Acceleration of Organic Contaminant Adsorption Onto Silicon Surfaces in the Presence of Residual Fluorine

1997 ◽  
Vol 477 ◽  
Author(s):  
Koichiro Saga ◽  
Takeshi Hattori
Keyword(s):  
Photoelectron Spectroscopy ◽  
Organic Contaminants ◽  
Surface Composition ◽  
Electrostatic Force ◽  
Silicon Wafers ◽  
Silicon Surfaces ◽  
Gas Chromatography Mass Spectrometry ◽  
Organic Contamination ◽  
X Ray ◽  
Polar Groups

ABSTRACTThe influence of fluorine atoms remaining after HF treatment on the adsorption of organic contaminants onto the surface of silicon wafers was investigated by analyzing the organic contaminants with gas chromatography-mass spectrometry following thermodesorption (TDGC/MS), and the surface composition with X-ray photoelectron spectroscopy (XPS). It has been found that residual fluorine on silicon surfaces after cleaning of the silicon wafers with either aqueous HF or anhydrous HF accelerates the adsorption of organic contamination onto the silicon surfaces. This would be due to the electrostatic force of attraction between the polar groups of organic compounds and the residual fluorine on the silicon surface.

Evaluation of Chemical Filters Using Wafer Exposure Method and Experimental FFU

2003 ◽  
Vol 46 (1) ◽  
pp. 55-58 ◽  
Author(s):  
Tatsuo Nonaka ◽  
Kikuo Takeda ◽  
Reiko Iikawa ◽  
Toshikazu Taira ◽  
Taketoshi Fujimoto ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Gas Chromatography ◽  
Organic Contaminants ◽  
Semiconductor Manufacturing ◽  
Silicon Wafers ◽  
Gas Chromatography Mass Spectrometry ◽  
Organic Contamination ◽  
Volatile Organic ◽  
Exposure Method ◽  
Molecular Contaminants

Airborne molecular contaminants (AMCs) have become a serious problem with recent advances in semiconductor manufacturing technology. The use of chemical filters to remove AMCs in cleanrooms is critical for improving the yield of semiconductor devices. The experimental FFU is designed for the evaluation of chemical filters. Silicon wafers exposed in the downstream air of chemical filters in the experimental FFU were investigated by Wafer Thermal Desorption—Gas Chromatography-Mass Spectrometry (WTD-GC-MS). Organic contaminants caused by outgassing from the chemical filter were detected on the surface of the silicon wafer and compared among various chemical filters. Results showed that the volatile organic compounds (VOCs) emitted from chemical filters adsorbed on the surface of silicon wafers located downstream of the filters. It was also found that the organic contamination on the surface was related to the amount of outgassing from the chemical filters. In addition, the rates of decrease of organic contamination emitted from various ULPA filters were compared using the experimental FFU. The rate of decrease of organic contamination emitted from the low-outgassing ULPA filter was also superior to that of the normal ULPA filter.

CO2 Reduction to Propanol by Copper Foams: A Pre- and Post-Catalysis Study

2020 ◽  
Author(s):  
Jennifer A. Rudd ◽  
Ewa Kazimierska ◽  
Louise B. Hamdy ◽  
Odin Bain ◽  
Sunyhik Ahn ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Photoelectron Spectroscopy ◽  
Carbon Capture ◽  
Surface Composition ◽  
Co2 Reduction ◽  
Structural Rearrangement ◽  
Copper Electrode ◽  
Ex Situ ◽  
X Ray ◽  
Copper Electrodes

The utilization of carbon dioxide is a major incentive for the growing field of carbon capture. Carbon dioxide could be an abundant building block to generate higher value products. Herein, we describe the use of porous copper electrodes to catalyze the reduction of carbon dioxide into higher value products such as ethylene, ethanol and, notably, propanol. For <i>n</i>-propanol production, faradaic efficiencies reach 4.93% at -0.83 V <i>vs</i> RHE, with a geometric partial current density of -1.85 mA/cm<sup>2</sup>. We have documented the performance of the catalyst in both pristine and urea-modified foams pre- and post-electrolysis. Before electrolysis, the copper electrode consisted of a mixture of cuboctahedra and dendrites. After 35-minute electrolysis, the cuboctahedra and dendrites have undergone structural rearrangement. Changes in the interaction of urea with the catalyst surface have also been observed. These transformations were characterized <i>ex-situ</i> using scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. We found that alterations in the morphology, crystallinity, and surface composition of the catalyst led to the deactivation of the copper foams.

Incorporation and Role of Nitrogen During Oxynitridation of Silicon Studied by Photoelectron Spectroscopy

1999 ◽  
Vol 567 ◽  
Author(s):  
Masayuki Suzuki ◽  
Yoji Saito
Keyword(s):  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Oxide Films ◽  
Silicon Surfaces ◽  
Gaseous Mixtures ◽  
X Ray ◽  
Initial Stage ◽  
Thermal Stability Of

ABSTRACTWe tried direct oxynitridation of silicon surfaces by remote-plasma-exited nitrogen and oxygen gaseous mixtures at 700°C in a high vacuum. The oxynitrided surfaces were investigated with in-situ X-ray photoelectron spectroscopy. With increase of the oxynitridation time, the surface density of nitrogen gradually increases, but that of oxygen shows nearly saturation behavior after the rapid increase in the initial stage. We also annealed the grown oxynitride and oxide films to investigate the role of the contained nitrogen. The desorption rate of oxygen from the oxynitride films is much less than that from oxide films. We confirmed that nitrogen stabilizes the thermal stability of these oxynitride films.

scholarly journals Dual Light- and pH-Responsive Composite of Polyazo-Derivative Grafted Cellulose Nanocrystals

Materials ◽  
2018 ◽  
Vol 11 (9) ◽  
pp. 1725 ◽  
Author(s):  
Xiaohong Liu ◽  
Ming Li ◽  
Xuemei Zheng ◽  
Elias Retulainen ◽  
Shiyu Fu
Keyword(s):  
Cellulose Nanocrystals ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray Diffraction ◽  
Responsive Materials ◽  
X Ray ◽  
Ph Response ◽  
Transmission Electron ◽  
Ft Ir ◽  
Hexyl Methacrylate

As a type of functional group, azo-derivatives are commonly used to synthesize responsive materials. Cellulose nanocrystals (CNCs), prepared by acid hydrolysis of cotton, were dewatered and reacted with 2-bromoisobuturyl bromide to form a macro-initiator, which grafted 6-[4-(4-methoxyphenyl-azo) phenoxy] hexyl methacrylate (MMAZO) via atom transfer radical polymerization. The successful grafting was supported by Fourier transform infrared spectroscopy (FT-IR) and Solid magnetic resonance carbon spectrum (MAS 13C-NMR). The morphology and surface composition of the poly{6-[4-(4-methoxyphenylazo) phenoxy] hexyl methacrylate} (PMMAZO)-grafted CNCs were confirmed with Transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The grafting rate on the macro-initiator of CNCs was over 870%, and the polydispersities of branched polymers were narrow. The crystal structure of CNCs did not change after grafting, as determined by X-ray diffraction (XRD). The polymer PMMAZO improved the thermal stability of cellulose nanocrystals, as shown by thermogravimetry analysis (TGA). Then the PMMAZO-grafted CNCs were mixed with polyurethane and casted to form a composite film. The film showed a significant light and pH response, which may be suitable for visual acid-alkali measurement and reversible optical storage.

Surface Composition of Free Mixed NaCl/Na2SO4 Nanoscale Aerosols Probed by X-ray Photoelectron Spectroscopy

2018 ◽  
Vol 122 (10) ◽  
pp. 2695-2702 ◽  
Author(s):  
E. Antonsson ◽  
C. Raschpichler ◽  
B. Langer ◽  
D. Marchenko ◽  
E. Rühl
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray

Surface composition and electronic structure of Ni2+xMn1−xGa studied by X-ray photoelectron spectroscopy

2006 ◽  
Vol 600 (18) ◽  
pp. 3749-3752 ◽  
Author(s):  
C. Biswas ◽  
S. Banik ◽  
A.K. Shukla ◽  
R.S. Dhaka ◽  
V. Ganesan ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray

scholarly journals Succinic acid in aqueous solution: connecting microscopic surface composition and macroscopic surface tension

2014 ◽  
Vol 16 (39) ◽  
pp. 21486-21495 ◽  
Author(s):  
Josephina Werner ◽  
Jan Julin ◽  
Maryam Dalirian ◽  
Nønne L. Prisle ◽  
Gunnar Öhrwall ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Surface Tension ◽  
Succinic Acid ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Md Simulations ◽  
Vapor Interface ◽  
X Ray ◽  
Ph Values ◽  
Microscopic Surface

The water–vapor interface of aqueous solutions of succinic acid, where pH values and bulk concentrations were varied, has been studied using surface sensitive X-ray photoelectron spectroscopy (XPS) and molecular dynamics (MD) simulations.

Effect of Microstructural Characteristics of Electroless Nickel Metallisation on Solderability to Pb-Free Solder Alloys

2005 ◽  
Author(s):  
Changqing Liu ◽  
David A. Hutt ◽  
Dezhi Li ◽  
Paul P. Conway
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Bulk Composition ◽  
Industrial Process ◽  
Surface Characteristics ◽  
Electroless Nickel ◽  
X Ray ◽  
N2 Atmosphere ◽  
Different Temperatures ◽  
Free Solder

This paper aims to gain an insight into the correlation between the microstructure and surface composition of electroless Ni-P and its behaviour during soldering with Pb free alloys including Sn-3.8Ag-0.7Cu, Sn-3.5Ag and Sn-0.7Cu. Ni-P coatings with different P contents were produced through an industrial process on copper metal substrates. The surface morphology of these coatings was observed by Scanning Electron Microscopy (SEM) and the bulk composition was analyzed by means of Energy Dispersive X-ray analysis (EDX). The mechanical properties of the coatings were evaluated by nano-indentation testing under different maximum loads. However, to understand the behaviour of P in Ni-P coatings and deterioration of the coating surfaces during exposure to air, the surfaces of the coatings were also characterised by X-ray Photoelectron Spectroscopy (XPS) for storage at different temperatures. The dependence of the solderability of Ni-P coatings on the storage time and temperature was investigated by wetting balance testing, using an inactive or active flux with or without an inert N2 atmosphere. Finally, the solderability of Ni-P coatings to Pb free solders is correlated with their composition and microstructure (e.g. surface characteristics).

Carbon Supported Pt+Os Catalysts for Methanol Oxidation

2002 ◽  
Vol 57 (2) ◽  
pp. 193-201 ◽  
Author(s):  
Gülsün Gökağaç ◽  
Brendan J. Kennedy
Keyword(s):  
Methanol Oxidation ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Carbon Support ◽  
Methanol Oxidation Reaction ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Metal Metal ◽  
Metal Support

11% Pt/C, 10% Pt + 1%Os/C, 9% Pt + 2%Os/C, 8% Pt + 3%Os/C, 7% Pt + 4%Os/C, 6% Pt + 5%Os/C and 5%Pt + 6% Os/C catalysts have been prepared for methanol oxidation reaction. Transmission electron microscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cyclic voltammetry have been used to understand the nature of the species present in these catalysts. 7% Pt + 4% Os/C was the most active catalyst, while 8% Pt + 3% Os/C was the least active one. It is found that the metal particle size and distribution on the carbon support, the surface composition and the oxidation states of the metal particles, the metal-metal and metal support interactions are important parameters to define the activity of the catalyst.

Chemical Structure of Native Oxide Grown on Hydrogenterminated Silicon Surfaces

1992 ◽  
Vol 259 ◽  
Author(s):  
M. Takakura ◽  
T. Yasaka ◽  
S. Miyazaki ◽  
M. Hirose
Keyword(s):  
Photoelectron Spectroscopy ◽  
Chemical Structure ◽  
Pure Water ◽  
Silicon Surfaces ◽  
Native Oxide ◽  
Appreciable Amount ◽  
X Ray ◽  
Thermal Oxide ◽  
Phonon Peak ◽  
Strained Bonds

ABSTRACTChemical bonding features and suboxide compositions in native oxide grown on chemically-cleaned hydrogen-terminated Si(100) surfaces stored in pure water have been studied by using surface sensitive infrared spectroscopy and x-ray photoelectron spectroscopy. The LO phonon peak for the native oxide is located at 1210cm−1, which is shifted to a significantly lower wavenumber side than the ultrathin thermal oxide peak at 1250cm−1. This is because an appreciable amount of SiHx bonds are incorporated in the native oxide/Si interface and such hydrogen termination in the network dramatically reduces strained bonds in the interface. Very weak Si2+ suboxide signal from the oxide grown in pure water is also explained by the incorporated SiHx bonds which interrupt the Si2+ suboxide formation in the interface.

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