The Effect of Different Oxidizing Atmospheres on the Initial Kinetics of Copper Oxidation as Studied In Situ UHV-TEM

1999 ◽  
Vol 589 ◽  
Author(s):  
Mridula D. Bharadwaj ◽  
Anu Gupta ◽  
J. Murray Gibson ◽  
Judith C. Yang
Keyword(s):  
Water Vapor ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Solid State Reactions ◽  
Copper Oxidation ◽  
High Vacuum Condition ◽  
Ultra High Vacuum Condition ◽  
Kinetics Of

AbstractEffect of moisture on the oxidation of copper was studied using in situ UHV-TEM. The ultra high vacuum condition is required for minimum contamination effects. The initial observations show that the water vapor reduces the oxide as well as reduces the rate of oxidation if both oxygen gas and water vapor are simultaneously used. Based on these observations, we have speculated on the role of moisture in the solid state reactions involved in copper oxidation

Heteroepitaxy: The Missing Link Between Surface Chemistry and Dry Corrosion

2000 ◽  
Vol 619 ◽  
Author(s):  
Judith C. Yang ◽  
Mridula Dixit Bharadwaj ◽  
Lori Tropia
Keyword(s):  
Electron Microscopy ◽  
Water Vapor ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Solid State Reactions ◽  
Transmission Electron ◽  
Oxygen Gas ◽  
Cu Oxidation

ABSTRACTWe have investigated the initial stages of Cu (001) oxidation in dry and moist oxidizing conditions using in situ ultra-high vacuum (UIHV) transmission electron microscopy (TEM). To investigate the role of moisture in the solid state reactions in Cu oxidation, we have examined the oxidation of Cu (001) with water vapor. Our observation indicate that water vapor causes reduction of Cu2O and retards the oxidation rate if both oxygen gas and water vapor are used simultaneously which contradicts the thermochemical data. We are also modeling the nucleation to coalescence of the oxide scale using the Johnson-Mehl-Avrami-Kolmogorov (JMAK) equation and have noted a qualitative agreement.

scholarly journals Surface Kinetics of Copper Oxidation Investigated by In Situ Ultra-high Vacuum Transmission Electron Microscopy

2001 ◽  
Vol 7 (6) ◽  
pp. 486-493 ◽  
Author(s):  
Judith C. Yang ◽  
Mridula D. Bharadwaj ◽  
Guangwen Zhou ◽  
Lori Tropia
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Water Vapor ◽  
High Vacuum ◽  
Quantitative Model ◽  
Ultra High Vacuum ◽  
Copper Oxidation ◽  
Initial Oxidation ◽  
Transmission Electron

AbstractWe review our studies of the initial oxidation stages of Cu(001) thin films as investigated by in situ ultra-high vacuum transmission electron microscopy. We present our observations of surface reconstruction and the nucleation to coalescence of copper oxide during in situ oxidation in O2. We have proposed a semi-quantitative model, where oxygen surface diffusion is the dominant mechanism of the initial oxidation stages of Cu. We have also investigated the effect of water vapor on copper oxidation. We have observed that the presence of water vapor in the oxidizing atmosphere retards the rate of Cu oxidation and Cu2O is reduced when exposed directly to steam.

In situ study of sensor behavior of MoS2 field effect transistor for methyl orange molecule in ultra high vacuum condition

2020 ◽  
Vol 32 (7) ◽  
pp. 075501
Author(s):  
Muhammad Shamim Al Mamun ◽  
Hiroki Waizumi ◽  
Tsuyoshi Takaoka ◽  
Md Iftekharul Alam ◽  
Yudai Tanaka ◽  
...  
Keyword(s):  
Field Effect ◽  
Field Effect Transistor ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
In Situ Study ◽  
High Vacuum Condition ◽  
Effect Transistor ◽  
Ultra High Vacuum Condition ◽  
Methyl Orange Molecule

Initial Kinetics of Copper Oxidation in Different Oxidizing Atmospheres as Studied by In Situ UHV-TEM

2000 ◽  
Vol 6 (S2) ◽  
pp. 42-43
Author(s):  
Mridula D. Bharadwaj ◽  
Lori Tropia ◽  
Murray Gibson ◽  
Judith C. Yang
Keyword(s):  
Surface Science ◽  
High Vacuum ◽  
Practical Interest ◽  
Ultra High Vacuum ◽  
Copper Oxidation ◽  
Initial Oxidation ◽  
Kinetics Of Oxidation ◽  
Transmission Electron ◽  
Kinetics Of

It is of fundamental and practical interest to understand the oxidation process since a desirable property for metals is resistance to corrosion. But there is a wide gap between information provided by surface science methods and that provided by bulk oxidation studies. The former have mainly examined the adsorption of ∼ 1 ML of oxygen on the metal surface, where as both low and high temperature bulk oxidation studies have mainly focused on the growth of an oxide layer at the later stages of oxidation.We are probing the initial oxidation stage of a model metal system by in situ ultra-high vacuum (UHV) transmission electron microscopy (TEM) in order to gain insights into the initial kinetics of oxidation. We have previously shown that the growth mechanism of the cuprous oxide is initially dominated by oxygen surface diffision.

Exoelectron emission from unexcited metallic glasses Fe78B13Si9 during heat treatment

1992 ◽  
Vol 7 (6) ◽  
pp. 1396-1399 ◽  
Author(s):  
Yoshihisa Watanabe ◽  
Tadayoshi Kubozoe ◽  
Yoshikazu Nakamura
Keyword(s):  
Heat Treatment ◽  
Metallic Glasses ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Exoelectron Emission ◽  
Radiation Chemical ◽  
Temperature Range ◽  
High Vacuum Condition ◽  
Before And After ◽  
Ultra High Vacuum Condition

Exoelectron emission from the surface of unexcited metallic glasses Fe78B13Si9 during heat treatment has been studied under ultra high vacuum condition. In the first heating cycle, exoelectrons are emitted from the as-cast ribbon in the temperature range from approximately 423 K to 773 K (150 °C to 500 °C), although the surface of the specimen is not excited by ionizing radiation, chemical processes, or mechanical treatments prior to measurements. In the second and subsequent heating cycles, however, there is no anomalous emission observed in the same temperature range. In order to elucidate the mechanism of emission, the surface of the specimen is observed by the atomic force microscope (AFM) before and after measurements. In the AFM image, many crystallites in the amorphous matrix can be found in the surface of the heated specimen. These experimental results show that exoelectrons are emitted in the same temperature range as the early stages of crystallization on the surface of metallic glasses. We hypothesize that the two effects are correlated.

Oxidation Kinetics of Cu-Ni Alloy Observed by in situ UHV-TEM

2007 ◽  
Vol 1026 ◽  
Author(s):  
Li Sun ◽  
John E. Pearson ◽  
Judith C. Yang
Keyword(s):  
High Vacuum ◽  
Alloy Film ◽  
Ultra High Vacuum ◽  
Cross Sectional ◽  
Primary Mechanism ◽  
Transmission Electron ◽  
Ni Alloy ◽  
Cu Oxidation ◽  
Kinetics Of

AbstractThe nucleation and growth of Cu2O and NiO islands due to oxidation of Cu-24%Ni(001) films were monitored at various temperatures by in situ ultra-high vacuum (UHV) transmission electron microscopy (TEM). In remarkable contrast to our previous observations of Cu and Cu-Au oxidation, irregular-shaped polycrystalline oxide islands were observed to form with respect to the Cu-Ni alloy film, and an unusual second oxide nucleation stage was noted. Similar to Cu oxidation, the cross-sectional area growth rate of the oxide island is linear indicating oxygen surface diffusion is the primary mechanism of oxide growth.

A Mechanism of Sliding on the Nanometer-Thick Ag Layers

2005 ◽  
Author(s):  
F. Honda ◽  
M. Goto
Keyword(s):  
Friction Coefficient ◽  
Normal Load ◽  
High Vacuum ◽  
High Energy ◽  
Thin Layers ◽  
Ultra High Vacuum ◽  
Wear And Friction ◽  
Thickness Measurements

Tribological performance of sub-nano to nanometer-thick Ag layers deposited on Si(111) have been examined to understand the role of surface thin layers to the wear and friction characteristics. The slider was made of diamond sphere of 3 mm in radius. Sliding tests were carried out in an ultra-high vacuum environment (lower than 4 × 10−8 Pa) and analyzed in-situ by Auger electron spectroscopy (AES) for the quantitative thickness-measurements, by reflection high-energy electron diffraction (RHEED) to clarify the substrate cleanliness and crystallography of the Ag films, and by scanning probe microscopy (SPM) for the morphology of the deposited/slid film surfaces. As the results, a minimum of the friction coefficient 0.007 was observed from the film thickness range of 1.5–10 nm, and exactly no worn particles were found after 100 cycles of reciprocal sliding. Results have directly indicated that solid Ag(111) sliding planes allowed to reduce the friction coefficient very low without any detectable wear particles, and Ag nanocrystallites in Ag polycrystalline layers increase the size to 20–40 nm order, during sliding. The friction coefficient was slightly dependent to the normal load. Results were discussed on the role of the surface atoms to the friction, and a mechanism of sliding on Ag thin layers.

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