Novel Antimony Precursors for Low-Temperature CVD of Antimonide Thin Films

ABSTRACTVolatile antimony precursors were synthesized for the low temperature chemical vapor deposition (CVD) of antimony thin films. The molecules synthesized include tris (trifluoromethyl)stibine, Sb(CF3)3, Lewis base adducts of Sb(CF3)3, and antimony trihydride (stibine), SbH3. Isotopie substitution of stibine with deuterium leads to a more thermally stable, carbon-free antimony source. Similarly, deuterium substitution of trimethylsilylmethyl antimony dihydride leads to a stabilized liquid antimony precursor. The molecules were characterized using FTIR, NMR and DSC / TGA. Pure antimony films were deposited at temperatures below 300 °C with growth rates approaching 170 Å / min using a low pressure hot-wall CVD reactor. The films were characterized using XRD, EDS, SEM and AFM.