Thin Film Polymer Stress Measurement Using Piezoresistive Anisotropically Etched Pressure Sensors

1996 ◽  
Vol 436 ◽  
Author(s):  
G. Bitko ◽  
R. Harries ◽  
J. Matldn ◽  
A. C. McNeil ◽  
D. J. Monk ◽  
...  

AbstractSilicon bulk micromachined piezoresistive pressure sensors are very sensitive to applied stresses: that is, applied pressure and/or packaging-related stresses. Device encapsulation has been observed to affect the electrical output of the pressure sensor significantly. The magnitude of the zero applied pressure output voltage (i.e., the offset voltage) that can be attributed to a thin film encapsulant is proportional to the magnitude of the roomtemperature thermal stress of that film. Parylene C coatings have been used as encapsulants in this work. Finite element and analytical modeling techniques were used to evaluate the effect of material property variation on the offset of a pressure sensor. A simple, linear expression of offset as a function of a material property parametric group, that includes: parylene thickness, parylene biaxial modulus, parylene CTE, silicon thickness, and annealing temperature; has been established. Experimental analysis of parylene coated pressure sensors and parylene coated silicon and gallium arsenide wafers was performed to confirm the resulting model. Known variations in parylene material properties caused by processing (i.e., uncontrolled deposition, annealing, and high temperature storage) have been used as an experimental vehicle for this purpose. An empirical relationship between offset voltage on parylene coated devices and room-temperature thermal stress on parylene coated wafers that have been exposed to the same processing is a linear expression with a similar slope to the modeling results. Furthermore, stress measurements from parylene coated silicon wafers and parylene coated gallium arsenide wafers have been used to estimate the parylene biaxial modulus (approximately 5000 MPa) and the parylene CTE (approximately 50 ppm/°C) independently. These material properties were observed to shift following parylene annealing and high temperature storage exposure experiments in a manner that is consistent with the established model.

2012 ◽  
Vol 52 (9-10) ◽  
pp. 1966-1970 ◽  
Author(s):  
R. Pelzer ◽  
M. Nelhiebel ◽  
R. Zink ◽  
S. Wöhlert ◽  
A. Lassnig ◽  
...  

2014 ◽  
Vol 895 ◽  
pp. 567-570
Author(s):  
Azman Jalar ◽  
Wan Yusmawati Wan Yusoff ◽  
Norinsan Kamil Othman ◽  
Irman Abdul Rahman

Effect of gamma radiation (1.33 MeV) and high temperature storage of semiconductor package towards micromechanical properties has been investigated. The in-house fabricated Quad Flat No Lead was exposed to gamma radiation with the dose of 5 Gy. Afterwards, high temperature storage was performed at 150 °C for 10, 100 and 1000 hours. Subsequently, the three point bending technique was carried out to obtain the micromechanical properties of semiconductor package. The fracture of the packages caused by three point bending test was subjected to 3D CT scan to capture the image of the fracture. Irradiated package shows the decreasing in their strength with increasing doses of gamma radiation. However, the strength of the package was improved after high temperature storage for 10 hours and decreased as the storage period is extended. Further analysis exhibited that high temperature storage for 10 hours is reveal as good thermal treatment for package in radioactive environment application.


2019 ◽  
Vol 3 (1) ◽  
pp. 70-83
Author(s):  
Wei Wei Liu ◽  
Berdy Weng ◽  
Scott Chen

Purpose The Kirkendall void had been a well-known issue for long-term reliability of semiconductor interconnects; while even the KVs exist at the interfaces of Cu and Sn, it may still be able to pass the condition of unbias long-term reliability testing, especially for 2,000 cycles of temperature cycling test and 2,000 h of high temperature storage. A large number of KVs were observed after 200 cycles of temperature cycling test at the intermetallic Cu3Sn layer which locate between the intermetallic Cu6Sn5 and Cu layers. These kinds of voids will grow proportional with the aging time at the initial stage. This paper aims to compare various IMC thickness as a function of stress test, the Cu3Sn and Cu6Sn5 do affected seriously by heat, but Ni3Sn4 is not affected by heat or moisture. Design/methodology/approach The package is the design in the flip chip-chip scale package with bumping process and assembly. The package was put in reliability stress test that followed AEC-Q100 automotive criteria and recorded the IMC growing morphology. Findings The Cu6Sn5 intermetallic compound is the most sensitive to continuous heat which grows from 3 to 10 µm at high temperature storage 2,000 h testing, and the second is Cu3Sn IMC. Cu6Sn5 IMC will convert to Cu3Sn IMC at initial stage, and then Kirkendall void will be found at the interface of Cu and Cu3Sn IMC, which has quality concerning issue if the void’s density grows up. The first phase to form and grow into observable thickness for Ni and lead-free interface is Ni3Sn4 IMC, and the thickness has little relationship to the environmental stress, as no IMC thickness variation between TCT, uHAST and HTSL stress test. The more the Sn exists, the thicker Ni3Sn4 IMC will be derived from this experimental finding compare the Cu/Ni/SnAg cell and Ni/SnAg cell. Research limitations/implications The research found that FCCSP can pass automotive criteria that follow AEC-Q100, which give the confidence for upgrading the package type with higher efficiency and complexities of the pin design. Practical implications This result will impact to the future automotive package, how to choose the best package methodology and what is the way to do the package. The authors can understand the tolerance for the kind of flip chip package, and the bump structure is then applied for high-end technology. Originality/value The overall three kinds of bump structures, Cu/Ni/SnAg, Cu/SnAg and Ni/SnAg, were taken into consideration, and the IMC growing morphology had been recorded. Also, the IMC had changed during the environmental stress, and KV formation was reserved.


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