High Temperature Oxide for NVM Interpoly Dielectric Applications

1998 ◽  
Vol 532 ◽  
Author(s):  
J. A. Yater ◽  
B. Esho ◽  
W. M. Paulson
Keyword(s):  
High Temperature ◽  
Flash Memory ◽  
Data Retention ◽  
High Quality ◽  
Thermal Oxide ◽  
High Temperature Oxide ◽  
Conformal Coverage ◽  
Temperature Oxide ◽  
Edge Features ◽  
Nitride Oxide

ABSTRACTHigh quality interpoly dielectrics are required for non-volatile memories (NVM) in order to achieve long term data retention and endurance over many program/erase cycles. LPCVD high temperature oxide (HTO) deposited at 800°C-900°C is investigated for use in oxide-nitride-oxide (ONO) interpoly dielectric stacks. HTO allows for reduced thermal budgets, improved conformal coverage at edge features and more flexibility in scaling the ONO stack compared to thermal oxide layers. SIMS and atomic force microscopy results indicate that smooth, high quality films are deposited with a rms roughness of 0.12nm. Etch rates of as-deposited films are lowered 35% following several densification anneals. Field strengths (at 1μA) of 7-8MV/cm and leakage currents in the pA range are measured. Centroid measurements on sressed oxides show traps to be located at the HTO/polysilicon interfaces. Finally, double poly flash memory cells fabricated with ONO stacks containing HTO top oxide show improved field strength and data retention.

NEUTRON POWDER DIFFRACTION AND OXIDE SUPERCONDUCTORS

1993 ◽  
Vol 07 (16n17) ◽  
pp. 3077-3093 ◽  
Author(s):  
A.W. HEWAT
Keyword(s):  
Heavy Metals ◽  
High Temperature ◽  
Powder Diffraction ◽  
Neutron Powder Diffraction ◽  
Oxide Superconductors ◽  
X Rays ◽  
New Materials ◽  
Oxidation Reduction ◽  
High Temperature Oxide ◽  
Temperature Oxide

Neutron powder diffraction has been essential for understanding the structures of the new high temperature oxide superconductors because of the difficulty in locating oxygen with X-rays in the presence of heavy metals, especially when single crystals are usually not available. This understanding lead to the discovery of new materials. In this paper we will show how it also sheds light on the crystal chemistry of oxide superconductors—the effects of oxidation/reduction, phase separation, pressure etc.

Thermochemistry of Hf-Zirconolite, CaHf Ti2O7

1999 ◽  
Vol 556 ◽  
Author(s):  
Robert L. Putnam ◽  
Alexandra Navrotsky ◽  
Brian F. Woodfield ◽  
Jennifer L. Shapiro ◽  
Rebecca Stevens ◽  
...  
Keyword(s):  
Heat Capacity ◽  
High Temperature ◽  
Low Temperature ◽  
Adiabatic Calorimetry ◽  
Formation Enthalpy ◽  
Solution Calorimetry ◽  
Oxide Melt ◽  
High Temperature Oxide ◽  
Temperature Oxide ◽  
Capacity Data

AbstractThe formation enthalpy, - 3752.3 ± 4.7 kJ·mol−1, of Hf-zirconolite, CaHfTi2O7, was obtained using high temperature oxide-melt solution calorimetry. Combined with heat capacity data obtained using low temperature adiabatic calorimetry we report the heat capacity (Cp) and the standard molar formation energetics (ΔH°f. elements, Δ S°T, and ΔG°f. elements)for Hf-zirconolite from T = 298.15 K to T = 1500 K. Comparison of Hf-zirconolite with Zr-zirconolite is made.

High Temperature Oxide (HTO) for non volatile memories applications

1997 ◽  
Vol 36 (1-4) ◽  
pp. 87-90 ◽  
Author(s):  
Ph. Candelier ◽  
B. Guillaumot ◽  
F. Mondon ◽  
G. Reimbold ◽  
H. Achard ◽  
...  
Keyword(s):  
High Temperature ◽  
High Temperature Oxide ◽  
Temperature Oxide

scholarly journals Development of high-temperature oxide melt solution calorimetry for p-block element containing materials – CORRIGENDUM

2020 ◽  
pp. 1-1
Author(s):  
Mykola Abramchuk ◽  
Kristina Lilova ◽  
Tamilarasan Subramani ◽  
Ray Yoo ◽  
Alexandra Navrostky
Keyword(s):  
High Temperature ◽  
Solution Calorimetry ◽  
Block Element ◽  
Oxide Melt ◽  
High Temperature Oxide ◽  
Temperature Oxide
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