He-Dilution to Increase Deposition Rate and Feedstock Utilization During the Growth of a-Si:H and a-SiGe:H Alloys

1999 ◽  
Vol 557 ◽  
Author(s):  
A. R. Middya ◽  
G. Wood ◽  
G. H. Lin ◽  
D. E. Carlson
Keyword(s):  
Solar Cells ◽  
Deposition Rate ◽  
State Of The Art ◽  
Deposition Rates ◽  
Single Junction ◽  
Hydrogen Dilution ◽  
Helium Dilution ◽  
Fabrication Time

AbstractWe report on the development of helium diluted a-Si:H and a-SiGe:H solar cells with higher deposition rates and better feedstock utilization than devices made with hydrogen dilution. Both the initial and the stabilized efficiencies of the He-diluted single-junction aSi:H and a-SiGe:H cells are similar to those of hydrogen-diluted cells with state-of-the-art intrinsic materials. The total fabrication time for tandem cells has been reduced by 17% by using helium dilution without loss in initial and stabilized efficiency.

Preparation of Triple-Junction A-Si:H NIP Based Solar Cells at Deposition Rates of 10 Å/s using a Very High Frequency Technique

1999 ◽  
Vol 557 ◽  
Author(s):  
S.J. Jones ◽  
X. Deng ◽  
T. Liu ◽  
M. Izu
Keyword(s):  
Solar Cells ◽  
Deposition Rate ◽  
Triple Junction ◽  
High Frequency ◽  
Rf Plasma ◽  
Very High Frequency ◽  
Deposition Rates ◽  
Single Junction ◽  
Layer Deposition ◽  
Very High

AbstractIn an effort to find an alternative deposition method to the standard low deposition rate 13.56 M-z PECVD technique, the feasibility of using a 70 MiHz rf plasma frequency to prepare a-Si:H based i-layer materials at high rates for nip based triple-junction solar cells has been tested. As a prelude to multi-junction cell fabrication, the deposition conditions used to make single-junction a-Si:H and a-SiGe:H cells using this Very High Frequency (VHF) method have been varied to optimize the material quality and the cell efficiencies. It was found that the efficiencies and the light stability for both a-Si:H and a-SiGe:H single-junction cells remain relatively constant as the i-layer deposition rate is varied from 1 to 10 Å/s. Also these stable efficiencies are similar to those for cells made at low deposition rates (1 Å/s) using the standard 13.56 MHz PECVD technique and the same deposition equipment. Using the knowledge obtained in the fabrication of the single-junction devices, a-Si:H/a-SiGe:H/a-SiGe:H triple-junction solar cells have been fabricated with all of the i-layers prepared using the VHF technique and deposition rates near 10 Å/s. Thin doped layers for these devices were prepared using the standard 13.56 MIHz rf frequency and deposition rates near 1 Å/s. Pre-light soaked efficiencies of greater than 10% have been obtained for these cells prepared at the high rates. In addition, after 600 hrs. of light soaking under white light conditions, the cell efficiencies degraded by only 10-13%, values similar to the degree of degradation for high efficiency triple-junction cells made by the standard 13.56 MiHz method using i-layer deposition rates near 1 Å/s. Thus, use of this VHF method in the production of large area a-Si:H based multi-junction solar modules will allow for higher i-layer deposition rates, higher module throughput and reduced module cost.

Preparation of a-Si:H and a-SiGe:H I-Layers for Nip Solar Cells at High Deposition Rates Using a Very High Frequency Technique

1998 ◽  
Vol 507 ◽  
Author(s):  
S.J. Jones ◽  
X. Deng ◽  
T. Liu ◽  
M. Izu
Keyword(s):  
Solar Cells ◽  
Deposition Rate ◽  
High Frequency ◽  
High Efficiency ◽  
High Deposition Rate ◽  
Very High Frequency ◽  
Deposition Rates ◽  
Single Junction ◽  
Layer Deposition ◽  
Very High

ABSTRACTThe 70 MHz Plasma Enhance Chemical Vapor Deposition (PECVD) technique has been tested as a high deposition rate (10 A/s) process for the fabrication of a-Si:H and a-SiGe:H alloy ilayers for high efficiency nip solar cells. As a prelude to multi-junction cell fabrication, the deposition conditions used to make single-junction a-Si:H and a-SiGe:H cells using this Very High Frequency (VHF) method have been varied to optimize the material quality and the cell efficiencies. It was found that the efficiencies and the light stability for a-Si:H single-junction cells can be made to remain relatively constant as the i-layer deposition rate is varied from 1 to 10 Å/s. Also these stable efficiencies are similar to those for cells made at low deposition rates (1 Å/s) using the standard 13.56 MHz PECVD technique. For the a-SiGe:H cells of the same i-layer thickness, use of the VHF technique leads to cells with higher currents and an ability to more easily current match triple-junction cells prepared at high deposition rates which should lead to higher multi-junction efficiencies. Thus, use of this VHF method in the production of large area a- Si:H based multi-junction solar modules will allow for higher i-layer deposition rates, higher manufacturing throughput and reduced module cost.

Effect of Excitation Frequency on the Performance of Amorphous Silicon Alloy Solar Cells

1998 ◽  
Vol 507 ◽  
Author(s):  
J. Yang ◽  
S. Sugiyama ◽  
S. Guha
Keyword(s):  
Solar Cells ◽  
Glow Discharge ◽  
Amorphous Silicon ◽  
Excitation Frequency ◽  
Deposition Rates ◽  
Solar Cell Performance ◽  
Single Junction ◽  
Silicon Alloy ◽  
Double Junction ◽  
Junction Structure

ABSTRACTWe have studied amorphous silicon alloy solar cells made by using a modified-very-highfrequency glow discharge at 75 MHz with a deposition rate of ∼6 Å/s. The solar cell performance is compared with those made from conventional glow discharge at 13.56 MHz with lower deposition rates. Cells made at ∼6 Å/s with 75 MHz showed comparable stabilized efficiency to those made at ∼3 Å/s with 13.56 MHz. The best performance, however, was obtained with ∼1 Å/s, including a stabilized 9.3% a-Si alloy single-junction cell employing conventional glow discharge technique. Using 75 MHz, we have achieved 11.1% and 10.0% initial active-area efficiencies for a-Si alloy and a-SiGe alloy n i p cells, respectively. An initial efficiency of 11.0% has also been obtained in a dual bandgap double-junction structure.

B(Ch3)3 as P Layer Doping Gas

1990 ◽  
Vol 192 ◽  
Author(s):  
D. S. Shen ◽  
H. Chatham ◽  
R. E. I. Schropp
Keyword(s):  
Thermal Stability ◽  
Solar Cells ◽  
Deposition Rate ◽  
High Deposition Rate ◽  
Critical Part ◽  
Single Junction ◽  
Boron Doped ◽  
Conversion Efficiencies

ABSTRACTThe boron doped p-layer is a critical part of a-Si:H solar cells. Trimethylboron (B(CH3)3) has been suggested to be a better doping gas and has a better thermal stability than B2H6. Single junction a-Si:H solar cells and a-Si:H/a-Si:H tandem cells with the p-layers deposited using B(CH3)3 have resulted in conversion efficiencies of 11.4% and 10.4%, respectively. Using these new p+-layers, we also reached 10% efficiencies in single junction a-Si:H solar cells with the i-layer deposited at a high deposition rate of ∼ 2 nm/s from either SiH4 or Si2H6 as a source gas.

Metastability in hydrogenated nanocrystalline silicon solar cells

2007 ◽  
Vol 22 (5) ◽  
pp. 1128-1137 ◽  
Author(s):  
Guozhen Yue ◽  
Baojie Yan ◽  
Gautam Ganguly ◽  
Jeffrey Yang ◽  
Subhendu Guha
Keyword(s):  
Solar Cells ◽  
Band Gap ◽  
Amorphous Phase ◽  
Reverse Bias ◽  
Volume Fraction ◽  
Nanocrystalline Silicon ◽  
Silicon Solar Cells ◽  
Single Junction ◽  
Hydrogen Dilution ◽  
Forward Current

Light-induced metastability in hydrogenated nanocrystalline silicon (nc-Si:H) single-junction solar cells was studied systematically. First, we observed no light-induced degradation when the photon energy was lower than the band gap of the amorphous phase; degradation occurred when the energy was higher than the band gap in the amorphous phase. The light-induced degradation could be annealed away at an elevated temperature. We concluded that the light-induced defect generation occurred mainly in the amorphous phase. Second, forward current injection did not degrade the nc-Si:H cell performance. However, a reverse bias during light soaking enhanced the degradation. Third, the nc-Si:H cells made with an optimized hydrogen dilution profile showed minimal degradation although these cells had a high amorphous volume fraction. This indicated that the amorphous volume fraction was not the only factor determining the degradation. Other factors also played important roles in the nc-Si:H stability.

Stability of Single and Tandem Junction A-Si:H Solar Cells Grown using the ECR Process

1997 ◽  
Vol 467 ◽  
Author(s):  
Vikram L. Dalal ◽  
Tim Maxson ◽  
Robert Girvan ◽  
Sohail Haroon
Keyword(s):  
Solar Cells ◽  
Stability Studies ◽  
Stability Tests ◽  
High Hydrogen ◽  
Single Junction ◽  
Hydrogen Dilution ◽  
The Stability

ABSTRACTWe report on the fabrication and stability tests of single junction a-Si:H, and tandem junction a-Si:H/a-Si:H solar cells using the ECR process under high hydrogen dilution (H-ECR process). We show that devices with high fill factors can be made using the H-ECR process. We also report on the stability studies of the solar cells under 1 and 2-sun illumination conditions. The solar cells show very little degradation even after 500 hours of illumination under 2 x sunlight illumination.

Correlation of Hydrogen Dilution Profiling to Material Structure and Device Performance of Hydrogenated Nanocrystalline Silicon Solar Cells

2008 ◽  
Vol 1066 ◽  
Author(s):  
Baojie Yan ◽  
Guozhen Yue ◽  
Yanfa Yan ◽  
Chun-Sheng Jiang ◽  
Charles W. Teplin ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Cell Structure ◽  
Nanocrystalline Silicon ◽  
Cell Performance ◽  
Solar Cell Performance ◽  
Seeding Layer ◽  
Single Junction ◽  
Junction Solar Cell ◽  
Hydrogen Dilution

ABSTRACTWe present a systematic study on the correlation of hydrogen dilution profiles to structural properties materials and solar cell performance in nc-Si:H solar cells. We deposited nc-Si:H single-junction solar cells using a modified very high frequency (VHF) glow discharge technique on stainless steel substrates with various profiles of hydrogen dilution in the gas mixture during deposition. The material properties were characterized using Raman spectroscopy, X-TEM, AFM, and C-AFM. The solar cell performance correlates well with the material structures. Three major conclusions are made based on the characterization results. First, the optimized nc-Si:H material does not show an incubation layer, indicating that the seeding layer is well optimized and works as per design. Second, the nanocrystalline evolution is well controlled by hydrogen dilution profiling in which the hydrogen dilution ratio is dynamically reduced during the intrinsic layer deposition. Third, the best nc-Si:H single-junction solar cell was made using a proper hydrogen dilution profile, which caused a nanocrystalline distribution close to uniform throughout the thickness, but with a slightly inverse nanocrystalline evolution. We have used the optimized hydrogen dilution profiling and improved the nc-Si:H solar cell performance significantly. As a result, we have achieved an initial active-area cell efficiency of 9.2% with a nc-Si:H single-junction structure, and 15.4% with an a-Si:H/a-SiGe:H/nc-Si:H triple-junction solar cell structure.

Comparison of Structural Properties and Solar Cell Performance of a-Si:H Films Prepared at Various Deposition Rates using 13.56 and 70 MHz PECVD Methods

2000 ◽  
Vol 609 ◽  
Author(s):  
S.J. Jones ◽  
D.L. Williamson ◽  
T. Liu ◽  
X. Deng ◽  
M. Izu
Keyword(s):  
Solar Cells ◽  
Deposition Rate ◽  
Infrared Absorption ◽  
Surface Passivation ◽  
High Growth ◽  
Density Fluctuations ◽  
Deposition Rates ◽  
Solar Cell Performance ◽  
Large Bulk ◽  
Very High Frequencies

ABSTRACTThe advantage of using very high frequencies for preparation of a-Si:H materials at high rates (above 5 Å/s) for intrinsic layers (i-layer) of solar cells has been well documented. In an effort to identify film properties which may be related to this superior device performance, a study of the structural, optical and electrical properties of films made at various deposition rates between 1 and 15 Å/s using rf frequencies of 13.56 and 70 MHz has been made. The films were characterized using a number of techniques including small-angle x-ray scattering, infrared absorption spectroscopy, and scanning electron microscopy. For the films made using the 70 MHz frequency, the amount of nanovoids with sizes of < 100Å increases systematically as the deposition rates increases beyond 5 Å/s. Accompanying the increase in void fraction in the films are increases in the hydrogen content and the amount of 2070 cm-1 mode in the infrared absorption spectra. In addition to an increase in the amount of nanovoids in the films as the deposition rate exceeds 5 Å/s, the films made using the 13.56 MHz and high deposition rates have large amounts of SAXS related to scattering features with sizes > 200 Å. This scattering is associated with large bulk density fluctuations and/or enhanced surface roughness. None of the films in the study displayed signs of having columnar-like microstructures. The nanovoids are not related to changes in the solar cells with increasing i-layer deposition rate for both fabrication processes, perhaps due to the relatively small volume fractions of less than 0.2% and/or good void-surface passivation. However, the larger-scale structures detected in the films made using the 13.56 MHz technique could cause poorer performance in cells prepared at high growth rates.

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