STM Study of Reconstruction on Si(III)
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ABSTRACTThe formation of the boron-induced reconstruction on Si(111) 7×7 surface has been studied with scanning tunneling microscope. By evaporating elemental B on Si elevated at high temperatures, reconstructed structures develop from the step edge to the adjacent lower terrace. They emerge at temperatures between 800°C and 900°C. It indicates that phase transition from 7×7 to 1×1 surface structure is necessary for forming the √3-B reconstructed structures. The phase boundary between 7×7 and regions is a straight line with termination of the faulted halves of 7×7 unit cell. It is also found that strip or triangle regions are formed, depending on the direction of the step propagation.
1994 ◽
Vol 01
(02n03)
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pp. 395-410
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1991 ◽
Vol 9
(2)
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pp. 1184
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2000 ◽
Vol 39
(Part 1, No. 7B)
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pp. 4621-4623
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1995 ◽
Vol 52
(15)
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pp. 11446-11456
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1996 ◽
Vol 157-158
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pp. 303-304
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2013 ◽
Vol 86
(3)
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pp. 354-362
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