic force microscopy (AFM) show a large increase in surface roughness with increasing treatment time. Complete wetting was found for both argon and oxygen plasma treatment. Analysis of chemical composition by FTIR reveals an increase in carbon-oxygen functional groups and the concentration of oxygen on the surfaces.

Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma

2015 ◽  
Vol 341 ◽  
pp. 142-148 ◽  
Author(s):  
Qiang Xin ◽  
Na Li ◽  
Jun Wang ◽  
Bo Wang ◽  
Guo Li ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Fused Silica ◽  
Surface Roughening ◽  
Inductively Coupled
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