Effects of In-Situ DC-Bias on the Composition, Microstructures and Dielectric Properties of RF Magnetron Reactive Sputtered (Ba,Sr)TiO3 Films
AbstractThin films of (Ba,Sr)TiO3 (BST) have been prepared by rf magnetron reactive sputtering using single alloy target, and in-situ negative DC-bias. Post annealing was applied to the asdeposited films at 620°C for 2 hours in 1 atm oxygen atmosphere. Thin film microstructures and grain sizes were studied and calculated by means of X-ray diffraction, while the film composition was analyzed by Electron Probe X-ray Microanalyzer (EPMA). The dielectric constant of the films was also studied. As the applied DC-bias increased, the dielectric constant increased from 176 to 912, the x-ray diffraction patterns became more intense and narrower, and the (Ba+Sr)/Ti molar ratio increased from 0.70 to 0.83. In-situ DC-bias was observed to be a feasible fabrication process to increase the grain size and relative permittivity of sputtered BST films.