A Novel TiO2 Film Catalyst — Preparation, Properties and Research on its Photocatalytic Oxidized Activity

1997 ◽  
Vol 497 ◽  
Author(s):  
Y. A. Cao ◽  
X. T. Zhang ◽  
L. Q. CHONG ◽  
D. Y. WANG ◽  
T. F. XIE ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Photocatalytic Activity ◽  
Chemical Vapor Deposition ◽  
Tio2 Film ◽  
Vapor Deposition ◽  
Visible Region ◽  
Chemical Vapor ◽  
High Photocatalytic Activity ◽  
Catalyst Preparation

ABSTRACTA new kind of TiO2 film catalyst was prepared by the Plasma-enhanced chemical vapor deposition (PECVD) method. The surface photovoltaic spectroscopy (SPS) results showed that its photoresponse was extended into the visible region. Photooxidation experiments showed that this kind of TiO2 film had high photocatalytic activity on degradation of phenol in aqueous solution. The influence of the thickness of TiO2 film on its photocatalytic activity was also discussed.

Photocatalytic activity of tin-doped TiO2 film deposited via aerosol assisted chemical vapor deposition

2013 ◽  
Vol 544 ◽  
pp. 571-575 ◽  
Author(s):  
Chin Sheng Chua ◽  
Ooi Kiang Tan ◽  
Man Siu Tse ◽  
Xingzhao Ding
Keyword(s):  
Photocatalytic Activity ◽  
Chemical Vapor Deposition ◽  
Tio2 Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Doped Tio2

scholarly journals Photocatalytic Activity of Hierarchically Structured TiO2Films Synthesized by Chemical Vapor Deposition

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Heon Lee ◽  
Sung Hoon Park ◽  
Young-Kwon Park ◽  
Sun-Jae Kim ◽  
Byung-Hoon Kim ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Hierarchical Structure ◽  
Vapor Deposition ◽  
Deposition Time ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Hierarchically structured TiO2photocatalyst films were synthesized using low-pressure metal-organic chemical vapor deposition (LPMOCVD) method to examine their photocatalytic activity. The thickness of the TiO2films increased proportionally with increasing deposition time. The TiO2film synthesized at 773 K showed a hierarchical structure composed of vertically grown laminar (112)-oriented anatase crystals. With increasing deposition time, the grain became larger and the morphology became sharper. In the initial CVD stage, small particular crystals were formed, above which sequential growth of layers of columnars with increasing size took place, forming hierarchical structure. The hierarchically structured TiO2film exhibited much higher photocatalytic activity than unhierarchically structured TiO2film. The photocatalytic activity increased with increasing film thickness.

The Optical Analysis and Application of Size-controllable Si Quantum Dots Fabricated by Multi-hollow Discharge Plasma Chemical Vapor Deposition

2012 ◽  
Vol 1426 ◽  
pp. 313-318
Author(s):  
Hyunwoong Seo ◽  
Yuting Wang ◽  
Giichiro Uchida ◽  
Kunihiro Kamataki ◽  
Naho Itagaki ◽  
...  
Keyword(s):  
Optical Properties ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Visible Region ◽  
Chemical Vapor ◽  
Nano Particles ◽  
Optical Absorption Coefficient ◽  
Sensitized Solar Cells

ABSTRACTQuantum dot-sensitized solar cells (QDSCs) based on the multiple exciton generation (MEG) of QD are attractive in the field of photochemical cells because the improvement of conventional sensitized solar cells has been stagnant recently. The distinctive characteristics of QDs are their strong photo-response in the visible region and quantum confinement effects. Its theoretical efficiency is much higher than that of solar cell based on the single exciton generation (SEG). Moreover, QDs have tunable optical properties and band-gaps depending on the particle size. But QD materials widely used for QDSC have some disadvantages of toxicity and scarcity. On the other hand, Si as one of good QD materials is abundant and not toxic. Also, Si QD has high stability against light soaking and a high optical absorption coefficient due to quantum size effects. However, the research on Si QD is rare although the quantum effect of Si was already verified. It is one of reasons that the fabrication and collection of Si nano-particles are too difficult. Therefore, this work proposed multi-hollow plasma discharge chemical vapor deposition (CVD). It is possible to collect Si particles unlike conventional CVD and solve the problems of the wet process. The optical properties of Si particles were controlled by varying experimental conditions. In this work, Si particles were fabricated with various sizes and their characteristics were analyzed. Based on the results, Si QD was applied to Si QDSC.

Growth of Highly Oriented Zinc Oxide Thin Films by Plasma Enhanced Chemical Vapor Deposition

2006 ◽  
Vol 321-323 ◽  
pp. 1687-1690 ◽  
Author(s):  
Hee Joon Kim ◽  
Dong Young Jang ◽  
Prem Kumar Shishodia ◽  
Akira Yoshida
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Visible Region ◽  
Chemical Vapor ◽  
Zno Films ◽  
X Ray ◽  
Crystalline Films

In the paper, zinc oxide (ZnO) thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) at different substrate temperatures. The ZnO films are characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The analysis results indicate that highly crystalline films with high orientation can be obtained at a substrate temperature of 300 oC with 50 ml/min flow rate from Diethylzinc (DEZ). Furthermore, the investigation of optical property shows that ZnO films are transparent, and the peak transmittance in the visible region is as high as 85%.

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