Integrating Organic Molecules to Silicon Surfaces

1999 ◽  
Vol 576 ◽  
Author(s):  
X.-Y. Zhu ◽  
J. A. Mulder ◽  
R. P. Hsung ◽  
W. F. Bergerson ◽  
A. Gasser ◽  
...  
Keyword(s):  
Silicon Surface ◽  
Organic Molecules ◽  
Functional Group ◽  
Silicon Surfaces ◽  
General Strategy ◽  
Thermally Stable ◽  
Organic Monolayers

ABSTRACTWe present a general strategy for the efficient assembly of organic molecules directly onto the silicon surface via Si-N and Si-O linkages. This is achieved from the reaction between an amine or an alcohol functional group and a chlorinated Si surface. The resulting organic monolayers are thermally stable. These methods are applicable for the assembly of a variety of functional organic molecules in both vacuum environment and solution phases.

Thermal Functionalization of Hydrogen-Terminated Porous Silicon Surfaces with Terminal Alkenes and Aldehydes

2000 ◽  
Vol 638 ◽  
Author(s):  
Rabah Boukherroub ◽  
David J. Lockwood ◽  
Danial D. M. Wayner ◽  
Leigh T. Canham
Keyword(s):  
Porous Silicon ◽  
Diffuse Reflectance ◽  
Organic Molecules ◽  
Silicon Surfaces ◽  
Organic Monolayers ◽  
Chemical Reagent ◽  
X Ray ◽  
Chemically Modified ◽  
Terminal Alkenes ◽  
Diffuse Reflectance Infrared

AbstractH-terminated porous silicon (PSi) surfaces were chemically modified with terminal alkenes and aldehydes at high temperature to yield organic monolayers covalently attached to the surface through Si-C and Si-O-C bonds, respectively. Diffuse reflectance infrared Fouriertransform and X-ray photoelectron spectroscopies have been used to characterize the surfaces. Derivatized surfaces retain the PSi photoluminescence. Chemography was used to monitor the chemical changes of the PSi surface when exposed to 100% humidity in air. Organic monolayers linked through Si-C bonds are found to be highly resistant and have shown a better protection of the surface against corrosion compared to surfaces that are linked through Si-O-C bonds. The surface functionalized with ethyl undecylenate exhibits an even higher passivation of the surface through the presence of small amounts of oxide, which are induced by traces of water present in this chemical reagent, along with organic molecules attached to the surface.

Asymmetric Synthesis of α-Alkylated γ-Lactam via Nickel/8-Quinim-Catalyzed Reductive Alkyl-Carbamoylation of Unactivated Alkene

Synlett ◽  
2021 ◽  
Author(s):  
Xianqing Wu ◽  
Mohini Shrestha ◽  
Yifeng Chen
Keyword(s):  
Functional Group ◽  
Enantioselective Synthesis ◽  
Chiral Auxiliary ◽  
Alkyl Iodide ◽  
General Strategy ◽  
Chemical Bonds ◽  
Mild Conditions ◽  
Chiral Carbon ◽  
Enantioselective Reaction ◽  
Metal Catalyzed

AbstractChiral-auxiliary-mediated synthesis represents the most frequently used synthetic tool for the induction of chirality on α-position of γ-lactams in organic synthesis. However, the general strategy requires the stoichiometric use of chiral reagents with multiple manipulation steps. Transition-metal-catalyzed asymmetric alkene dicarbofunctionalization using readily available substrates under mild conditions allows the simultaneous construction of two vicinal chemical bonds and a chiral carbon center, hence, gain expedient access to chiral heterocycles. Herein, we disclose a Ni-catalyzed enantioselective reaction of 3-butenyl carbamoyl chloride and primary alkyl iodide enabled by a newly designed chiral 8-quinoline imidazoline ligand (8-Quinim). This protocol features broad functional group tolerance and high enantioselectivities, achieving unprecedented synthesis of chiral nonaromatic heterocycles via catalytic reductive protocol.1 Introduction2 Development of 8-Quinim Ligand3 Nickel/8-Quinim-Catalyzed Enantioselective Synthesis of Chiral α-Alkylated γ-Lactam4 Conclusion and Outlook

An Integral Heat Sink for Cooling Microelectronic Components

1993 ◽  
Vol 115 (3) ◽  
pp. 284-291 ◽  
Author(s):  
S. H. Bhavnani ◽  
C.-P. Tsai ◽  
R. C. Jaeger ◽  
D. L. Eison
Keyword(s):  
Heat Sink ◽  
Silicon Surface ◽  
Numerical Study ◽  
High Heat ◽  
Heat Fluxes ◽  
Silicon Surfaces ◽  
Source Surface ◽  
Mouth Size ◽  
Severe Constraint ◽  
Boiling Incipience

Liquid immersion cooling is rapidly becoming the mechanism of choice for the newest generation of supercomputers. Miniaturization at both the chip and module level places a severe constraint on the size of the heat sink employed to dissipate the high heat fluxes generated. A study was conducted to develop a surface that could augment boiling heat transfer from silicon surfaces under these constraints. The surface created consists of reversed pyramidal features etched directly on to the silicon surface. Experiments were conducted in a saturated pool of refrigerant-113 at atmospheric pressure. The inexpensive crystallographic etching techniques used to create the enhanced features are described in the paper. The main characteristics of interest in the present study were the incipient boiling superheat and the magnitude of the temperature overshoot at boiling incipience. Results were obtained for test sections with various cavity densities, and compared with data for the smooth untreated surface. It was found that incipient boiling superheat was reduced from a range of 27.0–53.0° C for the untreated silicon surface, to a range of 2.5–15.0° C for the enhanced surfaces. The overshoot also decreased considerably; from about 12.0–18.0° C for two classes of untreated surfaces, to a range of 1.5–5.3° C for the enhanced surfaces. The values of the incipient boiling superheat, and those of the overshoot decreased with a decrease in cavity mouth size. Two ratios of heat source surface area to the area of the enhanced surface were studied. The overshoot values obtained for these surfaces were compared with those observed for some commonly used enhanced surfaces. An elementary numerical study was conducted to estimate the magnitude of heat spreading.

Unitary Micro-Patterning Structure-Induced Hydrophobic Silicon Surface

2011 ◽  
Vol 239-242 ◽  
pp. 2524-2527
Author(s):  
Si Si Liu ◽  
Chao Hui Zhang ◽  
Han Bing Zhang
Keyword(s):  
Inductively Coupled Plasma ◽  
Silicon Surface ◽  
Scale Effects ◽  
Silicon Surfaces ◽  
Functional Surface ◽  
Inductively Coupled ◽  
Cassie State ◽  
Micro Patterning ◽  
Pillar Arrays ◽  
The Relationship

The relationship between the wettability and the roughness structure on silicon surface is studied. The unitary microscale square pillar arrays are fabricated by the way of inductively coupled plasma (ICP). The wettability of water droplets on the silicon surface is changed from hydrophilic to hydrophobic only by introducing microscale pillarlike structure. Furthermore, the scale effects of the unitary rough structure on hydrophobicity are investigated. For those silicon surfaces with a fixed pillar height, the relatively larger scale of grooves leads the droplets wettability state to unstable Cassie state and the contact angle will initially get larger and then decrease with the increase of groove width. The research could provide further insights into the design of functional surface with controllable roughness-induced hydrophobic.

Micro- and Nanotextured Silicon for Antireflective Coatings of Solar Cells

2016 ◽  
Vol 39 ◽  
pp. 89-95 ◽  
Author(s):  
Anatoly Druzhinin ◽  
Valery Yerokhov ◽  
Stepan Nichkalo ◽  
Yevhen Berezhanskyi
Keyword(s):  
Solar Cells ◽  
Conversion Efficiency ◽  
Silicon Substrate ◽  
Chemical Etching ◽  
Silicon Surface ◽  
Crystalline Silicon ◽  
Silicon Surfaces ◽  
Antireflective Coatings ◽  
High Conversion Efficiency ◽  
Industrial Use

The paper deals with obtaining of textured silicon surfaces by chemical etching. As a result of experiments based on the modification and optimization of obtaining a textured silicon, several methods of chemical texturing of the crystalline silicon surface were developed. It was shown that modified isotropic and anisotropic etching methods are applicable to create a microrelief on the surface of silicon substrate. These methods in addition to their high conversion efficiency can be used for both mono- and multicrystalline silicon which would ensure their industrial use.

Segregation of Copper to (100) and (111) Silicon Surfaces in Equilibrium with Internal Cu3Si Precipitates

1996 ◽  
Vol 448 ◽  
Author(s):  
W. R. Wampler
Keyword(s):  
Free Energy ◽  
Surface Structure ◽  
Silicon Surface ◽  
Chemical Potential ◽  
Silicon Surfaces ◽  
Free Surfaces

AbstractThe energetics of copper segregation to silicon surfaces were examined by measuring the Cu coverage after equilibration between Cu on the surface and internal Cu3Si, for which the Cu chemical potential is known. For oxide-free surfaces the Cu coverage was close to one monolayer on (111) surfaces but was much smaller on (100) surfaces. The Cu coverage was greatly reduced by oxide passivation of the surface. LEED showed the 7×7 structure of the clean (111) silicon surface converted to a quasiperiodic 5×5 structure after equilibrating with Cu3Si. The 2×1 LEED patterns for (100) surfaces indicated no change in surface structure due to the Cu3Si. These results show that the free energy of copper in Cu3Si is higher than that of copper on (111) surfaces but lower than that of copper on (100) surfaces.

scholarly journals Static and dynamic electronic characterization of organic monolayers grafted on a silicon surface

2016 ◽  
Vol 18 (5) ◽  
pp. 3675-3684 ◽  
Author(s):  
O. Pluchery ◽  
Y. Zhang ◽  
R. Benbalagh ◽  
L. Caillard ◽  
J. J. Gallet ◽  
...  
Keyword(s):  
Silicon Surface ◽  
Organic Monolayers ◽  
Inorganic Hybrid ◽  
Organic Layers ◽  
Nanoelectronic Devices ◽  
The Way

Organic layers chemically grafted on silicon offer excellent interfaces that may open up the way for new organic–inorganic hybrid nanoelectronic devices.

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