Surface Morphology of Ingap in the Ai-Free Pump Ld

1996 ◽  
Vol 440 ◽  
Author(s):  
Ahn Goo Choo ◽  
Seong Heon Kim ◽  
Nam Heon Kim ◽  
Oleg Laboutine ◽  
Joon Sang Yu ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Growth Parameters ◽  
Peak Position ◽  
Full Width ◽  
Half Maximum ◽  
Peak Wavelength ◽  
Force Microscopy ◽  
Atomic Force ◽  
Pl Spectrum ◽  
Reactor Pressure

AbstractWe have studied the effects of growth parameters and substrate orientations on InGaP quality using Normarski microscopy, photoluminescence (PL) spectrum and atomic force microscopy (AFM). The full width at half maximum (FWHNM) and peak position of PL spectrum were closely related with the surface morphology. The InGaP layers of narrower FWHM and shorter peak wavelength had smoother surface morphology. The InGaP layers grown on (100) substrates at the moderately low reactor pressure showed rougher surface than those on the tilted substrates. But the surface morphology was noticeably improved to be mirror-like at the lower reactor pressure. The surface morphology was inverted between the exact and tilted substrates in this reactor pressure. Furthermore, the samples grown on the tilted substrate exhibited rougher surface than the samples grown on the exact substrate. (111)B-misoriented growth surfaces had smoother than (111)A-misoriented surfaces.

Influence of the Etching Process on the Surface Morphology of 4H-SiC Substrate Used in the Epitaxial Graphene

2019 ◽  
Vol 954 ◽  
pp. 21-25
Author(s):  
Zhi Fei Zhao ◽  
Yun Li ◽  
Yi Wang ◽  
Ping Zhou ◽  
Wu Yun ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Surface Morphology ◽  
Epitaxial Graphene ◽  
Etching Process ◽  
Full Width ◽  
Half Maximum ◽  
Force Microscopy ◽  
Hydrogen Environment ◽  
Atomic Force

The morphology of the in-situ etching process on Si-face and C-face 4H-SiC, by annealing in a hydrogen environment, is studied by atomic force microscopy (AFM). The uniform step-terrace morphology of both the Si-face and C-face 4H-SiC is achieved with the assistance of carbon/silicon flux. The full width at half maximum (FWHM) of Raman 2D peak for the graphene grown on the uniform step-terrace morphology of the Si-face and C-face is 36.2 and 22 cm-1, respectively.

Movpe Strip-Like Self-Organization of InAs Grown on InP Vicinal Surfaces

2000 ◽  
Vol 618 ◽  
Author(s):  
Laurent Auvray ◽  
Véronique Soulière ◽  
Hervé Dumont ◽  
Jacques Dazord ◽  
Yves Monteil ◽  
...  
Keyword(s):  
Surface Morphology ◽  
Growth Parameters ◽  
Flux Ratio ◽  
Growth Conditions ◽  
Thin Layers ◽  
Vicinal Surfaces ◽  
Force Microscopy ◽  
Atomic Force ◽  
Nominal Thickness ◽  
Inp Substrates

ABSTRACTWe have investigated the influence of MOVPE growth parameters on the surface morphology of InAs nanostructures grown on 0.2° misoriented (001)InP substrates. Thin layers of nominal thickness of about 3 and 6 ML were deposited at 500°C with V/Ill flux ratios ranging from 50 to 240. The samples were cool down from 500 to 350°C during 6 minutes under either arsine or phophine atmosphere. The influence of this step has been found to greatly determine the surface morphology of the nanostructures observed by atomic force microscopy. Dots self-aligned along the steps and forming a non continuous strip, regularly spaced every 3-4 terraces have been obtained. The morphology of the strips can be varied with the growth conditions (V/III flux ratio). In this work, we will propose a mechanism for the formation of the strips observed during the cooling under phosphine atmosphere taking into account an As » P exchange.

Study on Photoluminescence of Porous Silicon with Cu Deposition

2011 ◽  
Vol 675-677 ◽  
pp. 1303-1306
Author(s):  
Xiu Hua Chen ◽  
Wen Hui Ma ◽  
Ting Ting Ma ◽  
Xing Hui Wu
Keyword(s):  
Porous Silicon ◽  
Blue Shift ◽  
Peak Position ◽  
Stress Effect ◽  
Force Microscopy ◽  
Chemical Plating ◽  
Surface Stress Effect ◽  
Atomic Force ◽  
Pl Spectrum ◽  
Surface Morphologies

Detailed studies on Photoluminescence (PL) of porous silicon (PS) with copper deposition were presented. PS was prepared via double electrobath, and then copper was deposited on PS surface by chemical plating. Atomic force microscopy (AFM) measurement indicates that there are different surface morphologies of PS samples with hemispherical, mountain, and tubes-like shape in different etching conditions. PL results show that the PL spectrum intensity of PS with Cu post-deposition increases 50% and do not decay after being laid 4 months than that of PS with pre-deposition. And the peak position from the PL spectrum with Cu deposition has a 14nm blue shift due to the surface stress effect of Cu to PS.

Etching Treatment Effect on Surface Morphology of Dental Structures

2017 ◽  
Vol 68 (11) ◽  
pp. 2700-2703 ◽  
Author(s):  
Kamel Earar ◽  
Vasile Iulian Antoniac ◽  
Sorana Baciu ◽  
Simion Bran ◽  
Florin Onisor ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Morphology ◽  
Phosphoric Acid ◽  
Human Teeth ◽  
Strong Bond ◽  
Force Microscopy ◽  
Atomic Force ◽  
Human Dentine ◽  
Dental Surface ◽  
Scanning Electron

This study examined and compared surface of human dentine after acidic etching with hydrogen peroxide, phosphoric acid liquid and gel. Surface demineralization of dentin is necessary for a strong bond of adhesive at dental surface. Split human teeth were used. After application of mentioned substances at dentin level measures of the contact angle and surface morphology were employed. Surface morphology was analyzed with the help of scanning electron microscopy and atomic force microscopy. Liquid phosphoric acid yielded highest demineralization showing better hydrophobicity than the rest, thus having more contact surface. Surface roughness are less evident and formed surface micropores of 4 �m remained open after wash and air dry providing better adhesive canalicular penetration and subsequent bond.

Surface morphology of As-deposited and laser-damaged dielectric mirror coatings studied in-situ by atomic force microscopy

1992 ◽  
Author(s):  
Mark R. Kozlowski ◽  
Michael C. Staggs ◽  
Mehdi Balooch ◽  
Robert J. Tench ◽  
Wigbert J. Siekhaus
Keyword(s):  
Atomic Force Microscopy ◽  
Surface Morphology ◽  
Force Microscopy ◽  
Dielectric Mirror ◽  
Atomic Force

Surface morphology studies on sublimation grown GaN by atomic force microscopy

1999 ◽  
Vol 200 (3-4) ◽  
pp. 348-352 ◽  
Author(s):  
R.S Qhalid Fareed ◽  
S Tottori ◽  
K Nishino ◽  
S Sakai
Keyword(s):  
Atomic Force Microscopy ◽  
Surface Morphology ◽  
Force Microscopy ◽  
Atomic Force

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

Stress Relaxation in Uniquely Oriented SiGe/Si Epitaxial Layers

1999 ◽  
Vol 594 ◽  
Author(s):  
M. E. Ware ◽  
R. J. Nemanich
Keyword(s):  
Stress Relaxation ◽  
Surface Morphology ◽  
Strain Relaxation ◽  
Epitaxial Layers ◽  
Misfit Dislocations ◽  
Strained Layers ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Deposited Films

AbstractThis study explores stress relaxation of epitaxial SiGe layers grown on Si substrates with unique orientations. The crystallographic orientations of the Si substrates used were off-axis from the (001) plane towards the (111) plane by angles, θ = 0, 10, and 22 degrees. We have grown 100nm thick Si(1−x) Ge(x) epitaxial layers with x=0.3 on the Si substrates to examine the relaxation process. The as-deposited films are metastable to the formation of strain relaxing misfit dislocations, and thermal annealing is used to obtain highly relaxed films for comparison. Raman spectroscopy has been used to measure the strain relaxation, and atomic force microscopy has been used to explore the development of surface morphology. The Raman scattering indicated that the strain in the as-deposited films is dependent on the substrate orientation with strained layers grown on Si with 0 and 22 degree orientations while highly relaxed films were grown on the 10 degree substrate. The surface morphology also differed for the substrate orientations. The 10 degree surface is relatively smooth with hut shaped structures oriented at predicted angles relative to the step edges.

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