STM Study of Reconstruction on Si(III)

1996 ◽  
Vol 466 ◽  
Author(s):  
M. Umekawa ◽  
S. Ohara ◽  
S. Tatsukawa ◽  
H. Kuriyama ◽  
S. Matsumoto

ABSTRACTThe formation of the boron-induced reconstruction on Si(111) 7×7 surface has been studied with scanning tunneling microscope. By evaporating elemental B on Si elevated at high temperatures, reconstructed structures develop from the step edge to the adjacent lower terrace. They emerge at temperatures between 800°C and 900°C. It indicates that phase transition from 7×7 to 1×1 surface structure is necessary for forming the √3-B reconstructed structures. The phase boundary between 7×7 and regions is a straight line with termination of the faulted halves of 7×7 unit cell. It is also found that strip or triangle regions are formed, depending on the direction of the step propagation.

Nanoscale ◽  
2020 ◽  
Vol 12 (28) ◽  
pp. 15072-15080
Author(s):  
Xingming Zeng ◽  
Sadaf Bashir Khan ◽  
Ayyaz Mahmood ◽  
Shern-Long Lee

The oriented external electric field of a scanning tunneling microscope (STM) has recently been adapted for controlling the chemical reaction and supramolecular phase transition at surfaces with molecular precision.


1994 ◽  
Vol 01 (02n03) ◽  
pp. 395-410 ◽  
Author(s):  
JUN NOGAMI

Many different metals induce [Formula: see text] R30° reconstructions of the Si(111) surface. Although these surfaces share a common periodicity, they can have very different atomic structures. This paper discusses scanning tunneling microscope results and their relationship to the current understanding of the [Formula: see text] surface structure in several of these metal/Si(111) systems.


2004 ◽  
Vol 811 ◽  
Author(s):  
Ø. Dahl ◽  
S. Hallsteinsen ◽  
J. K. Grepstad ◽  
A. Borg ◽  
T. Tybell

ABSTRACTIn the present work we use a scanning tunneling microscope to modify the surface structure of epitaxial SrRuO3 thin films. Point and line etching experiments were carried out in ultra-highvacuum, using tungsten tips. The point etchings showed that pulses fired at small (< 4.5V) bias voltages did not bring about any physical modifications of the film surface, while voltages in excess of4.5 V led to etched holes accompanied by mounds. Moreover, well-defined line etching was achieved with atypical depth of approximately two unit cells and linewidths as small as 5 nm. The experiments demonstrate that a scanning tunneling microscope can be used for nanometer-scale patterning of SrRuO3 thin film surfaces.


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