scholarly journals Optical Properties of Hydrogenated Amorphous Carbon Films Grown From Methane Plasma

1985 ◽  
Vol 47 ◽  
Author(s):  
J. J. Pouch ◽  
S. A. Alterovitz ◽  
J. D. Warner ◽  
D. C. Liu ◽  
W. A. Lanford

ABSTRACTWe have used a 30 kHz ac glow discharge formed from methane gas to grow carbon films on InP substrates. Both the growth rate, and the relative Ar ion sputtering rate at 3 keV varied monotonically with deposition power. The Ar ion etchigg rate of the films decreased with deposition power. Results from the 15N nuclear reaction profile experiments indicated a slight drop in the hyorogen concentration as more energy was dissipated in the ac discharge. Values for the inoex of refraction and extinction coefficient ranged from 1.721 to 1.910 and 0 to -0.188, respectively. Optical bandgaps as high as 2.34 eV were determined.

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1096-1100 ◽  
Author(s):  
Y. HAYASHI ◽  
S. ISHIKAWA ◽  
T. SOGA ◽  
T. JIMBO ◽  
M. ADACHI ◽  
...  

We report on the efficient photoluminescence (PL) and optical properties of hydrogenated amorphous carbon thin films codoped with nitrogen and trimethylboron (TMB) grown by rf plasma-enhanced chemical vapor deposition at room temperature. The study clearly shows the observation of discrete PL emission peaks. The PL intensity of the film deposited with 20 sccm TMB is more than 103 times than that of the film deposited without TMB. The change of optical bandgap and PL emission energy with TMB flow rate are discussed based on sp3 and sp2 C networks. Angular dependence of the PL spectra revealed that the origin of multiple sharp peaks is due to Fabry-Perot cavity interference effect.


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