A 29Si-NMR Investigation of Amorphous Hydrogenated Silicon Nitride

1986 ◽  
Vol 70 ◽  
Author(s):  
Mark A. Petrich ◽  
Rhett E. Livengood ◽  
Jeffrey A. Reimer ◽  
Dennis W. Hess
Keyword(s):  
Nuclear Magnetic Resonance ◽  
Silicon Nitride ◽  
Solid State ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nitride Film ◽  
29Si Nmr ◽  
Hydrogen Atoms ◽  
Hydrogenated Silicon ◽  
Amorphous Hydrogenated Silicon

ABSTRACTWe present the results of a spectroscopic study of amorphous hydrogenated silicon nitride. The nitride was prepared by plasma enhanced chemical vapor deposition and was studied with infrared absorption (IR) and solid-state nuclear magnetic resonance (NMR) spectroscopies. This nitride film shows a particularly interesting distribution of hydrogen: hydrogen atoms are nearly exclusively bound to nitrogen.

Plasma-enhanced chemical-vapor deposition of silicon nitride film for high resistance to potential-induced degradation

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KD12 ◽  
Author(s):  
Ken Mishina ◽  
Atsufumi Ogishi ◽  
Kiyoshi Ueno ◽  
Sachiko Jonai ◽  
Norihiro Ikeno ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
High Resistance ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nitride Film ◽  
Silicon Nitride Film
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