Changes of Wettability and Surface Energy of Polymer by keV Ar+ Ion Irradiation

1995 ◽  
Vol 396 ◽  
Author(s):  
Jun-Sik Cho ◽  
Won-Kook Choi ◽  
Ki Hyun Yoon ◽  
Hyung-Jin Jung ◽  
Seok-Keun Koh
Keyword(s):  
Surface Roughness ◽  
Surface Energy ◽  
Photoelectron Spectroscopy ◽  
Ion Irradiation ◽  
Oxygen Flow Rate ◽  
Mean Square ◽  
X Ray ◽  
Atomic Force ◽  
Hydrophilic Group ◽  
Oxygen Gas

AbstractSurface modification of polycarbonate(PC) was performed to improve the wettability by Ar+ ion irradiation with 1 keV energy in oxygen environment. The ion dose ranged from 5 x 1014 to 5 x 1016 ions/cm2 and oxygen flow rate was also varied from 0 to 6 sccm(ml/min.). Contact angle was not much decreased from 78° to 48° for water and from 63° to 32° for formamide by Ar+ ion irradiation without oxygen gas, but largely reduced to 12° for water and to 8° for formamide as Ar+ ion irradiation with 4 seem oxygen gas. Surface energy of modified PC surface which was irradiated with oxygen gas was more increased than that of PC surface irradiated without oxygen gas. It is evident that the increase of surface energy for PC modified with oxygen gas is due to hydrophilic group which result from the chemical reaction between PC surface and oxygen gas. From X-ray photoelectron spectroscopy(XPS) analysis, the newly formed hydrophilic group is identified as hydrophilic C=0 bond, and atomic force microscope(AFM), it is found that the root mean square of surface roughness is changed from 14 Å to 22 ∼ 26 Å for Ar+ ion irradiation only and 26 ∼ 30 Å for Ar+ ion irradiation with 4 seem oxygen gas. Therefore wettability of PC surface is much more affected by newly formed hydrophilic group than surface roughness in keV energy Ar+ ion irradiation.

Effect of Surface Chemistry on Ruthenium Wet Etching

2021 ◽  
Vol 314 ◽  
pp. 302-306
Author(s):  
Quoc Toan Le ◽  
E. Kesters ◽  
M. Doms ◽  
Efrain Altamirano Sánchez
Keyword(s):  
Surface Roughness ◽  
Photoelectron Spectroscopy ◽  
Etching Rate ◽  
Wet Etching ◽  
X Ray ◽  
Force Microscopy ◽  
Metal Free ◽  
Atomic Force ◽  
Different Types ◽  
Effect Of Surface

Different types of ALD Ru films, including as-deposited, annealed Ru, without and with a subsequent CMP step, were used for wet etching study. With respect to the as-deposited Ru, the etching rate of the annealed Ru film in metal-free chemical mixtures (pH = 7-9) was found to decrease substantially. X-ray photoelectron spectroscopy characterization indicated that this behavior could be explained by the presence of the formation of RuOx (x = 2,3) caused by the anneal. A short CMP step applied to the annealed Ru wafer removed the surface RuOx, at least partially, resulting in a significant increase of the etching rate. The change in surface roughness was quantified using atomic force microscopy.

Influence of Thermal Annealing on the Properties of Sputtered Si Rich Silicon Oxide Films

2010 ◽  
Vol 159 ◽  
pp. 101-104
Author(s):  
Emil Manolov ◽  
Mario Curiel ◽  
Nicola Nedev ◽  
Diana Nesheva ◽  
Juan Terrazas ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Photoelectron Spectroscopy ◽  
Silicon Oxide ◽  
High Temperature Annealing ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Variable Angle Spectroscopic Ellipsometry

Thin SiOx films deposited by reactive r.f. magnetron sputtering of Si at partial pressure ratios R between oxygen and argon in the range 15%-0.03% are studied. X-ray photoelectron spectroscopy and Variable angle spectroscopic ellipsometry prove enrichment with Si of the layers deposited at R < 0.5 %. Ellipsometric data give information about the refractive index and extinction coefficient of the films. Atomic Force Microscopy results show that for all samples high temperature annealing at 1000oC leads to a decrease of the surface roughness.

Identification of Hydrophilic Group Formation on Polymer Surface During Ar+ Ion Irradiation in O2 Environment

1996 ◽  
Vol 438 ◽  
Author(s):  
Jun-Sik Cho ◽  
Won-Kook Choi ◽  
Sung-Ryong Kim ◽  
Hyung-Jin Jung ◽  
Seok-Keun Koh
Keyword(s):  
Contact Angle ◽  
Photoelectron Spectroscopy ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Group Formation ◽  
Polymer Surface ◽  
Sample Surface ◽  
Spectroscopy Analysis ◽  
Hydrophilic Group ◽  
Oxygen Gas

AbstractAr+ ion irradiation on low density polyethylene (LDPE), and polystyrene (PS) was performed in an O2 environment in order to improve wettability of polymers to water and to identify the formation of hydrophilic groups originated from chemical reactions on the surface of polymers. Doses of a broad Ar+ ion beam of 1 keV energy were changed from 5 × 1015 to 1 × 1017 /cm2 and the rate of the oxygen gas flowing near the sample surface was varied from 0 to 7 mi/min. The contact angle of polymers was not reduced much by Ar+ ion irradiation without oxygen gas. However, it dropped largely to a minimum of 35 ° and 26 ° for At+ ion irradiation in the presence of flowing oxygen gas on LDPE and PS, respectively. From x-ray photoelectron spectroscopy analysis, it was observed that hydrophilic groups were formed on the surface of polymers through an ion-assisted chemical reaction between the ion-induced unstable chains and oxygen. The newly formed hydrophilic group was identified as -(C=O)- bond and -(C=O)-O- bond. The contact angle of polymer was greatly dependent on the hydrophilic group formed on the surface.

scholarly journals Surface Modification of Polyethersulfone (PES) with UV Photo-Oxidation

Technologies ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 36
Author(s):  
Ibrahim Cisse ◽  
Sarah Oakes ◽  
Shreen Sachdev ◽  
Marc Toro ◽  
Shin Lutondo ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Water Contact ◽  
X Ray ◽  
Force Microscopy ◽  
Photo Oxidation ◽  
Atomic Force ◽  
Modified Surfaces

Polyethersulfone (PES) films are widely employed in the construction of membranes where there is a desire to make the surface more hydrophilic. Therefore, UV photo-oxidation was studied in order to oxidize the surface of PES and increase hydrophilicity. UV photo-oxidation using low pressure mercury lamps emitting both 253.7 and 184.9 nm radiation were compared with only 253.7 nm photons. The modified surfaces were characterized using X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and water contact angle (WCA) measurements. Both sets of lamps gave similar results, showing an increase of the oxygen concentration up to a saturation level of ca. 29 at.% and a decrease in the WCA, i.e., an increase in hydrophilicity, down to ca. 40°. XPS detected a decrease of sp2 C-C aromatic group bonding and an increase in the formation of C-O, C=O, O=C-O, O=C-OH, O-(C=O)-O, and sulphonate and sulphate moieties. Since little change in surface roughness was observed by AFM, the oxidation of the surface caused the increase in hydrophilicity.

Effects of Surface Roughness and Chemical Species on Hydrophilicity of Anodized Film on Ti-6Al-4V Formed at a Low Current Density

2013 ◽  
Vol 664 ◽  
pp. 774-779 ◽  
Author(s):  
Phanawan Whangdee ◽  
Siritida Chukasorn ◽  
Viritpon Srimaneepong ◽  
Tomoaki Watanabe ◽  
Dujreutai Pongkao Kashima
Keyword(s):  
Surface Roughness ◽  
Current Density ◽  
Photoelectron Spectroscopy ◽  
Chemical Species ◽  
Surface Species ◽  
Water Contact ◽  
X Ray ◽  
Chemical Surface ◽  
Atomic Force ◽  
Galvanostatic Method

Anodization of Ti-6Al-4V is crucial for dental implants because it promotes the roughness, chemical species and hydrophilicity of the surface that leads to its biocompatibility. The anodized film was prepared by the galvanostatic method at a low current density in either 1 M H3PO4 or 1 M NaOH as the electrolyte. The as-anodized film showed a significant decrease in the water contact angle, likely to be due to an increased surface roughness (as revealed by scanning electron and atomic force microcopy) and change in the surface species (as revealed by X-ray photoelectron spectroscopy, XPS). XPS analyses confirmed that the Ti2p spectra scarcely changed while the O1s spectra significantly changed due to Ti-OH bonding. Moreover, the O/Ti ratio of the as-anodized film was increased. The results suggest that anodization by the galvanostatic method at a low current density in 1 M H3PO4 or 1 M NaOH could enhance the surface roughness and chemical surface species, and that both are likely to be important factors for enhancing the hydrophilicity of the anodized films.

Effect of oxygen gas on polycarbonate surface in keV energy Ar+ ion irradiation

1997 ◽  
Vol 12 (1) ◽  
pp. 277-282 ◽  
Author(s):  
Jun-Sik Cho ◽  
Won-Kook Choi ◽  
Hyung-Jin Jung ◽  
Seok-Keun Koh ◽  
Ki Hyun Yoon
Keyword(s):  
Surface Energy ◽  
Surface Morphology ◽  
Photoelectron Spectroscopy ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Polar Group ◽  
Force Microscopy ◽  
Oxygen Gas ◽  
Effect Of Oxygen ◽  
Flowing Oxygen

Ar+1 ion irradiation on a polycarbonate (PC) surface was carried out in an oxygen environment in order to investigate the effects of surface chemical reaction, surface morphology, and surface energy on wettability of PC. Doses of Ar+ ion were changed from 5 × 1014 to 5 × 1016 at 1 keV ion beam energy by a broad ion beam source. Contact angle of PC was not reduced much by Ar+ ion irradiation without flowing oxygen gas, but decreased significantly as Ar+ ion was irradiated with flowing 4 sccm (ml/min) oxygen gas and showed a minimum of 12° to water and 5° to formamide. A newly formed polar group was observed on the modified PC surface by Ar+ ion irradiation with flowing oxygen gas, and it increased the PC surface energy. On the basis of x-ray photoelectron spectroscopy analysis, the formed polar group was identified as a hydrophilic bond (carbonyl group). In atomic force microscopy (AFM) study, the root mean square of surface roughness was changed from 14 Å to 22–27 Å by Ar+ ion irradiation without flowing oxygen gas and 26–30 Å by Ar+ ion irradiation with flowing 4 sccm oxygen gas. It was found that wettability of the modified PC surface was not greatly dependent on the surface morphology, but on an amount of hydrophilic group formed on the surface in the ion beam process.

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Optical properties of anatase TiO2 films modified by N ion implantation

2012 ◽  
Vol 90 (1) ◽  
pp. 39-43 ◽  
Author(s):  
X. Xiang ◽  
D. Chang ◽  
Y. Jiang ◽  
C.M. Liu ◽  
X.T. Zu
Keyword(s):  
Thin Films ◽  
Ion Implantation ◽  
Photoelectron Spectroscopy ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Atomic Force ◽  
Light Region ◽  
Uv Visible ◽  
Substrate Temperatures

Anatase TiO2 thin films are deposited on K9 glass samples at different substrate temperatures by radio frequency magnetron sputtering. N ion implantation is performed in the as-deposited TiO2 thin films at ion fluences of 5 × 1016, 1 × 1017, and 5 × 1017 ions/cm2. X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy (XPS), and UV–visible spectrophotometer are used to characterize the films. With increasing N ion fluences, the absorption edges of anatase TiO2 films shift to longer wavelengths and the absorbance increases in the visible light region. XPS results show that the red shift of TiO2 films is due to the formation of N–Ti–O compounds. As a result, photoactivity is enhanced with increasing N ion fluence.

A look into the interaction of metal oxide thin films with biological media: Albumin and Fibrinogen adsorption

2012 ◽  
Vol 1376 ◽  
Author(s):  
P. Silva-Bermudez ◽  
S. Muhl ◽  
M. Rivera ◽  
S. E. Rodil
Keyword(s):  
Surface Roughness ◽  
Surface Energy ◽  
Protein Adsorption ◽  
Photoelectron Spectroscopy ◽  
Ex Situ ◽  
Polar Component ◽  
Metal Oxide Thin Films ◽  
Adsorbed Protein ◽  
Major Chemical ◽  
Fibrinogen Adsorption

ABSTRACTIn the present work, the adsorption of albumin and fibrinogen on Ta, Nb, Ti and Zr oxidesthin films deposited on Si (100) wafers by magnetron sputtering was studied in order to get a better understanding of the correlation among the surface properties of these oxides and the protein adsorption phenomena on their surfaces. The surface energy, hydrophobicity, chemical composition, roughness and atomic order of the films were characterized. The films were immersedfor 45 minutes in single protein solutions; either albumin or fibrinogenand the adsorbed protein layer on the films was studied ex-situ in a dry ambient using bothX-ray photoelectron spectroscopy and atomic force microscopy.The adsorption of albumin and fibrinogen on the films modified the surface morphology and decreased the surface roughness for all the four different metal oxides. The XPS results confirmed the presence of the protein on the surface of the films and showed that the two proteins studied were adsorbed without undergoing a major chemical decomposition. A correlation between the surface roughness,the polar component of the surface energy of the films and the atomic percentage of nitrogen on the films after protein adsorption, an indirect signal of the amount of protein adsorbed, was found for albumin and fibrinogen adsorption on Ta, Nb and Ti oxides; the largest the roughness or the polar component the largest amount of adsorbed protein.

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