Tem Structural Characterization of Nm-Scale Islands in Highly Mismatched Systems

1996 ◽  
Vol 421 ◽  
Author(s):  
S. Ruvimov ◽  
Z. Liliental-Weber ◽  
N.N. Ledentsov ◽  
M. Grundmann ◽  
D. Bimberg ◽  
...  
Keyword(s):  
Strain Relaxation ◽  
Growth Conditions ◽  
Island Size ◽  
Inas Quantum Dots ◽  
Growth Interruption ◽  
Transmission Electron ◽  
Theoretical Predictions ◽  
The Stability ◽  
Better Than

AbstractTransmission electron microscopy has been applied to study the ordering in size and shape of InAs quantum dots and in their lateral distribution. InAs islands were grown by MBE on GaAs substrates at different As-pressures and growth temperatures. Experiments with growth interupption support the theoretical predictions concerning equilibrium island size, shape and arrangement. The stability of the equilibrium dot arrays to changing of growth conditions was studied by varying the deposition temperature, arsenic pressure or growth interruption time. Significant deviation from the optimal As-pressure towards both the lower and higher values was shown to supress the formation of InAs dots resulting either in mesoscopic InAs clusters or 2D corrugated islands. Energy benefit due to the strain relaxation at island edges explains the experimental results better than kinetic consideration.

TEM characterization of Au/Polysilicon interactions

1990 ◽  
Vol 48 (4) ◽  
pp. 650-651
Author(s):  
N. David Theodore ◽  
Leslie H. Allen ◽  
C. Barry Carter ◽  
James W. Mayer
Keyword(s):  
Solid Phase ◽  
Single Crystal Silicon ◽  
Chemical Vapor ◽  
Electrical Contacts ◽  
Silicon Substrates ◽  
Crystal Silicon ◽  
Transmission Electron ◽  
Polysilicon Films ◽  
The Stability

Metal/polysilicon investigations contribute to an understanding of issues relevant to the stability of electrical contacts in semiconductor devices. These investigations also contribute to an understanding of Si lateral solid-phase epitactic growth. Metals such as Au, Al and Ag form eutectics with Si. reactions in these metal/polysilicon systems lead to the formation of large-grain silicon. Of these systems, the Al/polysilicon system has been most extensively studied. In this study, the behavior upon thermal annealing of Au/polysilicon bilayers is investigated using cross-section transmission electron microscopy (XTEM). The unique feature of this system is that silicon grain-growth occurs at particularly low temperatures ∽300°C).Gold/polysilicon bilayers were fabricated on thermally oxidized single-crystal silicon substrates. Lowpressure chemical vapor deposition (LPCVD) at 620°C was used to obtain 100 to 400 nm polysilicon films. The surface of the polysilicon was cleaned with a buffered hydrofluoric acid solution. Gold was then thermally evaporated onto the samples.

Structural Evolution Upon Annealing of Multi-Layer Si/Fe Thin Films Prepared by Magnetron Sputtering

2007 ◽  
Vol 561-565 ◽  
pp. 1161-1164
Author(s):  
Xiao Na Li ◽  
Bing Hu ◽  
Chuang Dong ◽  
Xin Jiang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Structural Evolution ◽  
Radio Frequency Magnetron Sputtering ◽  
Transmission Electron ◽  
Direct Band ◽  
The Stability ◽  
Sputtering System

Fe/Si multi-layer films were fabricated on Si (100) substrates utilizing radio frequency magnetron sputtering system. Si/β-FeSi2 structure was found in the films after the deposition. Structural characterization of Fe-silicide sample was performed by transmission electron microscopy, to explore the dependence of the microstructure of β-FeSi2 film on the preparation parameters. It was found that β-FeSi2 particles were formed after the deposition without annealing, whose size is less than 20nm ,with a direct band-gap of 0.94eV in room temperature. After annealing at 850°C, particles grow lager, however the stability of thin films was still good.

Characterization of Structural Defects in Germanium Epitaxially Grown on Nano-Structured Silicon

2011 ◽  
Vol 178-179 ◽  
pp. 43-49 ◽  
Author(s):  
Peter Zaumseil ◽  
Yuji Yamamoto ◽  
Joachim Bauer ◽  
Markus Andreas Schubert ◽  
Jana Matejova ◽  
...  
Keyword(s):  
Oxide Thickness ◽  
Growth Conditions ◽  
Structural Defects ◽  
Misfit Dislocations ◽  
Strain Partitioning ◽  
X Ray Diffraction ◽  
Reduced Pressure ◽  
Periodic Arrays ◽  
Transmission Electron

Selective epitaxial growth of germanium (Ge) on nano-structured Si(001) wafers is studied to evaluate the applicability of the nano-heteroepitaxy (NHE) approach on Ge-Si system. Based on a gate spacer technology established in advanced silicon microelectronics periodic arrays of nano-scaled Si islands are prepared, where Ge is deposited on top by reduced pressure CVD. The spacing of these structures is 360 nm. The structural perfection of the deposited Ge is investigated by transmission electron microscopy and X-ray diffraction. It is found that SiO2used as masking material is responsible for the suppression of the desired strain partitioning effect according to NHE. Even for 10 nm oxide thickness, the lattice of Ge layers deposited on Si nano-islands relaxes completely by generation of misfit dislocations at the interface. The occurrence of additional structural defects like stacking faults and micro twins can be controlled by suited growth conditions.

Synthesis and Characterization of Sr3MgSi2O8:Eu2+, Dy3+ Phosphor Prepared by a Chemical Solution Method

2011 ◽  
Vol 675-677 ◽  
pp. 1089-1092 ◽  
Author(s):  
Wen Pan ◽  
Ning Hui Wang ◽  
Guo Feng Li ◽  
Gui Ling Ning
Keyword(s):  
Solution Method ◽  
Intermediate Phase ◽  
Precursor Solution ◽  
X Ray Diffraction ◽  
Calcination Process ◽  
Chemical Solution Method ◽  
Transmission Electron ◽  
Dispersion Media ◽  
Better Than

A novel synthesis route for the production of Sr3MgSi2O8:Eu2+,Dy3+ sub-micron quasisphere phosphor powder is reported. Both the host and activator cations were co-precipitated in water-ethanol mixed solutions and precipitation was performed with analytical grade ammonium citratetribasic. As the dispersion media, optimum concentration for PEG in the precursor solution is determined to be 0.08 g/mL. X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscope (TEM) and fluorescence spectrophotometer were employed to characterize the phosphor. The effect of the calcining temperature on the crystalline particle and luminescence properties of Sr3MgSi2O8:Eu2+,Dy3+ is systematically discussed. Sr3MgSi2O8:Eu2+,Dy3+ single phased quasi-sphere phosphor was achieved by calcining the asprecipitated precursor at 1100°C. Sr2SiO4 was identified as the intermediate phase during the calcination process. Despite the small particle size, the emission intensities were higher by the present method. However, the afterglow characteristic was not better than that prepared by solidstate reaction in the comparable condition.

Coherent island formation of Cu2O films grown by chemical vapor deposition on MgO(110)

2001 ◽  
Vol 16 (8) ◽  
pp. 2408-2414 ◽  
Author(s):  
P. R. Markworth ◽  
X. Liu ◽  
J. Y. Dai ◽  
W. Fan ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Strain Relaxation ◽  
Three Dimensional ◽  
High Mobility ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Growth Conditions ◽  
Island Formation ◽  
Transmission Electron

Cuprous oxide (Cu2O) films have been grown on single-crystal MgO(110) substrates by a chemical vapor deposition process in the temperature range 690–790 °C. X-ray diffraction measurements show that phase-pure, highly oriented Cu2O films form at these temperatures. The Cu2O films are observed to grow by an island-formation mechanism on this substrate. Films grown at 690 °C uniformly coat the substrate except for micropores between grains. However, at a growth temperature of 790 °C, an isolated, three-dimensional island morphology develops. Using a transmission electron microscopy and atomic force microscope, both dome- and hut-shaped islands are observed and are shown to be coherent and epitaxial. The isolated, coherent islands form under high mobility growth conditions where geometric strain relaxation occurs before misfit dislocation can be introduced. This rare observation for oxides is attributed to the relatively weak bonding of Cu2O, which also has a relatively low melting temperature.

Stability And Precipitation Kinetics In Si1-yCy/Si and Si1-x-yGexC/Si Heterostructures Prepared by Solid Phase Epitaxy

1993 ◽  
Vol 321 ◽  
Author(s):  
J. W. Strane ◽  
S. T. Picraux ◽  
H. J. Stein ◽  
S. R. Lee ◽  
J. Candelaria ◽  
...  
Keyword(s):  
Structural Changes ◽  
Driving Forces ◽  
Solid Phase ◽  
Strain Relaxation ◽  
Solid Phase Epitaxy ◽  
Extended Defects ◽  
Plan View ◽  
Nucleation Barrier ◽  
Transmission Electron ◽  
The Stability

ABSTRACTThis study investigates the stability of Metastable Si1-yCy/Si heterostructures during rapid thermal annealing (RTA) over a temperature range of 1000 – 1150° C Heterostructures of Si1-yCy/Si and Si1-x-yGexCy/Si (x=0.077, y ≤ .0014) were formed by solid phase epitaxy from C implanted, preamorphized substrates using a 30 Minute 700° C anneal in N2. The occupancy of C in substitution lattice sites was monitored by Fourier Transform Infrared Absorption spectroscopy. The layer strain was monitored by rocking curve x-ray diffraction and the structural changes in the layers were determined using plan-view and X-sectional transmission electron Microscopy (TEM). For anneals of 1150° C or above, all the substitutional C was lost from the Si lattice after 30 seconds. TEM verified that the strain relaxation was the result of C precipitating into highly aligned βSiC particles rather than by the formation of extended defects. No nucleation barrier was observed for the loss of substitutional C Preliminary results will also be discussed for Si1-x-yGexCy/Si heterostructures where there is the additional factor of the competition between strain energy and the chemical driving forces.

Structural Studies Of Epitaxial CdF2 Layers on Si(111)

1996 ◽  
Vol 441 ◽  
Author(s):  
A. Yu. Khilko ◽  
R. N. Kyutt ◽  
G. N. Mosina ◽  
N. S. Sokolov ◽  
Yu. V. Shusterman ◽  
...  
Keyword(s):  
Strain Relaxation ◽  
Optimal Growth ◽  
Misfit Strain ◽  
X Ray Diffraction ◽  
Optimal Growth Temperature ◽  
Light Emitting ◽  
X Ray ◽  
Light Emitting Devices ◽  
Transmission Electron

AbstractEpitaxial CdF2 layers, which may be used in light-emitting devices integrated with silicon, were grown by Molecular Beam Epitaxy (MBE). Characterization of the layers by Rutherford Backscattering Spectroscopy (RBS), X-ray diffraction (XRD) and Transmission Electron Microscopy (TEM) showed that optimal growth temperature lies in the range 60–80°C. The sticking coefficient of CdF2 molecules was found to decrease at temperatures above 100°C. Different modes of misfit strain relaxation were observed above and below that temperature.

scholarly journals Microstructure Characterization of Welds in X5CrNiCuNb16-4 Steel in Overaged Condition

2019 ◽  
Vol 19 (1) ◽  
pp. 57-69
Author(s):  
A. Ziewiec ◽  
A. Zielińska-Lipiec ◽  
J. Kowalska ◽  
K. Ziewiec
Keyword(s):  
Electron Microscopy ◽  
Aging Time ◽  
Energy Dispersive Spectrometry ◽  
Solution Treatment ◽  
X Ray Diffraction ◽  
Density Distributions ◽  
Transmission Electron ◽  
Steel Welds ◽  
The Stability

AbstractThe paper presents the results of the investigation of microstructure of the welded X5CrNiCuNb16-4 (17-4PH) steel after solution treatment and aging at 620°C for different periods. The microstructure and the phase composition of the steel was investigated using light microscopy (LM), scanning electron microscopy (SEM), energy dispersive spectrometry (EDS), transmission electron microscopy (TEM) and the X-ray diffraction (XRD). Hardness was measured for samples aged at different times. Density distributions of Cu precipitates were established. The investigation has shown that the microstructure of the X5CrNiCuNb16-4 steel welds after aging at 620 ° C consists of tempered martensite, fine Cu precipitates and austenite. It was observed that the size of the Cu precipitates increases with increasing the aging time, what affects the decrease of hardness. Simultaneously, the quantity of reversed austenite increases with increase of aging time. It was revealed that enrichment of the austenite in Ni, Cu and C affects the increase of Ms, but this factor does not determine the stability of austenite.

Characterization of ultrathin Ge epilayers on (100) Si

1991 ◽  
Vol 69 (3-4) ◽  
pp. 246-254 ◽  
Author(s):  
J. -M. Baribeau ◽  
D. J. Lockwood ◽  
T. E. Jackman ◽  
P. Aebi ◽  
T. Tyliszczak ◽  
...  
Keyword(s):  
Strain Relaxation ◽  
Three Dimensional ◽  
Raman Scattering Spectroscopy ◽  
X Ray ◽  
Transmission Electron ◽  
Short Period ◽  
Short Period Superlattices ◽  
Direct Band ◽  
X Ray Absorption

The understanding of the epitaxy of pure Ge layers on Si is an important step towards the synthesis of SimGen (m, n < 10 monolayers) short-period superlattices. The possibility of a direct band-gap character makes these structures extremely attractive. We have grown thin buried Gen ([Formula: see text] monolayers) films on (100) Si by molecular beam epitaxy and studied their structural properties by a variety of techniques including Raman scattering spectroscopy, glancing incidence X-ray reflection, Rutherford backscattering, transmission electron microscopy, and extended X-ray absorption fine structure analysis. All these techniques allowed detection of the thin Ge layers and provided information about the thickness, morphology, strain distribution, and interface sharpness of these heterostructures. The Ge„ films with [Formula: see text] had a two-dimensional nature and showed no sign of strain relaxation. Intermixing at the Si–Ge interfaces was present in all these films and estimated to be not more than two monolayers. This smearing at the interfaces may have contributed to the maintenance of that pseudomorphicity. A thicker Ge layer (n = 12) showed evidence of strain relaxation and clustering in three-dimensional islands.

Single Crystal Gallium Nitride on Silicon Using SiC as an Intermediate Layer

1997 ◽  
Vol 482 ◽  
Author(s):  
S. A. Ustin ◽  
W. Ho
Keyword(s):  
Supersonic Jet ◽  
Growth Conditions ◽  
X Ray Diffraction ◽  
Cross Sectional ◽  
Rocking Curve ◽  
Intermediate Layers ◽  
Transmission Electron ◽  
Single Source Precursor ◽  
Supersonic Jet Epitaxy

AbstractGaN films have been grown atop SiC intermediate layers on Si(001) and Si(111) substrates using supersonic jet epitaxy (SJE). GaN growth temperatures ranged between 600 °C and 775 °C. Methylsilane (H3SiCH3) was used as the single source precursor for SiC growth and triethylgallium (TEG) and ammonia (NH 3) were the sources for GaN epitaxy. The GaN growth rate was found to depend strongly on substrate orientation, growth temperature, and flux. Structural characterization of the films was done by transmission electron diffraction (TED) and x-ray diffraction (XRD). Growth of GaN on SiC(002) produces a cubic or mixed phase of cubic and wurtzite depending on growth conditions. Growth on SiC(111) produces predominantly wurtzite GaN(0002). Minimum rocking curve widths for GaN(0002) on SiC/Si(111) and GaN(002) on SiC/Si(001) are 0.6° and 1.5°, respectively. Cross Sectional Transmission Electron Microscopy (XTEM) was also performed.

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