Full-color Thin Film ZnGa2O4 Phosphors by Ion Implantation

1997 ◽  
Vol 471 ◽  
Author(s):  
N. M. Kalkhoran ◽  
D. A. Trivedi ◽  
W. D. Halverson ◽  
S. M. Vernon
Keyword(s):  
Thin Film ◽  
Ion Implantation ◽  
Surface Texturing ◽  
Rf Sputtering ◽  
High Brightness ◽  
Full Color ◽  
Luminescence Efficiency ◽  
Cie Chromaticity ◽  
Bright Luminescence ◽  
Ion Implanted

ABSTRACTFull-color cathodoluminescence (CL) characteristics of ion implanted ZnGa2O4 thin film phosphors deposited by rf sputtering have been investigated. High brightness red (R) and green (G) CL was obtained from Eu and Mn-implanted ions, respectively. Blue (B) emission has been achieved by Ce ion implantation or from high temperature annealed, self-activated films. RGB emissions of ion implanted ZnGa2O4 thin film phosphors are well saturated and enclose a larger area surrounding the central “white” zone of CIE chromaticity chart than standard CRT phosphors. Luminescence efficiency enhancements of up to 40% have been achieved through surface texturing of the substrate prior to phosphor deposition. First demonstration of bright luminescence in ion implanted ZnGa2O4 films on flexible polyimide substrates is reported.

Challenges For Flat Panel Display Phosphors

1994 ◽  
Vol 345 ◽  
Author(s):  
H. P. Maruska ◽  
T. Parodos ◽  
N. M. Kalkhoran ◽  
W. D. Halverson
Keyword(s):  
Thin Film ◽  
Ion Implantation ◽  
Flat Panel Display ◽  
High Definition ◽  
Critical Material ◽  
Cathode Ray Tubes ◽  
Full Color ◽  
Color Displays ◽  
Single Host ◽  
Plasma Displays

AbstractPhosphors are a class of materials which emit visible light when impacted by either electrons or photons. Phosphors are the critical material in all self-emissive displays. The major display technologies which depend on phosphors are cathode ray tubes, flat cathode ray tubes (especially, field emission displays), thin film electroluminescent displays, and gas discharge plasma displays. Each of these technologies started with phosphors prepared in powder form, sprayed or screen printed onto a faceplate suitable for viewing. Electroluminescent displays have largely converted to thin film phosphors. It can be expected that, for many applications, the other competing technologies will also come to rely on more robust, high definition, thin film phosphors. Presently, full color displays must utilize several deposition and etching procedures to prepare the red, green, and blue pixels. Ion implantation of color centers is now paving the way for producing full color displays in a single host phosphor. We shall discuss the present limitations that compromise full color self-emissive displays, and present state-of-the-art solutions based on thin films and ion implantation.

Ion-Implanted Thin Film Phosphors for Full-Color Field Emission Displays

1993 ◽  
Vol 316 ◽  
Author(s):  
Nader M. Kalkhoran ◽  
H. Paul Maruska ◽  
Fereydoon Namavar
Keyword(s):  
Thin Film ◽  
Ion Implantation ◽  
Field Emission ◽  
Low Cost ◽  
Single Layer ◽  
Implantation Technique ◽  
Visible Range ◽  
Full Color ◽  
Field Emission Displays ◽  
Color Field

ABSTRACTWe have investigated the application of ion implantation technique for introducing activator and co-activator ions into host materials such as ZnS and Zn2SiO4, and have produced phosphors with differing emission peaks throughout the visible range. A number of different ions including, Mn+, Al+ and rare-earth metals have been implanted. Zn2SiO4:Mn showed bright yellow cathodoluminescence. We have demonstrated that by varying the parameters for ion implantation and annealing, a single ZnS sample with emission peaks ranging from violet to yellow can be produced; i.e, chromaticity engineering. In one case, our results indicated that photoluminescence (PL) spectrum of ZnS phosphors shifts from blue to green by increasing the dose of implanted A+ ions. The Al+-implanted ZnS samples showed emission peaks shifting from 440 to 510 nm when the aluminum dose was raised from 1 × 1015 to 1 × 1017 A1+/cm2. Therefore, by activating color centers in thin film phosphors using ion implantation, efficient and low-cost full-color field emission displays can be fabricated on a single layer of host material.

Electron Diffraction Analysis of Microtwin Structures in Regrown (III) Silicon

1982 ◽  
Vol 40 ◽  
pp. 460-461
Author(s):  
P. Ling ◽  
R. Gronsky ◽  
J. Washburn
Keyword(s):  
Electron Diffraction ◽  
Ion Implantation ◽  
Diffraction Analysis ◽  
Diffraction Pattern ◽  
Direct Consequence ◽  
The Other ◽  
Electron Diffraction Analysis ◽  
Defect Microstructures ◽  
Ion Implanted

The defect microstructures of Si arising from ion implantation and subsequent regrowth for a (111) substrate have been found to be dominated by microtwins. Figure 1(a) is a typical diffraction pattern of annealed ion-implanted (111) Si showing two groups of extra diffraction spots; one at positions (m, n integers), the other at adjacent positions between <000> and <220>. The object of the present paper is to show that these extra reflections are a direct consequence of the microtwins in the material.

Mo-doped, Cr-Doped, and Mo–Cr codoped TiO2 thin-film photocatalysts by comparative sol-gel spin coating and ion implantation

2021 ◽  
Vol 46 (24) ◽  
pp. 12961-12980
Author(s):  
Amanda Chen ◽  
Wen-Fan Chen ◽  
Tina Majidi ◽  
Bernadette Pudadera ◽  
Armand Atanacio ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Implantation ◽  
Spin Coating ◽  
Tio2 Thin Film ◽  
Sol Gel ◽  
Codoped Tio2

scholarly journals Enlarging the Eyebox of Maxwellian Displays with a Customized Liquid Crystal Dammann Grating

Crystals ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 195
Author(s):  
Ziqian He ◽  
Kun Yin ◽  
Kuan-Hsu Fan-Chiang ◽  
Shin-Tson Wu
Keyword(s):  
Liquid Crystal ◽  
Optical System ◽  
Proof Of Concept ◽  
System Configuration ◽  
Distributed Energy ◽  
Good Efficiency ◽  
High Brightness ◽  
Full Color ◽  
Crystal Polymer ◽  
Maxwellian View

The Maxwellian view offers a promising approach to overcome the vergence-accommodation conflict in near-eye displays, however, its pinhole-like imaging naturally limits the eyebox size. Here, a liquid crystal polymer-based Dammann grating with evenly distributed energy among different diffraction orders is developed to enlarge the eyebox of Maxwellian view displays via pupil replication. In the experiment, a 3-by-3 Dammann grating is designed and fabricated, which exhibits good efficiency and high brightness uniformity. We further construct a proof-of-concept Maxwellian view display breadboard by inserting the Dammann grating into the optical system. The prototype successfully demonstrates the enlarged eyebox and full-color operation. Our work provides a promising route of eyebox expansion in Maxwellian view displays while maintaining full-color operation, simple system configuration, compactness, and lightweight.

scholarly journals Optimizing the Properties of La0.8Sr0.2CrO3 Thin Films through Post-Annealing for High-Temperature Sensing

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1802
Author(s):  
Dan Liu ◽  
Peng Shi ◽  
Yantao Liu ◽  
Yijun Zhang ◽  
Bian Tian ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Annealing Temperature ◽  
Rf Sputtering ◽  
Maximum Size ◽  
Cross Sectional ◽  
Post Annealing ◽  
Maximum Conductivity ◽  
Different Temperatures ◽  
Post Annealing Temperature

La0.8Sr0.2CrO3 (0.2LSCO) thin films were prepared via the RF sputtering method to fabricate thin-film thermocouples (TFTCs), and post-annealing processes were employed to optimize their properties to sense high temperatures. The XRD patterns of the 0.2LSCO thin films showed a pure phase, and their crystallinities increased with the post-annealing temperature from 800 °C to 1000 °C, while some impurity phases of Cr2O3 and SrCr2O7 were observed above 1000 °C. The surface images indicated that the grain size increased first and then decreased, and the maximum size was 0.71 μm at 1100 °C. The cross-sectional images showed that the thickness of the 0.2LSCO thin films decreased significantly above 1000 °C, which was mainly due to the evaporation of Sr2+ and Cr3+. At the same time, the maximum conductivity was achieved for the film annealed at 1000 °C, which was 6.25 × 10−2 S/cm. When the thin films post-annealed at different temperatures were coupled with Pt reference electrodes to form TFTCs, the trend of output voltage to first increase and then decrease was observed, and the maximum average Seebeck coefficient of 167.8 µV/°C was obtained for the 0.2LSCO thin film post-annealed at 1100 °C. Through post-annealing optimization, the best post-annealing temperature was 1000 °C, which made the 0.2LSCO thin film more stable to monitor the temperatures of turbine engines for a long period of time.

Visible-light-active photocatalytic thin film by RF sputtering for hydrogen generation

2012 ◽  
Vol 8 (2) ◽  
pp. 283-291 ◽  
Author(s):  
Chi-Hung Liao ◽  
Chao-Wei Huang ◽  
Jeffrey Chi-Sheng Wu
Keyword(s):  
Thin Film ◽  
Visible Light ◽  
Hydrogen Generation ◽  
Rf Sputtering ◽  
Visible Light Active
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