Infrared Spectroscopy of Deuterated a-Si, Ge:D, F Alloys Prepared by DC Glow Discharge Deposition

1986 ◽  
Vol 70 ◽  
Author(s):  
Y. Okada ◽  
D. Slobodin ◽  
S. F. Chou ◽  
R. Schwarz ◽  
S. Wagner
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Ir Spectroscopy ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Dc Glow Discharge ◽  
Thermochemical Equilibrium ◽  
Amorphous Silicon Germanium ◽  
Glow Discharge Deposition

ABSTRACTDeuterated and fluorinated amorphous silicon-germanium alloys, a-Si, Ge:D, F, were studied by Fourier transform infrared (IR) spectroscopy. No Ge.-F modes are observed. The intensity of the Si-F and Si-F2 modes increases with Ge concentration. So does thae intensity of SiF4 which is trapped as isolated molecules. No DF (IR) or F2 (Raman) is observed. The IR spectra of alloys annealed at 300, 400, 500 and 600° C show that the fluorine in the Si-F and Si-F2 groups and in the SiF4 molecules is in thermochemical equilibrium.

Light-Induced Degradation of Amorphous Silicon-Germanium Alloy Solar Cells Deposited at High Rates

1996 ◽  
Vol 420 ◽  
Author(s):  
S. Sugiyama ◽  
X. Xu ◽  
J. Yang ◽  
S. Guha
Keyword(s):  
Solar Cells ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Ion Bombardment ◽  
Ir Absorption ◽  
Film Properties ◽  
Deposition Rates ◽  
Rf Glow Discharge ◽  
Amorphous Silicon Germanium

AbstractWe have studied the light-induced degradation of amorphous silicon-germanium (a-SiGe:H) alloy single-junction solar cells with high initial performance deposited at high rates. The intrinsic layers were deposited using microwave (MW) glow-discharge technique at deposition rates between 10 and 40 Å/s. The results show that light-induced degradation of the cells is higher than that of cells deposited at low rates using RF glow-discharge technique, and it does not strongly depend on deposition rates over this range. The total hydrogen content and the ratio of Si-H2, Ge-H, and Ge-H2 to Si-H bonding estimated by infrared (IR) absorption in films are correlated with the cell degradation results. We have also investigated the effect of ionbombardment on film properties. Films with low ion-bombardment are more porous and have higher composition of Si-H2 and Ge-H2 bonding. Appropriate ion-bombardment makes denser structure in a-SiGe:H alloy films deposited at high rates. This improves the cell performance as well.

Electronic Transport and the Density of States Distribution in a-(Si, Ge):H, F Alloys

1986 ◽  
Vol 70 ◽  
Author(s):  
S. Aljishi ◽  
Z E. Smith ◽  
D. Slobodin ◽  
J. Kolodzey ◽  
V. Chu ◽  
...  
Keyword(s):  
Optical Properties ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Density Of States ◽  
Electronic Transport ◽  
Silicon Germanium ◽  
Drift Mobility ◽  
Electronic And Optical Properties ◽  
Reported Data ◽  
Amorphous Silicon Germanium

ABSTRACTThe electronic and optical properties of amorphous silicon-germanium alloys produced by d.c. and r.f. glow discharge are reported. Data on the sub-gap absorption, dark and photo conductivities, drift mobilities and drift mobility-lifetime products are used to propose a density of states model.

Hydrogenated Amorphous Silicon Germanium Alloys Prepared by Triode rf Glow Discharge

1986 ◽  
Vol 25 (Part 2, No. 4) ◽  
pp. L276-L278 ◽  
Author(s):  
Takeshige Ichimura ◽  
Takurou Ihara ◽  
Toshio Hama ◽  
Michio Ohsawa ◽  
Hiroshi Sakai ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Glow Discharge ◽  
Amorphous Silicon Germanium ◽  
Hydrogenated Amorphous ◽  
Silicon Germanium Alloys

Metastable Defects in the Amorphous Silicon-Germanium Alloys

2003 ◽  
Vol 762 ◽  
Author(s):  
J. David Cohen
Keyword(s):  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Dangling Bonds ◽  
Annealing Behavior ◽  
Fundamental Properties ◽  
Silicon Materials ◽  
Salient Features ◽  
The Individual ◽  
Amorphous Silicon Germanium ◽  
Silicon Germanium Alloys

AbstractThis paper first briefly reviews a few of the early studies that established some of the salient features of light-induced degradation in a-Si,Ge:H. In particular, I discuss the fact that both Si and Ge metastable dangling bonds are involved. I then review some of the recent studies carried out by members of my laboratory concerning the details of degradation in the low Ge fraction alloys utilizing the modulated photocurrent method to monitor the individual changes in the Si and Ge deep defects. By relating the metastable creation and annealing behavior of these two types of defects, new insights into the fundamental properties of metastable defects have been obtained for amorphous silicon materials in general. I will conclude with a brief discussion of the microscopic mechanisms that may be responsible.

Properties of Catalytic-Cvd Amorphous Silicon-Germanium (a-SiGe:H)

1990 ◽  
Vol 192 ◽  
Author(s):  
Hideki Matsumura ◽  
Masaaki Yamaguchi ◽  
Kazuo Morigaki
Keyword(s):  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Characteristic Energy ◽  
Optical Band Gaps ◽  
Spin Resonance ◽  
Amorphous Silicon Germanium ◽  
Conductive Properties ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon-germanium (a-SiGe:H) films are prepared by the catalytic chemical vapor deposition (Cat-CVD) method using a SiH4, GeH4 and H4 gas mixture. Properties of the films are investigated by the photo-thermal deflection spectroscopy (PDS) and electron spin resonance (ESR) measurements, in addition to the photo-conductive and structural studies. It is found that the characteristic energy of Urbach tail, ESR spin density and other photo-conductive properties of Cat-CVD a-SiGe:H films with optical band gaps around 1.45 eV are almost equivalent to those of the device quality glow discharge hydrogenated amorphous silicon (a-Si:H).

Medium-Range Order of Amorphous Silicon Germanium Alloys: Small-Angle X-Ray Scattering Study

1989 ◽  
Vol 28 (Part 2, No. 7) ◽  
pp. L1092-L1095 ◽  
Author(s):  
Shin-ichi Muramatsu ◽  
Toshikazu Shimada ◽  
Hiroshi Kajiyama ◽  
Kazufumi Azuma ◽  
Takeshi Watanabe ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Small Angle ◽  
Silicon Germanium ◽  
Range Order ◽  
Medium Range Order ◽  
X Ray ◽  
X Ray Scattering ◽  
Medium Range ◽  
Scattering Study ◽  
Amorphous Silicon Germanium

Amorphous silicon-germanium alloy multilayers for solar cells

1988 ◽  
Author(s):  
J.P. Conde ◽  
V. Chu ◽  
S. Tanaka ◽  
D.S. Shen ◽  
S. Wagner
Keyword(s):  
Solar Cells ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Germanium Alloy ◽  
Amorphous Silicon Germanium
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