Lateral Transport through Self-Assembled InAs Quantum Dots Located in the Narrow Gap Electrodes
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ABSTRACTWe have fabricated and characterized the lateral electron transport through InAs quantum dots with double barrier system. Aluminum metal electrodes with the inter-electrode spacing of 30 nm have been deposited on an InAs self-assembled quantum dot wafer to form the planar type quantum dot devices. Current peak structure and negative differential resistance effects are observed above 77 K in current-voltage characteristics. These results are interpreted as due to 3D-0D resonant tunneling through the single quantum dot positioned in between the electrodes.
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2000 ◽
Vol 7
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pp. 499-502
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1999 ◽
Vol 60
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pp. R11289-R11292
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2005 ◽
Vol 36
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pp. 227-230
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2007 ◽
Vol 18
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pp. 191-194
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2002 ◽
Vol 13
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