The Oxidation Behavior of Silicon Nanocrystals in the Submonolayer Region
Keyword(s):
AbstractFourier transform infrared spectroscopy is used to determine the time evolution of oxygen incorporation onto the surface of silicon nanocrystals. Oxygen concentrations up to one monolayer are investigated. The temporal progress of surface oxidation of Si nanocrystals in porous silicon shows a linear dependence on the square root of the oxidation time. This is similar to the oxidation of bulk Si and mesoporous silicon.
2018 ◽
Vol 32
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pp. 5571-5580
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1985 ◽
pp. 1176
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2004 ◽
Vol 99-100
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pp. 31-36
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2021 ◽
Vol 2058
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pp. 012013
2008 ◽
Vol 132
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pp. 40-44
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1999 ◽