Cross-Sectional Transmission Electron Microscopy of Si-Based Nanostructures
Keyword(s):
AbstractThis work demonstrates the successful application of the precision cross-sectioning technique to the characterization of two types of Si-based nanostructures. Careful wedge-polishing of an array of metal-coated poly-Si microlines gave electron transparency over areas as broad as 1.5 mm across. A single, specific, SET (Single Electron Transistor), having dimensions of 4 × 4 μm2, was cross-sectioned for examination using conventional and high-resolution TEM imaging.
2018 ◽
Vol 5
(11)
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pp. 2836-2855
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2000 ◽
Vol 39
(Part 1, No. 3A)
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pp. 1278-1285
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1996 ◽
Vol 54
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pp. 108-109
1993 ◽
Vol 2
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pp. 562-566
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2015 ◽
Vol 95
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pp. 145-151
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