Investigation of Textured Back Reflectors for Microcrystalline Silicon Based Solar Cells

1999 ◽  
Vol 557 ◽  
Author(s):  
O. Kluth ◽  
O. Vetterl ◽  
R. Carius ◽  
F. Finger ◽  
S. Wieder ◽  
...  
Keyword(s):  
Solar Cells ◽  
Near Infrared ◽  
Spectral Response ◽  
Short Circuit ◽  
Chemical Vapour ◽  
Root Mean Square Roughness ◽  
Microcrystalline Silicon ◽  
Feature Size ◽  
Long Wavelength ◽  
Back Reflectors

AbstractMicrocrystalline silicon (μc-Si:H) solar cells require an effective light trapping in the near infrared (NIR) to enhance the long wavelength spectral response. For this purpose we investigated back reflectors based on texture-etched ZnO/Ag stacks prepared on glass substrates by magnetron sputtering. With decreasing sputter pressure the resulting surface texture of the glass/Ag/ZnO substrates after etching exhibits a larger feature size and root mean square roughness. The increase in feature size corresponds to an increase of diffuse reflectivity. Applied in microcrystalline solar cells prepared by VHF plasma enhanced chemical vapour deposition (PECVD), the reflectors showing the largest feature size (prepared at the lowest possible sputter pressure) yielded the highest long wavelength spectral response. The μc-Si n-i-p cells prepared on the latter back reflector exhibited efficiencies of 6.9 % (short circuit current density jsc= 18.8 mA/cm2) and 7.5 % (jsc=25 mA/cm2) for an i-layer thickness of 1 μm and 3.5 μm, respectively.

Preparation of Narrow-gap a-Si:H Solar Cells by VHF-PECVD Technique

2010 ◽  
Vol 1245 ◽  
Author(s):  
Do Yun Kim ◽  
Ihsanul Afdi Yunaz ◽  
Shunsuke Kasashima ◽  
Shinsuke Miyajima ◽  
Makoto Konagai
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Solar Cell ◽  
Spectral Response ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Short Circuit Current Density ◽  
Open Circuit ◽  
Hydrogen Flow ◽  
Long Wavelength

AbstractOptical, electrical and structural properties of silicon films depending on hydrogen flow rate (RH), substrate temperature (TS), and deposition pressure (PD) were investigated. By decreasing RH and increasing TS and PD, the optical band gap (Eopt) of silicon thin films drastically declined from 1.8 to 1.63 eV without a big deterioration in electrical properties. We employed all the investigated Si thin films for p-i-n structured solar cells as absorbers with i-layer thickness of 300 nm. From the measurement of solar cell performances, it was clearly observed that spectral response in long wavelength was enhanced as Eopt of absorber layers decreased. Using the solar cell whose Eopt of i-layer was 1.65 eV, the highest QE at long wavelength with the short circuit current density (Jsc) of 16.34 mA/cm2 was achieved, and open circuit voltage (Voc), fill factor (FF), and conversion efficiency (η) were 0.66 V, 0.57, and 6.13%, respectively.

scholarly journals Enhancement of Spectral Response inμc-Si1-xGex:H Thin-Film Solar Cells with a-Si:H/μc-Si:H P-Type Window Layers

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Yen-Tang Huang ◽  
Cheng-Hang Hsu ◽  
Chuang-Chuang Tsai
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Conversion Efficiency ◽  
Spectral Response ◽  
Short Circuit ◽  
Thin Film Solar Cells ◽  
Window Layer ◽  
Microcrystalline Silicon ◽  
P Type ◽  
20 Nm

The hydrogenated amorphous silicon (a-Si:H)/hydrogenated microcrystalline silicon (μc-Si:H) double p-type window layer has been developed and applied for improving microcrystalline silicon-germanium p-i-n single-junction thin-film solar cells deposited on textured SnO2:F-coated glass substrates. The substrates of SnO2:F, SnO2:F/μc-Si:H(p), and SnO2:F/a-Si:H(p) were exposed to H2plasma to investigate the property change. Our results showed that capping a thin layer of a-Si:H(p) on SnO2:F can minimize the Sn reduction during the deposition process which had H2-containing plasma. Optical measurement has also revealed that a-Si:H(p) capped SnO2:F glass had a higher optical transmittance. When the 20 nmμc-Si:H(p) layer was replaced by a 3 nm a-Si:H(p)/17 nmμc-Si:H(p) double window layer in the cell, the conversion efficiency (η) and the short-circuit current density (JSC) were increased by 16.6% and 16.4%, respectively. Compared to the standard cell with the 20 nmμc-Si:H(p) window layer, an improved conversion efficiency of 6.19% can be obtained for the cell having a-Si:H(p)/μc-Si:H(p) window layer, withVOC = 490 mV,JSC = 19.50 mA/cm2, and FF = 64.83%.

The Effect of Al-BSF on Seff and Rb in Industrialized Mono-Silicon Solar Cells

2012 ◽  
Vol 472-475 ◽  
pp. 1846-1850
Author(s):  
Shan Shan Dai ◽  
Gao Jie Zhang ◽  
Xiang Dong Luo ◽  
Jing Xiao Wang ◽  
Wen Jun Chen ◽  
...  
Keyword(s):  
Solar Cells ◽  
Spectral Response ◽  
Short Circuit ◽  
Rear Surface ◽  
Surface Recombination ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Surface Recombination Velocity ◽  
Silicon Solar Cells ◽  
Back Surface

In this work, the effect of aluminum back surface field formed by screen printed various amount of Al paste on the effective rear surface recombination velocity (Seff) and the internal rear reflectance coeffeicient (Rb) of commercial mono-silicon solar cells was investigated. We demonstrated the effect of Seffand Rbon the performance of Al-BSF solar cells by simulating them with PC1D. The simulated results showed that the lower Seffcould get higher open circuit voltage (Voc), at the same time, the larger Rbcould get higher short-circuit current (Isc). Experimentally, we investigated the Seffand Rbthrough depositing Al paste with various amount (3.7, 5, 6, and 8 mg/cm2) for fabricating Al-BSF mono-silicon solar cells. Four group cells were characterized by light I-V, spectral response, hemispherical reflectance and scanning electron microscope (SEM) measurements. It was found that, a minimum Seffof 350 cm/s was gotten from the cells with Al paste of 8 mg/cm2, which was extracted by matching quantum efficiency (QE) from 800 nm to 1200 nm with PC1D, and a maximum Rbof 53.5% was obtained from Al paste of 5 mg/cm2by calculating at 1105 nm with PC1D. When the amount of Al paste was higher than 5mg/cm2, there were less Seffand lower Rb. On the other hand, when Al amount was 3.7mg/cm2, it was too little to form a closed BSF. Based on the SEM graphs and simulations with PC1D, a simple explaination was proposed for the experimental results.

Evaluation of Ar-Diluted Silane PECVD for Thin Film Si:H Based Solar Cells

2004 ◽  
Vol 808 ◽  
Author(s):  
J. A. Anna Selvan ◽  
Yuan-Min Li ◽  
Liwei Li ◽  
Alan E. Delahoy
Keyword(s):  
Solar Cells ◽  
Spectral Response ◽  
Nanocrystalline Silicon ◽  
Thin Layers ◽  
Dilution Method ◽  
Critical Question ◽  
Long Wavelength ◽  
Hydrogen Dilution ◽  
Porous Microstructure ◽  
The Stability

ABSTRACTDilution by Ar of silane plasma has been reported to increase the stability of a-Si:H films. A critical question is whether Ar diluted i-layers offer higher stabilized solar cell efficiencies than the conventional hydrogen dilution method. We have fabricated a-Si:H p-i-n solar cells with RF-PECVD i-layers by Ar dilution of silane. Ar dilution ratio (ADR, Ar/SiH4), RF power,pressure, and i-layer thickness were varied. At low ADR < 20, such solar cells show comparable initial efficiencies and stability as those devices having H2-diluted i-layers of similar thickness. For cells made with ADR > 20, the initial efficiency decreases dramatically with further increase in Ar dilution, and light soaking causes only mild changes in efficiencies. The stabilized efficiencies of cells made with high ADR are inferior to the cells produced with low ADR or cells prepared by H2 dilution. Further, Voc of solar cells made with high ADR (> 50) decreases substantially in ambient, indicating a porous microstructure susceptible to oxidation. While thermal annealing improves the Voc, a full recovery of Voc is made by accelerated light soaking.The combination of high power and high ADR can lead to nanocrystalline silicon (nc-Si:H) growth, although nucleation is much more difficult to attain by the Ar dilution method compared to hydrogen dilution. We have succeeded in fabricating p-i-n solar cells with nc-Si:H i-layers prepared by the Ar dilution approach. The double dilution by Ar and hydrogen of silane (Ar+H2+SiH4) can result in nc-Si:H i-layers with enhanced long wavelength spectral response compared to devices incorporating nc-Si:H i-layers grown by H2 dilution only. The nc-Si:H solar cells with Ar+H2 diluted i-layers exhibit no light-induced degradation.Using energetic Ar-rich plasma, in a process much simpler than the traditional nc-Si:H technique, doped a-Si:H thin layers can be prepared to form excellent tunnel junctions for multi-junction solar cells. We demonstrate such a novel, non-contaminating tunnel junction in tandem a-Si/a-Si and a-Si/nc-Si solar cells entirely fabricated in a single-chamber RF-PECVD system.

scholarly journals A Quarterthiophene-Based Dye as an Efficient Interface Modifier for Hybrid Titanium Dioxide/Poly(3-hexylthiophene)(P3HT) Solar Cells

Polymers ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 1752 ◽  
Author(s):  
Arumugam Pirashanthan ◽  
Thanihaichelvan Murugathas ◽  
Neil Robertson ◽  
Punniamoorthy Ravirajan ◽  
Dhayalan Velauthapillai
Keyword(s):  
Titanium Dioxide ◽  
Solar Cells ◽  
Spectral Response ◽  
Short Circuit ◽  
Photovoltaic Performance ◽  
Hole Mobility ◽  
Short Circuit Current ◽  
Acid Group ◽  
Open Circuit ◽  
Absorption Data

This work focused on studying the influence of dyes, including a thiophene derivative dye with a cyanoacrylic acid group ((E)-2-cyano-3-(3′,3′′,3′′′-trihexyl-[2,2′:5′,2′′:5′′,2′′′- quaterthiophene]-5-yl) acrylicacid)(4T), on the photovoltaic performance of titanium dioxide (TiO2)/poly(3-hexyl thiophene)(P3HT) solar cells. The insertion of dye at the interface improved the efficiency regardless of the dye used. However, 4T dye significantly improved the efficiency by a factor of three when compared to the corresponding control. This improvement is mainly due to an increase in short circuit current density (JSC), which is consistent with higher hole-mobility reported in TiO2/P3HT nanocomposite with 4T dye. Optical absorption data further revealed that 4T extended the spectral response of the TiO2/P3HT nanocomposite, which could also enhance the JSC. The reduced dark current upon dye insertion ensured the carrier recombination was controlled at the interface. This, in turn, increased the open circuit voltage. An optimized hybrid TiO2/P3HT device with 4T dye as an interface modifier showed an average efficiency of over 2% under-simulated irradiation of 100 mWcm−2 (1 sun) with an Air Mass 1.5 filter.

Thin-film Photodiode with an a-Si:H/nc-Si:H Absorption Bilayer

2011 ◽  
Vol 1321 ◽  
Author(s):  
Y. Vygranenko ◽  
M. Vieira ◽  
A. Sazonov
Keyword(s):  
Thin Film ◽  
Leakage Current ◽  
Near Infrared ◽  
Spectral Response ◽  
Nanocrystalline Silicon ◽  
Depletion Region ◽  
Long Wavelength ◽  
Near Ultraviolet ◽  
High Bias ◽  
Bias Range

ABSTRACTWe report on the fabrication and characterization of n+-n-i-δi-p thin-film photodiodes with an active region comprising a hydrogenated nanocrystalline silicon (nc-Si:H) n-layer and a hydrogenated amorphous silicon (a-Si:H) i-layer. The combination of wide- and narrow-gap absorption layers enables the spectral response extending from the near-ultraviolet (NUV) to the near-infrared (NIR) region. Moreover, in the low-bias range, when only the i-layer is depleted, the leakage current is significantly lower than that in the conventional nc-Si:H n+-n-p+ photodiode deposited under the same deposition conditions. Device with the 900nm/400nm thick n-i-layers exhibits a reverse dark current density of 3 nA/cm2 at −1V. In the high-bias range, when the depletion region expands within the n-layer, the magnitude of the leakage current depends on electronic properties of nc-Si:H. The density of shallow and deep states, and diffusion length of holes in the n-layer have been estimated from the capacitance-voltage characteristics and from the bias dependence of the long-wavelength response, respectively. To improve the quantum efficiency in the NIR-region, we have also implemented a Cr / ZnO:Al back reflector. The observed long-wavelength spectral response is about twice as high as that for a reference photodiode without ZnO:Al layer. Results demonstrate the feasibility of the photodiode for low-level light detection in the NUV-to-NIR spectral range.

Improved Efficiency of Single Junction Microcrystalline Silicon n-i-p Solar Cells with an i-Layer Made by Hot-Wire CVD

2007 ◽  
Vol 989 ◽  
Author(s):  
Hongbo Li ◽  
Ronald H.J. Franken ◽  
Robert L. Stolk ◽  
C. H.M. van der Werf ◽  
Jan-Willem A. Schuttauf ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Solar Cells ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hot Wire ◽  
Microcrystalline Silicon ◽  
Single Junction ◽  
Layer Deposition ◽  
P Cells

AbstractThe influence of the surface roughness of Ag/ZnO coated substrates on the AM1.5 J-V characteristics of microcrystalline silicon (μc-Si:H) solar cells with an i-layer made by the hot-wire chemical vapour deposition (HWCVD) technique is discussed. Cells deposited on substrates with an intermediate rms roughness show the highest efficiency. When using reverse hydrogen profiling during i-layer deposition, an efficiency of 8.5 % was reached for single junction μc-Si:H n-i-p cells, which is the highest for μc-Si:H n-i-p cells with a hot-wire i-layer.

Mechanism of the Improvement in Microcrystalline Silicon Solar Cells by Hydrogen Plasma Treatment

2013 ◽  
Vol 773 ◽  
pp. 118-123
Author(s):  
Jing Yan Li ◽  
Xiang Bo Zeng ◽  
Hao Li ◽  
Xiao Bing Xie ◽  
Ping Yang ◽  
...  
Keyword(s):  
Solar Cells ◽  
Electric Field ◽  
Plasma Treatment ◽  
Defect Density ◽  
Hydrogen Plasma ◽  
Microcrystalline Silicon ◽  
One Dimensional ◽  
Long Wavelength ◽  
Drift Length ◽  
Experimental Improvement

We explain the experimental improvement in long wavelength response by hydrogen plasma treatment (HPT) in n/i interface. The absorption coefficient of the intrinsic microcrystalline silicon (μc-Si) is decreased in the low energy region (0.8~1.0 eV) by HPT, which indicates a lower defect density in μc-Si layer deposited with HPT than its counterpart without HPT. Simulation by one-dimensional device simulation program for the Analysis of Microelectronic and Photonic Structures (AMPS-1D) shows a higher long wavelength response in μc-Si solar cell if the defect density in intrinsic μc-Si layer is smaller. Our simulation results also disclose that the less defect density in intrinsic layer, the lower recombination rate and the higher electric field is. Higher electric field results in longer drift length which will promote collection of carriers generated by photons with long wavelength. Thus we deduce that HPT decreased defect density in absorber layer and improved the performance of μc-Si solar cells in long wavelength response.

Light-trapping in Thin Film Silicon Solar Cells with a Combination of Periodic and Randomly Textured Back-reflectors

2012 ◽  
Vol 1426 ◽  
pp. 117-123 ◽  
Author(s):  
Sambit Pattnaik ◽  
Nayan Chakravarty ◽  
Rana Biswas ◽  
D. Slafer ◽  
Vikram Dalal
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Light Absorption ◽  
Nanoimprint Lithography ◽  
Light Trapping ◽  
Silicon Solar Cells ◽  
Long Wavelength ◽  
Thin Film Silicon ◽  
Back Reflectors ◽  
Back Reflector

ABSTRACTLight trapping is essential to harvest long wavelength red and near-infrared photons in thin film silicon solar cells. Traditionally light trapping has been achieved with a randomly roughened Ag/ZnO back reflector, which scatters incoming light uniformly through all angles, and enhances currents and cell efficiencies over a flat back reflector. A new approach using periodically textured photonic-plasmonic arrays has been recently shown to be very promising for harvesting long wavelength photons, through diffraction of light and plasmonic light concentration. Here we investigate the combination of these two approaches of random scattering and plasmonic effects to increase cell performance even further. An array of periodic conical back reflectors was fabricated by nanoimprint lithography and coated with Ag. These back reflectors were systematically annealed to generate different amounts of random texture, at smaller spatial scales, superimposed on a larger scale periodic texture. nc-Si solar cells were grown on flat, periodic photonic-plasmonic substrates, and randomly roughened photonic-plasmonic substrates. There were large improvements (>20%) in the current and light absorption of the photonic-plasmonic substrates relative to flat. The additional random features introduced on the photonic-plasmonic substrates did not improve the current and light absorption further, over a large range of randomization features.

Sign in / Sign up

Export Citation Format

Share Document