Fourier transform infrared spectroscopy and scanning tunneling spectroscopy of porous silicon in the presence of methanol

2008 ◽  
Vol 132 (1) ◽  
pp. 40-44 ◽  
Author(s):  
F. Razi ◽  
F. Rahimi ◽  
A. Iraji zad
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Porous Silicon ◽  
Fourier Transform Infrared Spectroscopy ◽  
Fourier Transform Infrared ◽  
Scanning Tunneling Spectroscopy ◽  
Tunneling Spectroscopy ◽  
Scanning Tunneling

FTIR Studies of CH3OH on Porous Silicon

1994 ◽  
Vol 358 ◽  
Author(s):  
John A. Glass ◽  
Edward A. Wovchko ◽  
John T. Yates
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Porous Silicon ◽  
Fourier Transform Infrared Spectroscopy ◽  
Porous Layer ◽  
Fourier Transform Infrared ◽  
Surface Species ◽  
Carbon Incorporation ◽  
Oxygen Incorporation ◽  
Ftir Studies

ABSTRACTFourier transform infrared spectroscopy (FTIR) was used to investigate the reaction of methanol with porous silicon and hydrogen passivated porous silicon. At 300 K methanol adsorbs onto hydrogen free porous silicon by cleavage of the O-H bond. Both of the resulting surface species, Si-H and Si-OCH3, were determined to be stable up to ∼500 K. Above 500 K the Si-OCH3 moiety decomposes by breakage of the C-O and C-H bonds. The resulting carbon and oxygen were incorporated into the porous layer and additional Si-H surface species were detected. Further heating to 900 K removed the Si-H surface species. Adsorption of methanol onto hydrogen-passivated porous silicon did not occur until 600 K. At temperatures beyond 600 K, oxygen and carbon incorporation into the porous layer and Si-OCH3, Si-CH3, and Si-H surface species were seen. The previously unseen Si-CH3 surface species is believed to be stabilized by oxygen incorporation.

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