Electrical Properties Of Undoped Polycrystalline Diamond Thin Films On Silicon

1995 ◽  
Vol 416 ◽  
Author(s):  
Anders Jauhiainen ◽  
Stefan Bengtsson ◽  
Olof Engström
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Transport Model ◽  
Functional Dependence ◽  
Energy Levels ◽  
Chemical Vapour ◽  
Polycrystalline Diamond ◽  
Diamond Layer ◽  
Diamond Thin Films ◽  
Dc Current

ABSTRACTWe have investigated the electrical properties of undoped polycrystalline diamond thin films deposited on (100)-oriented n-type and p-type silicon substrates. The films, intended for electronic applications, were manufactured using hot filament chemical vapour deposition (HFCVD). To a large extent the capacitance-voltage characteristics are influenced by traps located close to the interface between the diamond layer and the silicon substrate. These traps play an important role for voltage sharing between the diamond layer and the silicon space charge region. The DC current density through the diamond film has the same functional dependence on the electric field for films deposited on both n- and p-Si. The field dependency agrees with a Frenkel-Poole transport model. Further, although the DC current transport is thermally activated, it does not follow an Arrhenius relation. A possible reason is that traps within a broad range of energy levels are involved in the charge transport. Finally, current transients resulting from stepwise changes in the applied voltage follow a power law time dependence where the kinetics depend only weakly on temperature.

Interfacial Electrical Properties of DNA-Modified Diamond Thin Films:  Intrinsic Response and Hybridization-Induced Field Effects

Langmuir ◽  
2004 ◽  
Vol 20 (16) ◽  
pp. 6778-6787 ◽  
Author(s):  
Wensha Yang ◽  
James E. Butler ◽  
John N. Russell, ◽  
Robert J. Hamers
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Field Effects ◽  
Induced Field ◽  
Diamond Thin Films

Measurement of The Activation Energy in Phosphorous Doped Polycrystalline Diamond Thin Films Grown on Silicon Substrates by Hot Filament Chemical Vapor Deposition

1996 ◽  
Vol 423 ◽  
Author(s):  
S. Mirzakuchaki ◽  
H. Golestanian ◽  
E. J. Charlson ◽  
T. Stacy
Keyword(s):  
Thin Films ◽  
Activation Energy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Silicon Substrates ◽  
Boron Doped Diamond ◽  
Diamond Thin Films ◽  
Hot Filament

AbstractAlthough many researchers have studied boron-doped diamond thin films in the past several years, there have been few reports on the effects of doping CVD-grown diamond films with phosphorous. For this work, polycrystalline diamond thin films were grown by hot filament chemical vapor deposition (HFCVD) on p-type silicon substrates. Phosphorous was introduced into the reaction chamber as an in situ dopant during the growth. The quality and orientation of the diamond thin films were monitored by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Current-voltage (I-V) data as a function of temperature for golddiamond film-silicon-aluminum structures were measured. The activation energy of the phosphorous dopants was calculated to be approximately 0.29 eV.

Selective and low temperature synthesis of polycrystalline diamond

1991 ◽  
Vol 6 (6) ◽  
pp. 1278-1286 ◽  
Author(s):  
R. Ramesham ◽  
T. Roppel ◽  
C. Ellis ◽  
D.A. Jaworske ◽  
W. Baugh
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Substrate Temperature ◽  
Microwave Plasma ◽  
Diamond Particle ◽  
Single Crystal Silicon ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Crystal Silicon ◽  
Diamond Thin Films

Polycrystalline diamond thin films have been deposited on single crystal silicon substrates at low temperatures (⋚ 600 °C) using a mixture of hydrogen and methane gases by high pressure microwave plasma-assisted chemical vapor deposition. Low temperature deposition has been achieved by cooling the substrate holder with nitrogen gas. For deposition at reduced substrate temperature, it has been found that nucleation of diamond will not occur unless the methane/hydrogen ratio is increased significantly from its value at higher substrate temperature. Selective deposition of polycrystalline diamond thin films has been achieved at 600 °C. Decrease in the diamond particle size and growth rate and an increase in surface smoothness have been observed with decreasing substrate temperature during the growth of thin films. As-deposited films are identified by Raman spectroscopy, and the morphology is analyzed by scanning electron microscopy.

Studies of Electrical Polarization Fatigue in SrBi2Ta2O9 Thin Films

1998 ◽  
Vol 541 ◽  
Author(s):  
K. M. Lee ◽  
D. Thomas ◽  
S. H. Kim ◽  
J. P. Maria ◽  
A. I. Kingon ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Oxygen Vacancies ◽  
Remanent Polarization ◽  
Energy Levels ◽  
Bias Field ◽  
Charge Carriers ◽  
Temperature Dependent ◽  
Zero Bias ◽  
Electrical Polarization

AbstractThe polarization suppression and electrical properties directly associated with the electrical polarization fatigue in SrBi2Ta2O9system were systematically investigated using Pt/SBT/Pt capacitors. Three general observations were made after 109 switching cycles: (i) ∼95% of the remanent polarization was conserved, (ii) both high and zero bias field capacitance decreased, and (iii) leakage current density increased from approximately 10−7 to 10−5 A/cm2at ∼30kV/cm2. In addition, the “knee” field, at which the leakage abruptly increases, assumed smaller values with cumulative switching cycles. Temperature dependent leakage data was collected for both as-deposited and field-cycled samples. Based on these results, we propose the possibilities of enhanced concentration of charge carriers or additional reductions in interfacial conduction barriers. Motion of oxygen vacancies to less-shallow energy levels near electrode/ferroelectric interface may allow this mechanism to occur.

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