Three Dimensional Simulation of the Morphological Evolution of a Strained Film on a Thick Substrate
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AbstractThis paper presents a three-dimensional simulation for the surface evolution of a strained film on a thick substrate. The simulation shows that an initially random morphology will first transform into a profile dominated by two-dimensional ridges, and then into a three-dimensional island surface. The simulation also demonstrates that the ridge-island transition is a kinetic process which can be delayed by changing the initial morphology.
1995 ◽
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pp. 369-392
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1996 ◽
Vol 07
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pp. 717-729
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2015 ◽
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1994 ◽
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pp. 126-133
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2014 ◽
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pp. 223-226
A fast three-dimensional process simulator OPUS/3D with access to two-dimensional simulation results
1990 ◽
Vol 9
(7)
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pp. 745-751
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