Diffusion Limited Aggregation of PMMA Stereocomplex in Thin Films
ABSTRACTThe nanoscale patterns formed by poly(methyl methacrylate) (PMMA) stereocomplexes at the surface of silicon wafers, glass and mica, were investigated by tapping mode atomic force microscopy (TM-AFM). The effects of the solvent nature, PMMA concentration, i/s-ratio (stoechimetry) and surface nature on the morphology of the stereocomplex thin layer at a surface were addressed. The aggregation phenomena are well described by the diffusion limited cluster-cluster aggregation model (DLA) and the fractal exponent D calculated. The i/s-ratio strongly influences the fractal exponent D which is equal to 1.35 for the 1:2 ratio is lower than for the other i:s ratios which are 1.46, 1.61, 1.82 for 1:1, 2:1 and 4:1 ratios, respectively. The low values of the fractal dimension D are indicative of a fast aggregation process and higher values of D correspond to a slow aggregation process.