Monitoring and Control in Vapor phase Epitaxy
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ABSTRACTMonitoring and control in epitaxy based on chemical vapor deposition is a challenge created by growth conditions that often preclude more common sensors like thermocouples and mass spectrometry. We report results of experiments to measure and control temperature and flux by non-invasive optical sensing. We have developed a temperature control system with precision and accuracy better that 5°C. Satisfactory control of flux poses difficulties that will require innovative solutions before a useful control system can be developed.
1998 ◽
Vol 188
(1-4)
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pp. 63-68
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2018 ◽
Vol 6
(3)
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pp. 491-494
Keyword(s):
2015 ◽
Vol 3
(2)
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pp. 9-22