scholarly journals Thermal Annealing of Vacancy and Interstitial Loops in Ion Irradiated Copper

1984 ◽  
Vol 41 ◽  
Author(s):  
B. C. Larson ◽  
T. S. Noggle ◽  
J. F. Barhorst
Keyword(s):  
Thermal Annealing ◽  
Diffuse Scattering ◽  
Size Distributions ◽  
X Ray ◽  
Scattering Measurements ◽  
Induced Changes

AbstractX-ray diffuse scattering has been used to study the thermal annealing of vacancy and interstitial loops in Ni-ion irradiated copper. The diffuse scattering formalism is reviewed and diffuse scattering measurements are reported on liquid-He temperature Ni-ion irradiated copper after annealing to 40, 275, and 300 °C. Size distributions are presented for vacancy and interstitial loops after each anneal and the thermal-induced changes are discussed in terms of loop dissolution and coalescence.

scholarly journals Interface Evolution in a W/Si Multilayer after Rapid Thermal Annealing Studied by X-ray Reflectivity and Diffuse Scattering

1997 ◽  
Vol 30 (5) ◽  
pp. 642-646 ◽  
Author(s):  
M. Jergel ◽  
V. Holý ◽  
E. Majková ◽  
S. Luby ◽  
R. Senderák
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Diffuse Scattering ◽  
Grazing Incidence ◽  
Interface Roughness ◽  
X Rays ◽  
Interface Evolution ◽  
X Ray ◽  
Scattering Measurements ◽  
Highly Correlated

An interface study of the effect of rapid thermal annealing (RTA) in the temperature range 523–1273 K for 5–40 s on a nominally [(50 Å Si/10 Å W) × 9] amorphous multilayer (ML) deposited on an Si(100) wafer was performed by X-ray reflectivity and diffuse-scattering measurements at grazing incidence. The results of the X-ray reflectivity and diffuse-scattering measurements were evaluated by Fresnel optical computational code and within the distorted-wave Born approximation, respectively. Up to the 773 K/5 s annealing step, the r.m.s. interface roughness decreases by 30%, which brings about a reflectivity increase of 20% on the first Bragg maximum. There is a small overall increase of the r.m.s. interface roughness across the ML in the as-deposited state and the interface profiles are highly correlated. From the very beginning of RTA, the fractal interface behaviour is gradually lost and the lateral correlation length increases, this process being accompanied by a decrease of the interface conformality. This tendency continues during the 773 K/20 s annealing; however, the r.m.s. roughness evolution is reversed. During the 1023 K/5 s annealing, the interfaces are no longer `seen' by the X-rays and, during the 1273 K/5 s annealing, a total collapse of the ML structure takes place.

scholarly journals X-ray and Neutron Diffuse Scattering Measurements

2012 ◽  
Author(s):  
Gene E. Ice ◽  
James L. Robertson ◽  
Cullie J. Sparks
Keyword(s):  
Diffuse Scattering ◽  
X Ray ◽  
Scattering Measurements

X-Ray Diffuse Scattering from Cobalt Precipitates in Copper

1986 ◽  
Vol 82 ◽  
Author(s):  
B. C. Larson ◽  
S. Iida ◽  
J. Z. Tischler ◽  
J. D. Lewis ◽  
G. E. Ice ◽  
...  
Keyword(s):  
Crystal Lattice ◽  
Size Distribution ◽  
Diffuse Scattering ◽  
Large Angle ◽  
Host Lattice ◽  
Internal Strain ◽  
X Rays ◽  
X Ray ◽  
Scattering Measurements

ABSTRACTLarge-angle diffuse scattering has been investigated for the purpose of studying coherent precipitates in a crystal lattice. Detailed calculations have been made of the scattering near Bragg reflections from cobalt precipitates in a copper host lattice. These calculations have been compared to x-ray diffuse scattering measurements made on aged (570°C for 17 hr.) Cu-0.95%Co crystals with x-rays of three different wavelengths at the NSLS. The results indicate that the size distribution, the concentration, and the internal strain of the precipitates can be determined from such diffuse scattering measurements.

scholarly journals X-Ray Diffuse Scattering Measurements of Nucleation Dynamics at Femtosecond Resolution

2008 ◽  
Vol 100 (13) ◽  
Author(s):  
A. M. Lindenberg ◽  
S. Engemann ◽  
K. J. Gaffney ◽  
K. Sokolowski-Tinten ◽  
J. Larsson ◽  
...  
Keyword(s):  
Diffuse Scattering ◽  
X Ray ◽  
Scattering Measurements

scholarly journals X-Ray and Neutron Diffuse Scattering Measurements

2002 ◽  
Author(s):  
Gene E. Ice ◽  
James L. Robertson ◽  
Cullie J. Sparks
Keyword(s):  
Diffuse Scattering ◽  
X Ray ◽  
Scattering Measurements

Time Resolved In-Situ Diffuse X-ray Scattering Measurements of the Surface Morphology of Homoepitaxial SrTiO3 Films During Pulsed Laser Deposition

2007 ◽  
Vol 1034 ◽  
Author(s):  
John David Ferguson ◽  
Arthur R. Woll ◽  
Gokhan Arikan ◽  
Darren S. Dale ◽  
Aram Amassian ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Diffuse Scattering ◽  
Pulsed Laser ◽  
Peak Position ◽  
Laser Deposition ◽  
X Ray ◽  
X Ray Scattering ◽  
Scattering Measurements ◽  
Ray Scattering

AbstractHomoepitaxial SrTiO3 thin films were grown on SrTiO3 (001) using Pulsed Laser Deposition (PLD). The deposition process was monitored in-situ, via both x-ray reflectivity and surface diffuse x-ray scattering measurements in the G3 experimental station at the Cornell High Energy Synchrotron Source (CHESS). Using a CCD detector in 1D, or streak-camera, mode with approximately 0.3-second time resolution, data were collected during growths performed at two substrate temperatures: 695°C and 1000°C. While the specular reflectivity oscillations for the two growths are very similar, the diffuse scattering clearly shows a distinct change in the peak position. Using Atomic Force Microscopy (AFM), we illustrate how the peak position for the diffuse lobes of scattered intensity is directly related to the distribution of single unit cell high islands on the growing surface. Thus, the peak shift of the diffuse scattering indicates an order of magnitude change in the island density.

Valence-difference contrast measurements utilizing X-ray anomalous scattering

1998 ◽  
Vol 5 (3) ◽  
pp. 920-922 ◽  
Author(s):  
Satoshi Sasaki ◽  
Takeshi Toyoda ◽  
Kouji Yamawaki ◽  
Koichi Ohkubo
Keyword(s):  
Absorption Edge ◽  
Low Temperatures ◽  
Diffuse Scattering ◽  
Charge Ordering ◽  
Anomalous Scattering ◽  
Valence Fluctuation ◽  
X Ray ◽  
Contrast Method ◽  
Valence States ◽  
Scattering Measurements

Anomalous scattering experiments with X-ray wavelengths close to an absorption edge have made it possible to determine independently the behaviour of ions in different valence states. The anomalous scattering factors of Fe2+ and Fe3+ obtained from both absorption and diffraction data have a large difference in f′ between the two kinds of ions. Using a valence-difference contrast method, Bragg and diffuse scattering measurements were carried out for single crystals of Fe3O4 at low temperatures. The results demonstrate the ability of the contrast method to resolve charge ordering and valence fluctuation details.

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